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公开(公告)号：US06578961B2
公开(公告)日：2003-06-17
申请号：US09819347
申请日：2001-03-27
申请人： Mehdi Vaez-Iravani
发明人： Mehdi Vaez-Iravani
IPC分类号： G01N2188
CPC分类号： G01N21/956 , G01N21/8806 , G01N21/9501 , G01N2021/8905
摘要： A massively parallel inspection and imaging system is provided which employs multiple focused beams to illuminate a specimen. Laser light energy passes through a relatively low resolution diffraction grating or digital optical element, which is either one or two dimensional, and concentrates the transmitted energy into multiple discrete directions or orders. The beams split by the diffraction grating pass through a beam expander or telescope and are recombined onto an optical element and diverted toward the specimen. On reflection toward the specimen, the beams diverge again toward a focusing objective. The resultant light thus comprises multiple focused beams, and a relatively large area of the specimen is illuminated simultaneously by these beams. Upon reflection of the light from the sample, light passes back through the focusing objective in multiple beams, and the beams converge toward the optical element and diverge outward in collimated beams. The collimated beams pass through a focusing lens, which brings all beams onto foci on a detector array. Scanning of patterned wafers by the system may occur using coordinated motion of both the scanning beam and the wafer. To achieve proper orientation and observation, the stage speed in the cross direction is set at the ratio of the distance between the first and last lines divided by the period of the scanner.
摘要翻译： 提供了大量平行的检查和成像系统，其采用多个聚焦光束照射样本。 激光能量通过相对低分辨率的衍射光栅或数字光学元件，其为一维或二维，并将透射的能量集中到多个离散的方向或次序。 由衍射光栅分裂的光束通过光束扩展器或望远镜，并重新组合到光学元件上并朝向样本转移。 在对样本的反射时，光束再次朝向聚焦目标发散。 所得到的光由此包括多个聚焦光束，并且通过这些光束同时照射样本的相对较大的面积。 当来自样品的光反射时，光以多个光束返回穿过聚焦物镜，并且光束朝向光学元件会聚，并在准直光束中向外发散。 准直光束通过聚焦透镜，其将所有光束带到检测器阵列上的焦点上。 通过系统扫描图案化晶片可以使用扫描光束和晶片两者的协调运动来进行。 为了实现适当的取向和观察，将横向的台阶速度设定为第一行和最后一行之间的距离除以扫描仪的周期之间的比率。
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公开(公告)号：US06538730B2
公开(公告)日：2003-03-25
申请号：US09828269
申请日：2001-04-06
IPC分类号： G01N2100
CPC分类号： G01N21/956 , G01N21/21 , G01N21/9501
摘要： Scattered radiation from a sample surface is collected by means of a collector that collects radiation substantially symmetrically about a line normal to the surface. The collected radiation is directed to channels at different azimuthal angles so that information related to relative azimuthal positions of the collected scattered radiation about the line is preserved. The collected radiation is converted into respective signals representative of radiation scattered at different azimuthal angles about the line. The presence and/or characteristics of anomalies are determined from the signals. Alternatively, the radiation collected by the collector may be filtered by means of a spatial filter having an annular gap of an angle related to the angular separation of expected pattern scattering. Signals obtained from the narrow and wide collection channels may be compared to distinguish between micro-scratches and particles. Forward scattered radiation may be collected from other radiation and compared to distinguish between micro-scratches and particles. Intensity of scattering is measured when the surface is illuminated sequentially by S- and P-polarized radiation and compared to distinguish between micro-scratches and particles. Representative films may be measured using profilometers or scanning probe microscopes to determine their roughness and by the above-described instruments to determine haze in order to build a database. Surface roughness of unknown films may then be determined by measuring haze values and from the database.
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公开(公告)号：US4929836A
公开(公告)日：1990-05-29
申请号：US333059
申请日：1989-04-03
CPC分类号： H01J37/28
摘要： A significantly improved focusing technique is set forth for use with electron beams, particularly in scanning electron microscopes and/or CRTs. This technique utilizes an in-situ differential signal measurement of an object surface to form a signal which is particularly sensitive to edges in the sample at a superimposed frequency. Perfect focus is obtained when the signal strength at the superimposed frequency is a maximum thereby resulting in a minimum spot size.
摘要翻译： 阐述了与电子束一起使用的显着改进的聚焦技术，特别是在扫描电子显微镜和/或CRT中。 该技术利用物体表面的原位差分信号测量来形成对叠加频率对样本中边缘特别敏感的信号。 当叠加频率处的信号强度最大时，可获得完美的聚焦，从而导致最小光斑尺寸。
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74.发明授权In situ differential imaging and method utilizing a scanning electron microscope 失效利用扫描电子显微镜进行原位差分成像和方法
公开(公告)号：US4845362A
公开(公告)日：1989-07-04
申请号：US151367
申请日：1988-02-02
IPC分类号： G01N23/22 , G21K5/04 , H01J37/147 , H01J37/22 , H01J37/244 , H01J37/28
CPC分类号： H01J37/28
摘要： The operating characteristics of an SEM apparatus are enhanced by carrying out in situ deflection during electron beam scanning of an object to be examined. Differential signals derived from the in situ deflection are a direct measure of the spatial derivative of any geometric or material variations on the surface of the scanned object.
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公开(公告)号：US07679735B2
公开(公告)日：2010-03-16
申请号：US12052546
申请日：2008-03-20
申请人： Isabella Lewis , Mehdi Vaez-Iravani
发明人： Isabella Lewis , Mehdi Vaez-Iravani
IPC分类号： G01N21/00
CPC分类号： G01N21/95623 , G01N21/474 , G01N21/8806 , G01N21/94 , G01N21/9501
摘要： A surface inspection of the system applies a first oblique illumination beam and may also apply a second illumination beam to illuminate a surface either sequentially or simultaneously. Radiation reflected or scattered is collected by preferably three collection channels and detected by three corresponding detector arrays, although a different number of channels and detector arrays may be used. One or both illumination beams are focused to a line on the surface to be inspected and each line is imaged onto one or more detector arrays in the up to three or more detection and collection channels. Relative motion is caused between the lines and the surface inspected in a direction perpendicular to the lines, thereby increasing throughput while retaining high resolution and sensitivity. The same detection channels may be employed by detecting scattered or reflected radiation from both illumination beams. Fourier filters may be employed to filter out diffraction at one or more different spatial frequencies.
摘要翻译： 系统的表面检查应用第一倾斜照明光束并且还可以施加第二照明光束以顺序地或同时地照射表面。 尽管可以使用不同数量的通道和检测器阵列，但优选地通过三个收集通道收集反射或散射的辐射并且由三个对应的检测器阵列检测。 一个或两个照明光束被聚焦到要检查的表面上的线，并且每条线被成像到多达三个或更多个检测和收集通道中的一个或多个检测器阵列上。 在垂直于线路的方向上在线和表面之间产生相对运动，从而在保持高分辨率和灵敏度的同时增加产量。 可以通过检测来自两个照明光束的散射或反射辐射来采用相同的检测通道。 可以使用傅立叶滤波器来滤出在一个或多个不同空间频率处的衍射。
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公开(公告)号：US20090116004A1
公开(公告)日：2009-05-07
申请号：US12332037
申请日：2008-12-10
IPC分类号： G01N21/00
CPC分类号： G01N21/9501 , G01N21/8806 , G01N2021/8822
摘要： Pixel intensities indicative of scattered radiation from portions of the inspected surface surrounding a location of a potential anomaly are also stored so that such data is available for quick review of the pixel intensities within a patch on the surface containing the location of the potential anomaly. Where rotational motion is caused between the illumination beam and the inspected surface, signal-to-noise ratio may be improved by comparing the pixel intensities of pixels at corresponding positions on two different surfaces that are inspected, where corresponding pixels at the same relative locations on the two different surfaces are illuminated and scattered radiation therefrom collected and detected under the same optical conditions.
摘要翻译： 还存储指示围绕潜在异常位置的被检查表面的部分的散射辐射的像素强度，使得这样的数据可用于快速查看包含潜在异常位置的表面上的贴片内的像素强度。 在照明光束和被检查表面之间产生旋转运动的情况下，可以通过比较被检查的两个不同表面上的相应位置处的像素的像素强度来改善信噪比，其中相同相对位置处的相应像素 两个不同的表面被照射，并且在相同的光学条件下收集和检测散射的辐射。
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77.发明申请Systems and Method for Simultaneously Inspecting a Specimen with Two Distinct Channels 有权同时检测两个不同通道样本的系统和方法公开(公告)号：US20090059215A1
公开(公告)日：2009-03-05
申请号：US11848516
申请日：2007-08-31
申请人： Courosh Mehanian , Hans J. Hansen , Yingjian Wang , Yuval Ben-Dov , Zheng-Wu Li , Andrew V. Hill , Mehdi Vaez-Iravani , Kurt Zimmerman
发明人： Courosh Mehanian , Hans J. Hansen , Yingjian Wang , Yuval Ben-Dov , Zheng-Wu Li , Andrew V. Hill , Mehdi Vaez-Iravani , Kurt Zimmerman
CPC分类号： G02B21/18 , G01N21/8806 , G01N21/9501 , G01N2021/8825 , G02B21/367
摘要： A system is provided herein for inspecting a specimen. In one embodiment, the system may include a dual-channel microscope, two illuminators, each coupled for illuminating a different channel of the dual-channel microscope and two detectors, each coupled to a different channel of the dual-channel microscope for acquiring images of the specimen. Means are provided for separating the channels of the dual-channel microscope, so that the two detectors can acquire the images of the specimen at substantially the same time. In one embodiment, the channels of the dual-channel microscope may be spectrally separated by configuring the two illuminators, so that they produce light in two substantially non-overlapping spectral ranges. In another embodiment, the channels of the dual-channel microscope may be spatially separated by positioning the two detectors, so that the illumination light do not overlap and the fields of view of the two detectors do not overlap within a field of view of an objective lens included within the system.
摘要翻译： 本文提供了用于检查样本的系统。 在一个实施例中，系统可以包括双通道显微镜，两个照明器，每个照明器被耦合用于照亮双通道显微镜和两个检测器的不同通道，每个检测器耦合到双通道显微镜的不同通道，用于获取 标本。 提供了用于分离双通道显微镜的通道的装置，使得两个检测器可以在基本上同时获取样本的图像。 在一个实施例中，双通道显微镜的通道可以通过配置两个照明器进行光谱分离，使得它们产生两个基本上非重叠的光谱范围的光。 在另一个实施例中，双通道显微镜的通道可以通过定位两个检测器在空间上分离，使得照明光不重叠，并且两个检测器的视场在目标的视场内不重叠 镜头包含在系统内。
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公开(公告)号：US20090040525A1
公开(公告)日：2009-02-12
申请号：US11837220
申请日：2007-08-10
申请人： Azmi Kadkly , Stephen Biellak , Mehdi Vaez-Iravani
发明人： Azmi Kadkly , Stephen Biellak , Mehdi Vaez-Iravani
IPC分类号： G01N21/47
CPC分类号： G01N21/9501
摘要： Systems configured to inspect a wafer are provided. One system includes an illumination subsystem configured to illuminate an area on the wafer by directing light to the wafer at an oblique angle of incidence. The system also includes a collection subsystem configured to simultaneously collect light scattered from different spots within the illuminated area and to focus the light collected from the different spots to corresponding positions in an image plane. In addition, the system includes a detection subsystem configured to separately detect the light focused to the corresponding positions in the image plane and to separately generate output responsive to the light focused to the corresponding positions in the image plane. The output can be used to detect defects on the wafer.
摘要翻译： 提供了配置用于检查晶片的系统。 一个系统包括照明子系统，该照明子系统被配置为以倾斜的入射角将光引导到晶片上来照射晶片上的区域。 该系统还包括收集子系统，其被配置为同时收集从照明区域内的不同点散射的光并且将从不同点收集的光聚焦到图像平面中的相应位置。 另外，该系统包括检测子系统，该检测子系统被配置为分别检测聚焦到图像平面中的对应位置的光，并且响应于聚焦到图像平面中的对应位置的光单独产生输出。 该输出可用于检测晶圆上的缺陷。
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公开(公告)号：US20080165343A1
公开(公告)日：2008-07-10
申请号：US12052546
申请日：2008-03-20
申请人： Isabella Lewis , Mehdi Vaez-Iravani
发明人： Isabella Lewis , Mehdi Vaez-Iravani
IPC分类号： G01J3/00
CPC分类号： G01N21/95623 , G01N21/474 , G01N21/8806 , G01N21/94 , G01N21/9501
摘要： A surface inspection of the system applies a first oblique illumination beam and may also apply a second illumination beam to illuminate a surface either sequentially or simultaneously. Radiation reflected or scattered is collected by preferably three collection channels and detected by three corresponding detector arrays, although a different number of channels and detector arrays may be used. One or both illumination beams are focused to a line on the surface to be inspected and each line is imaged onto one or more detector arrays in the up to three or more detection and collection channels. Relative motion is caused between the lines and the surface inspected in a direction perpendicular to the lines, thereby increasing throughput while retaining high resolution and sensitivity. The same detection channels may be employed by detecting scattered or reflected radiation from both illumination beams. Fourier filters may be employed to filter out diffraction at one or more different spatial frequencies.
摘要翻译： 系统的表面检查应用第一倾斜照明光束并且还可以施加第二照明光束以顺序地或同时地照射表面。 尽管可以使用不同数量的通道和检测器阵列，但优选地通过三个收集通道收集反射或散射的辐射并且由三个对应的检测器阵列检测。 一个或两个照明光束被聚焦到要检查的表面上的线，并且每条线被成像到多达三个或更多个检测和收集通道中的一个或多个检测器阵列上。 在垂直于线路的方向上在线和表面之间产生相对运动，从而在保持高分辨率和灵敏度的同时增加产量。 可以通过检测来自两个照明光束的散射或反射辐射来采用相同的检测通道。 可以使用傅立叶滤波器来滤出在一个或多个不同空间频率处的衍射。
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公开(公告)号：US20060109457A1
公开(公告)日：2006-05-25
申请号：US11243349
申请日：2005-10-03
IPC分类号： G01N21/00
CPC分类号： G01N21/9501 , G01N21/8806 , G01N2021/8822
摘要： Pixel intensities indicative of scattered radiation from portions of the inspected surface surrounding a location of a potential anomaly are also stored so that such data is available for quick review of the pixel intensities within a patch on the surface containing the location of the potential anomaly. Where rotational motion is caused between the illumination beam and the inspected surface, signal-to-noise ratio may be improved by comparing the pixel intensities of pixels at corresponding positions on two different surfaces that are inspected, where corresponding pixels at the same relative locations on the two different surfaces are illuminated and scattered radiation therefrom collected and detected under the same optical conditions.
摘要翻译： 还存储指示围绕潜在异常位置的被检查表面的部分的散射辐射的像素强度，使得这样的数据可用于快速查看包含潜在异常位置的表面上的贴片内的像素强度。 在照明光束和被检查表面之间产生旋转运动的情况下，可以通过比较被检查的两个不同表面上的相应位置处的像素的像素强度来改善信噪比，其中相同相对位置处的相应像素 两个不同的表面被照射，并且在相同的光学条件下收集和检测散射的辐射。
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