公开(公告)号：US08330935B2

公开(公告)日：2012-12-11

申请号：US12703068

申请日：2010-02-09

申请人： Albrecht Ehrmann ,  Ulrich Wegmann ,  Rainer Hoch ,  Joerg Mallmann ,  Karl-Heinz Schuster ,  Ulrich Loering ,  Toralf Gruner ,  Bernhard Kneer ,  Bernhard Geuppert ,  Franz Sorg ,  Jens Kugler ,  Norbert Wabra

发明人： Albrecht Ehrmann ,  Ulrich Wegmann ,  Rainer Hoch ,  Joerg Mallmann ,  Karl-Heinz Schuster ,  Ulrich Loering ,  Toralf Gruner ,  Bernhard Kneer ,  Bernhard Geuppert ,  Franz Sorg ,  Jens Kugler ,  Norbert Wabra

IPC分类号： G03B27/52 ,  G03B27/68 ,  G03B27/58

CPC分类号： G03F7/70341 ,  G03F7/70591 ,  G03F7/70691 ,  G03F7/7085 ,  G03F7/70875 ,  G03F7/70891 ,  G03F7/70991

摘要： A microlithographic projection exposure apparatus includes a projection lens that is configured for immersion operation. For this purpose an immersion liquid is introduced into an immersion space that is located between a last lens of the projection lens on the image side and a photosensitive layer to be exposed. To reduce fluctuations of refractive index resulting from temperature gradients occurring within the immersion liquid, the projection exposure apparatus includes heat transfer elements that heat or cool partial volumes of the immersion liquid so as to achieve an at least substantially homogenous or at least substantially rotationally symmetric temperature distribution within the immersion liquid.

摘要翻译： 微光刻投影曝光装置包括配置为浸没操作的投影透镜。 为此，将浸没液体引入位于图像侧的投影透镜的最后一个透镜与待曝光的感光层之间的浸没空间中。 为了减少由浸没液体内发生的温度梯度引起的折射率的波动，投影曝光装置包括加热或冷却浸没液的部分体积的传热元件，以便达到至少基本均匀或至少基本上旋转对称的温度 在浸液中的分布。

公开(公告)号：US08049973B2

公开(公告)日：2011-11-01

申请号：US12776047

申请日：2010-05-07

申请人： Karl-Heinz Schuster

发明人： Karl-Heinz Schuster

IPC分类号： G02B9/00 ,  G02B3/00

CPC分类号： G02B17/0892 ,  G02B17/0812 ,  G03F7/70091 ,  G03F7/70191 ,  G03F7/70216

摘要： In certain aspects, the disclosure relates to a projection objective, in particular for a microlithography exposure apparatus, serving to project an image of an object field in an object plane onto an image field in an image plane. The projection objective includes a system aperture stop and refractive and/or reflective optical elements that are arranged relative to an optical system axis. The centroid of the image field is arranged at a lateral distance from the optical system axis). The system aperture stop has an inner aperture stop border which encloses an aperture stop opening and whose shape is defined by a border contour curve. The border contour curve runs at least in part outside of a plane that spreads orthogonally to the optical system axis.

摘要翻译： 在某些方面，本公开涉及一种投影物镜，特别是用于微光刻曝光设备，用于将物平面中的物场的图像投影到像平面中的图像场上。 投影物镜包括系统孔径光阑以及相对于光学系统轴线布置的折射和/或反射光学元件。 图像场的质心被布置在距离光学系统轴线的横向距离处。 系统孔径光阑具有封闭孔径光阑开口的内孔停止边界，其形状由边界轮廓曲线限定。 边界轮廓线至少部分地在与光学系统轴线正交扩展的平面之外运行。

公开(公告)号：US08023104B2

公开(公告)日：2011-09-20

申请号：US11971659

申请日：2008-01-09

申请人： Karl-Heinz Schuster

发明人： Karl-Heinz Schuster

IPC分类号： G03B27/42

CPC分类号： G03F7/70966 ,  G02B5/3091

摘要： Microlithographic projection exposure apparatuses, as well as related components, subsystems and methods are disclosed.

摘要翻译： 公开了微光刻投影曝光装置以及相关部件子系统和方法。

公开(公告)号：US07787177B2

公开(公告)日：2010-08-31

申请号：US12026592

申请日：2008-02-06

申请人： Karl-Heinz Schuster

发明人： Karl-Heinz Schuster

IPC分类号： G02B23/24

CPC分类号： G03F7/70341 ,  G02B17/0812 ,  G02B17/0892 ,  G03F7/70225 ,  G03F7/70275

摘要： A projection objective for imaging a pattern provided in an object surface onto an image surface of the projection objective has an object-side imaging subsystem for creating a final intermediate image closest to the image surface from radiation coming from the object surface and an image-side imaging subsystem for directly imaging the final intermediate image onto the image surface. The image-side imaging subsystem includes at least one aspheric primary correcting lens having an aspheric primary correcting surface. The object-side imaging subsystem includes a secondary correcting group having at least one secondary correcting lens having an aspheric secondary correcting surface. Conditions involving maximum incidence angles and subaperture offsets at the correcting surfaces are given which should be observed to obtain sufficient aberration correction at very high image-side numerical apertures NA.

摘要翻译： 用于将设置在物体表面中的图案成像到投影物镜的图像表面上的投影物镜具有用于从来自物体表面的辐射产生最靠近图像表面的最终中间图像的物体侧成像子系统，并且图像侧 成像子系统，用于将最终中间图像直接成像到图像表面上。 图像侧成像子系统包括具有非球面主修正表面的至少一个非球面初级校正透镜。 物体侧成像子系统包括具有至少一个具有非球面二次校正表面的次校正透镜的次校正组。 给出了在校正表面上涉及最大入射角和子孔径偏移的条件，应该观察这些条件以在非常高的像侧数值孔径NA处获得足够的像差校正。

公开(公告)号：US07751127B2

公开(公告)日：2010-07-06

申请号：US12032010

申请日：2008-02-15

申请人： Karl-Heinz Schuster

发明人： Karl-Heinz Schuster

IPC分类号： G02B9/00 ,  G02B3/00

CPC分类号： G02B17/0892 ,  G02B17/0812 ,  G03F7/70091 ,  G03F7/70191 ,  G03F7/70216

摘要： In certain aspects, the disclosure relates to a projection objective, in particular for a microlithography exposure apparatus, serving to project an image of an object field in an object plane onto an image field in an image plane. The projection objective includes a system aperture stop and refractive and/or reflective optical elements that are arranged relative to an optical system axis. The centroid of the image field is arranged at a lateral distance from the optical system axis). The system aperture stop has an inner aperture stop border which encloses an aperture stop opening and whose shape is defined by a border contour curve. The border contour curve runs at least in part outside of a plane that spreads orthogonally to the optical system axis.

摘要翻译： 在某些方面，本公开涉及一种投影物镜，特别是用于微光刻曝光设备，用于将物平面中的物场的图像投影到像平面中的图像场上。 投影物镜包括系统孔径光阑以及相对于光学系统轴线布置的折射和/或反射光学元件。 图像场的质心被布置在距离光学系统轴线的横向距离处。 系统孔径光阑具有封闭孔径光阑开口的内孔停止边界，其形状由边界轮廓曲线限定。 边界轮廓线至少部分地在与光学系统轴线正交扩展的平面之外运行。

公开(公告)号：US20090296204A1

公开(公告)日：2009-12-03

申请号：US12026592

申请日：2008-02-06

申请人： Karl-Heinz Schuster

发明人： Karl-Heinz Schuster

IPC分类号： G02B17/08 ,  G02B13/18

CPC分类号： G03F7/70341 ,  G02B17/0812 ,  G02B17/0892 ,  G03F7/70225 ,  G03F7/70275

摘要： A projection objective for imaging a pattern provided in an object surface onto an image surface of the projection objective has an object-side imaging subsystem for creating a final intermediate image closest to the image surface from radiation coming from the object surface and an image-side imaging subsystem for directly imaging the final intermediate image onto the image surface. The image-side imaging subsystem includes at least one aspheric primary correcting lens having an aspheric primary correcting surface. The object-side imaging subsystem includes a secondary correcting group having at least one secondary correcting lens having an aspheric secondary correcting surface. Conditions involving maximum incidence angles and subaperture offsets at the correcting surfaces are given which should be observed to obtain sufficient aberration correction at very high image-side numerical apertures NA.

摘要翻译： 用于将设置在物体表面中的图案成像到投影物镜的图像表面上的投影物镜具有物体侧成像子系统，用于从来自物体表面的辐射产生最靠近图像表面的最终中间图像，并且图像侧 成像子系统，用于将最终中间图像直接成像到图像表面上。 图像侧成像子系统包括具有非球面主修正表面的至少一个非球面初级校正透镜。 物体侧成像子系统包括具有至少一个具有非球面二次校正表面的次校正透镜的次校正组。 给出了在校正表面上涉及最大入射角和子孔径偏移的条件，应该观察这些条件以在非常高的像侧数值孔径NA处获得足够的像差校正。

公开(公告)号：US20090213342A1

公开(公告)日：2009-08-27

申请号：US11577531

申请日：2005-10-20

申请人： Hans-Joachim Weippert ,  Karl-Heinz Schuster

发明人： Hans-Joachim Weippert ,  Karl-Heinz Schuster

IPC分类号： G03B27/52 ,  G03B27/54

CPC分类号： G03F7/70216 ,  G03F7/2041

摘要： The invention relates to a projection exposure apparatus with a projection objective that serves to project a structure onto a substrate coated with a light-sensitive resist, wherein an immersion liquid is arranged between an optical element of the projection objective and the resist-coated substrate. As an immersion liquid saturated cyclic or polycyclic hydrocarbons can be used, such as for example cyclo-alkanes comprising up to 12 carbon atoms, saturated polycyclic hydrocarbons with 2 to 6 rings, bridged polycyclic hydrocarbons, cyclic ethers and derivatives of these substances.

摘要翻译： 本发明涉及一种具有投影物镜的投影曝光装置，该投影物体用于将结构投影到涂有光敏抗蚀剂的基板上，其中浸没液体布置在投影物镜的光学元件和抗蚀剂涂覆的基底之间。 作为浸渍液体，可以使用饱和的环状或多环烃，例如包含至多12个碳原子的环烷烃，具有2至6个环的饱和多环烃，桥连多环烃，环醚和这些物质的衍生物。

公开(公告)号：US07495840B2

公开(公告)日：2009-02-24

申请号：US11723441

申请日：2007-03-20

申请人： Karl-Heinz Schuster

发明人： Karl-Heinz Schuster

IPC分类号： G02B3/00

CPC分类号： G02B13/143 ,  G03F7/70241 ,  G03F7/70341

摘要： A very high-aperture, purely refractive projection objective having a multiplicity of optical elements has a system diaphragm (5) arranged at a spacing in front of the image plane. The optical element next to the image plane (3) of the projection objective is a planoconvex lens (34) having a substantially spherical entrance surface and a substantially flat exit surface. The planoconvex lens has a diameter that is at least 50% of the diaphragm diameter of the system diaphragm (5). It is preferred to arrange only positive lenses (32, 33, 34) between the system diaphragm (5) and image plane (3). The optical system permits imaging in the case of very high apertures of NA≧0.85, if appropriate of NA≧1.

摘要翻译： 具有多个光学元件的非常高孔径的纯折射投影物镜具有在像平面前方以间隔排列的系统光阑（5）。 靠近投影物镜的像面（3）的光学元件是具有基本上球形的入射表面和基本上平坦的出射表面的平凸透镜（34）。 平凸透镜的直径至少为系统隔膜（5）的膜片直径的50％。 优选仅在系统隔膜（5）和图像平面（3）之间布置正透镜（32,33,34）。 在NA> = 0.85的非常高的孔径的情况下，如果NA> = 1，光学系统允许成像。

公开(公告)号：US20080316452A1

公开(公告)日：2008-12-25

申请号：US12199998

申请日：2008-08-28

申请人： Aurelian Dodoc ,  Karl-Heinz Schuster ,  Joerg Mallmann ,  Wilhelm Ulrich ,  Hans-Juergen Rostalski

发明人： Aurelian Dodoc ,  Karl-Heinz Schuster ,  Joerg Mallmann ,  Wilhelm Ulrich ,  Hans-Juergen Rostalski

IPC分类号： G03G15/08

摘要： A microlithographic projection exposure apparatus contains an illumination system (12) for generating projection light (13) and a projection lens (20; 220; 320; 420; 520; 620; 720; 820; 920; 1020; 1120) with which a reticle (24) that is capable of being arranged in an object plane (22) of the projection lens can be imaged onto a light-sensitive layer (26) that is capable of being arranged in an image plane (28) of the projection lens. The projection lens is designed for immersion mode, in which a final lens element (L5; L205; L605; L705; L805; L905; L1005; L1105) of the projection lens on the image side is immersed in an immersion liquid (34; 334a; 434a; 534a). A terminating element (44; 244; 444; 544; 644; 744; 844; 944; 1044; 1144) that is transparent in respect of the projection light (13) is fastened between the final lens element on the image side and the light-sensitive layer.

摘要翻译： 微光刻投影曝光装置包括用于产生投影光（13）和投影透镜（20; 220; 320; 420; 520; 620; 720; 820; 920; 1020; 1120）的照明系统（12） 能够布置在投影透镜的物平面（22）中的光源（24）可以被成像到能够被布置在投影透镜的像平面（28）中的感光层（26）上。 投影透镜被设计用于浸没模式，其中在像侧的投影透镜的最终透镜元件（L5; L205; L605; L705; L805; L905; L1005; L1105）浸没在浸没液体（34; 334a ; 434a; 534a）。 关于投影光（13）透明的终端元件（44; 244; 444; 544; 644; 744; 844; 944; 1044; 1144）被紧固在图像侧的最终透镜元件与光 敏感层。

公开(公告)号：US20080309894A1

公开(公告)日：2008-12-18

申请号：US12195566

申请日：2008-08-21

申请人： Albrecht Ehrmann ,  Ulrich Wegmann ,  Rainer Hoch ,  Joerg Mallmann ,  Karl-Heinz Schuster ,  Ulrich Loering ,  Toralf Gruner ,  Bernhard Kneer ,  Bernhard Geuppert ,  Franz Sorg ,  Jens Kugler ,  Norbert Wabra

发明人： Albrecht Ehrmann ,  Ulrich Wegmann ,  Rainer Hoch ,  Joerg Mallmann ,  Karl-Heinz Schuster ,  Ulrich Loering ,  Toralf Gruner ,  Bernhard Kneer ,  Bernhard Geuppert ,  Franz Sorg ,  Jens Kugler ,  Norbert Wabra

IPC分类号： G03B27/42 ,  G03B27/52

CPC分类号： G03F7/70341 ,  G03F7/70591 ,  G03F7/70691 ,  G03F7/7085 ,  G03F7/70875 ,  G03F7/70891 ,  G03F7/70991

摘要： A microlithographic projection exposure apparatus includes a projection lens that is configured for immersion operation. For this purpose an immersion liquid is introduced into an immersion space that is located between a last lens of the projection lens on the image side and a photosensitive layer to be exposed. To reduce fluctuations of refractive index resulting from temperature gradients occurring within the immersion liquid, the projection exposure apparatus includes heat transfer elements that heat or cool partial volumes of the immersion liquid so as to achieve an at least substantially homogenous or at least substantially rotationally symmetric temperature distribution within the immersion liquid.

摘要翻译： 微光刻投影曝光装置包括配置为浸没操作的投影透镜。 为此，将浸没液体引入位于图像侧的投影透镜的最后一个透镜与待曝光的感光层之间的浸没空间中。 为了减少由浸没液体内发生的温度梯度引起的折射率的波动，投影曝光装置包括加热或冷却浸没液的部分体积的传热元件，以便达到至少基本均匀或至少基本上旋转对称的温度 在浸液中的分布。