Electrostatic discharge (ESD) protection structure
    71.
    发明授权
    Electrostatic discharge (ESD) protection structure 有权
    静电放电(ESD)保护结构

    公开(公告)号:US07067852B1

    公开(公告)日:2006-06-27

    申请号:US09660386

    申请日:2000-09-12

    IPC分类号: H01L29/74 H01L23/62

    摘要: An ESD protection structure includes a semiconductor substrate of a first conductivity type, and first and second well regions of a second conductivity type disposed in the substrate. The first and second well regions are separated by a gap region of the substrate. Also included are first and second floating regions (of the second conductivity type) disposed in the first and second well regions adjacent to the gap region, respectively. The ESD protection structure also includes first and second contact regions of the first conductivity type disposed on the first and second well regions, respectively, and spaced apart from the first and second floating regions, respectively. The ESD protection structure also includes first and second contact regions of the second conductivity type disposed on the first and second well regions, respectively, and spaced apart from the first and second floating regions, respectively.

    摘要翻译: ESD保护结构包括第一导电类型的半导体衬底和设置在衬底中的第二导电类型的第一和第二阱区。 第一和第二阱区域被衬底的间隙区域分开。 还包括设置在与间隙区域相邻的第一和第二阱区域中的第一和第二浮动区域(第二导电类型)。 ESD保护结构还包括分别设置在第一和第二阱区上并分别与第一和第二浮动区分开的第一导电类型的第一和第二接触区域。 ESD保护结构还包括分别设置在第一和第二阱区上并分别与第一和第二浮动区隔开的第二导电类型的第一和第二接触区域。

    Spin-injection devices on silicon material for conventional BiCMOS technology
    75.
    发明授权
    Spin-injection devices on silicon material for conventional BiCMOS technology 有权
    用于常规BiCMOS技术的硅材料上的旋转注入器件

    公开(公告)号:US06963091B1

    公开(公告)日:2005-11-08

    申请号:US10743845

    申请日:2003-12-22

    IPC分类号: H01L27/06 H01L29/45 H01L29/66

    摘要: Spin-based microelectronic devices can be realized by utilizing ferromagnetic structures that make good ohmic contact with silicon, in order to avoid the Schottky barrier problem plaguing existing approaches to spin-based microelectronics, while allowing the devices to be based on silicon substrates, which are well-known and used in the industry. Thin layers of metal silicide, such as CoSi2 and NiSi2, are used as an intermediate layer between ferromagnetic contacts, such as cobalt and nickel contacts, and the silicon substrate. The thin silicide layers provide good ohmic contact between the ferromagnetic contacts and silicon, such that spin-polarized carriers can be injected into the silicon, and detected out of the silicon, without loss of spin polarization.

    摘要翻译: 可以通过利用与硅进行良好的欧姆接触的铁磁结构来实现基于旋转的微电子器件,以避免肖特基势垒问题困扰现有的基于旋转的微电子学方法,同时允许器件基于硅衬底 闻名于世的行业。 金属硅化物的薄层,例如CoSi 2和NiSi 2,被用作铁磁性触点(例如钴和镍触点)和硅衬底之间的中间层。 薄硅化物层在铁磁触点和硅之间提供良好的欧姆接触,使得自旋极化载流子可以注入硅中,并从硅中检测出,而不损失自旋极化。

    Non-volatile memory cell with gated diode and MOS transistor and method for using such cell
    76.
    发明授权
    Non-volatile memory cell with gated diode and MOS transistor and method for using such cell 有权
    具有门控二极管和MOS晶体管的非易失性存储单元及其使用方法

    公开(公告)号:US06862216B1

    公开(公告)日:2005-03-01

    申请号:US10880176

    申请日:2004-06-29

    摘要: A non-volatile memory cell including a gated diode and a single readout transistor, methods for programming and reading out such a cell, and a memory including an array of such cells. The readout transistor is an MOS transistor. The transistor and gated diode are formed in a volume of semiconductor material of one type, and share a source region, a control gate, and a floating gate. The transistor has a drain region formed of semiconductor material of one type and the diode has a drain region formed of semiconductor material of the opposite type.

    摘要翻译: 包括门控二极管和单个读出晶体管的非易失性存储单元,用于编程和读出这样的单元的方法以及包括这种单元阵列的存储器。 读出晶体管是MOS晶体管。 晶体管和门控二极管形成为一种类型的半导体材料的体积,并且共享源极区域,控制栅极和浮动栅极。 晶体管具有由一种类型的半导体材料形成的漏极区域,并且二极管具有由相反类型的半导体材料形成的漏极区域。