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公开(公告)号：US07833681B2
公开(公告)日：2010-11-16
申请号：US11898587
申请日：2007-09-13
摘要： A mask blank is equipped with a thin film that forms a mask pattern formed on a substrate and a chemically amplified type resist film that is formed above the thin film. In the mask blank, a protective film that prevents movement of a substance that inhibits a chemical amplification function of the resist film from a bottom portion of the resist film to inside the resist film is provided between the thin film and the resist film. The mask blank suppresses the error of the line width dimension of the transfer pattern formed on the substrate to the design dimension of the transfer pattern line width of the transfer mask (actual dimension error) and also suppress linearity up to 10 nm.
摘要翻译： 掩模坯料配备有形成在基板上形成的掩模图案的薄膜和形成在薄膜上方的化学放大型抗蚀剂膜。 在掩模坯料中，在薄膜和抗蚀剂膜之间设置防止从抗蚀剂膜的底部到抗蚀剂膜内部阻止抗蚀剂膜的化学放大功能的物质的移动的保护膜。 掩模坯料将形成在基板上的转印图案的线宽尺寸的误差抑制为转印掩模的转印图案线宽度的设计尺寸（实际尺寸误差），并且还抑制高达10nm的线性度。
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72.发明申请Photomask Blank, Photomask Manufacturing Method and Semiconductor Device Manufacturing Method 审中-公开光掩模空白，光掩模制造方法和半导体器件制造方法公开(公告)号：US20080305406A1
公开(公告)日：2008-12-11
申请号：US11631472
申请日：2005-07-08
摘要： By increasing the dry etching rate of a light shielding film, the dry etching time can be shortened so that loss of a resist film is reduced. As a result, a reduction in thickness (to 300 nm or less) of the resist film becomes possible so that pattern resolution and pattern accuracy (CD accuracy) can be improved. Further, by shortening the dry etching time, a photomask blank and a photomask manufacturing method are provided, which can form a pattern of the light shielding film having an excellent sectional shape. In a photomask blank having a light shielding film on an optically transparent substrate, the photomask blank being a mask blank for a dry etching process adapted for a photomask producing method of patterning the light shielding film by the dry etching process using as a mask a pattern of a resist formed on the light shielding film, the light shielding film is made of a material having a selectivity exceeding 1 with respect to the resist in the dry etching process.
摘要翻译： 通过提高遮光膜的干蚀刻速度，可以缩短干蚀刻时间，降低抗蚀剂膜的损失。 结果，可以减小抗蚀剂膜的厚度（至300nm或更小），从而可以提高图案分辨率和图案精度（CD精度）。 此外，通过缩短干蚀刻时间，提供了可以形成具有优异截面形状的遮光膜的图案的光掩模坯料和光掩模制造方法。 在具有在光学透明基板上具有遮光膜的光掩模坯料中，光掩模坯料是用于干蚀刻工艺的掩模坯料，其适用于通过使用掩模图案的干蚀刻工艺对遮光膜进行图案化的光掩模制造方法 形成在遮光膜上的抗蚀剂，在干蚀刻工艺中，光屏蔽膜由相对于抗蚀剂选择性超过1的材料制成。
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公开(公告)号：US20060259591A1
公开(公告)日：2006-11-16
申请号：US11431525
申请日：2006-05-11
申请人： Masahiro Hashimoto
发明人： Masahiro Hashimoto
IPC分类号： G06F15/16
CPC分类号： H04L67/06 , H04L67/125 , H04L67/322 , H04L2012/2849
摘要： In a client-server system comprising a plurality of client terminal devices and a server device which transmits and receives information to and from the plurality of client terminal devices, the server device comprises an acquisition unit which obtains a priority of the client terminal device from a priority storage unit, based on a control request from the client terminal device, a determination unit which determines whether or not the control request is accepted, based on the obtained priority, and an execution unit which executes control in response to the control request when the determination unit determines that the control request is accepted.
摘要翻译： 在包括多个客户终端装置的客户服务器系统和向多个客户终端装置发送信息的服务器装置和服务器装置之间，服务器装置包括获取单元，该获取单元从客户端终端装置 优先级存储单元，基于来自客户终端设备的控制请求，确定单元，其基于获得的优先级来确定控制请求是否被接受;以及执行单元，当执行控制请求时，响应于控制请求执行控制 确定单元确定控制请求被接受。
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74.发明授权公开(公告)号：US06668068B2
公开(公告)日：2003-12-23
申请号：US09313543
申请日：1999-05-14
申请人： Masahiro Hashimoto
发明人： Masahiro Hashimoto
IPC分类号： G06K900
CPC分类号： G06T1/0021 , H04N5/913 , H04N2005/91335
摘要： Image attribute detection means for detecting the attribute of an input image (attribute “A”) and image attribute altering means for altering the image attribute in the input image on the basis of the attribute detection result of the input image are provided to output an output image having a new attribute (attribute “B”). The image attribute detection means includes first DCT means for subjecting the input image to discrete cosine transform to obtain frequency components, second DCT means for subjecting the original image to discrete cosine transform to obtain original frequency components, and means of subtracting the original frequency components from the image frequency components and dividing the subtraction result by the image frequency components to detect the electronic watermark data.
摘要翻译： 提供用于检测输入图像的属性（属性“A”）的图像属性检测装置和用于基于输入图像的属性检测结果改变输入图像中的图像属性的图像属性改变装置，以输出输出 具有新属性（属性“B”）的图像。 图像属性检测装置包括：第一DCT装置，用于对输入图像进行离散余弦变换以获得频率分量;第二DCT装置，用于对原始图像进行离散余弦变换以获得原始频率分量，以及从原始频率分量中减去原始频率分量的装置 图像频率分量，并将减法结果除以图像频率分量，以检测电子水印数据。
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公开(公告)号：US06424726B2
公开(公告)日：2002-07-23
申请号：US09907256
申请日：2001-07-17
申请人： Hirotaka Nakano , Masahiro Hashimoto , Koji Manabe
发明人： Hirotaka Nakano , Masahiro Hashimoto , Koji Manabe
IPC分类号： G06K900
CPC分类号： H04N19/00 , G06T1/0021 , G06T1/0035 , G06T1/20 , G06T2201/0052 , G06T2201/0053 , H04N1/32154 , H04N1/32165 , H04N1/32187 , H04N1/32192 , H04N1/32277 , H04N19/467 , H04N19/60 , H04N21/23892 , H04N21/8358 , H04N2201/324
摘要： An image data encoding system is disclosed, that comprises a discrete cosine transforming means for discrete-cosine transforming the original image, an electronic watermark data embedding means for embedding the electronic watermark data in the data that has been transformed by the discrete cosine transforming means, and a data selecting means for selecting the output signal of the discrete cosine transforming means or the output signal of the electronic watermark data embedding means. Another image data encoding system is also disclosed, that comprises an electronic watermark embedding means for embedding electronic watermark data selected from a plurality of types of electronic watermark data to the digital image data, wherein at least one of the plurality of types of electronic watermark data is predetermined electronic watermark data that does not affect the digital image data even if the electronic watermark data is embedded in the digital image data.
摘要翻译： 公开了一种图像数据编码系统，其包括用于离散余弦变换原始图像的离散余弦变换装置，用于将电子水印数据嵌入已由离散余弦变换装置变换的数据中的电子水印数据嵌入装置， 以及数据选择装置，用于选择离散余弦变换装置的输出信号或电子水印数据嵌入装置的输出信号。 还公开了另一种图像数据编码系统，其包括用于将从多种类型的电子水印数据中选出的电子水印数据嵌入数字图像数据的电子水印嵌入装置，其中，多种类型的电子水印数据 即使将电子水印数据嵌入在数字图像数据中也是不影响数字图像数据的预定电子水印数据。
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公开(公告)号：US06298142B1
公开(公告)日：2001-10-02
申请号：US09022885
申请日：1998-02-12
申请人： Hirotaka Nakano , Masahiro Hashimoto , Koji Manabe
发明人： Hirotaka Nakano , Masahiro Hashimoto , Koji Manabe
IPC分类号： G06K900
CPC分类号： H04N19/00 , G06T1/0021 , G06T1/0035 , G06T1/20 , G06T2201/0052 , G06T2201/0053 , H04N1/32154 , H04N1/32165 , H04N1/32187 , H04N1/32192 , H04N1/32277 , H04N19/467 , H04N19/60 , H04N21/23892 , H04N21/8358 , H04N2201/324
摘要： An image data encoding system has a discrete cosine transformer for discrete cosine transforming the original image, an electronic watermark data embedding circuit for embedding the electronic watermark data in the data that has been transformed by the discrete cosine transformer, and a data selector for selecting the output signal of the discrete cosine transformer or the output signal of the electronic watermark data embedding circuit. Another image data encoding system has an electronic watermark embedding circuit for embedding electronic watermark data selected from a plurality of types of electronic watermark data to the digital image data, wherein at least one of the plurality of types of electronic watermark data is predetermined electronic watermark data that does not affect the digital image data even if the electronic watermark data is embedded in the digital image data.
摘要翻译： 图像数据编码系统具有用于离散余弦变换原始图像的离散余弦变换器，用于将电子水印数据嵌入到由离散余弦变换器变换的数据中的电子水印数据嵌入电路，以及用于选择 离散余弦变换器的输出信号或电子水印数据嵌入电路的输出信号。 另一图像数据编码系统具有电子水印嵌入电路，用于将从多种类型的电子水印数据中选出的电子水印数据嵌入到数字图像数据中，其中，多种类型的电子水印数据中的至少一种是预定的电子水印数据 即使电子水印数据被嵌入在数字图像数据中也不影响数字图像数据。
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公开(公告)号：US4385365A
公开(公告)日：1983-05-24
申请号：US10470
申请日：1979-02-08
CPC分类号： G06F9/461 , G06F9/3863
摘要： A data shunting and recovering device is provided to shunt and hold the data stored in a register and its address before writing the register during a delay period following generation of an interrupt. This data is then restored into the register when an instruction of recovering is given. Therefore, it is allowed to achieve the moderating effects of delaying the stopping of the stage advance in data processing upon generation of an instruction for interruption without loss of data stored in the memory prior to writing during this delay period.
摘要翻译： 提供数据分流和恢复装置，用于在产生中断之后的延迟时段期间，在写入寄存器之前分流和保持存储在寄存器中的数据及其地址。 当给出恢复指令时，该数据被恢复到寄存器中。 因此，在该延迟期间，在写入之前，在生成中断指令的同时，不会丢失存储在存储器中的数据的数据，可以实现延迟数据处理中的数据处理的停止的调节效果。
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公开(公告)号：US09469740B2
公开(公告)日：2016-10-18
申请号：US14122501
申请日：2012-04-18
申请人： Takafumi Hashimoto , Hirohito Minowa , Takashi Shimada , Masahiro Hashimoto , Katsuhiro Miyoshi , Yoshihiro Naruse
发明人： Takafumi Hashimoto , Hirohito Minowa , Takashi Shimada , Masahiro Hashimoto , Katsuhiro Miyoshi , Yoshihiro Naruse
CPC分类号： C08K3/04 , B29C70/06 , B29C70/14 , C08J5/042 , C08J5/24 , C08J2300/22 , C08J2377/00
摘要： A carbon-fiber-reinforced plastic prepared by impregnating a matrix resin into a sheet-like base material includes discontinuous carbon fibers, wherein a content ratio of carbon fibers having lengths of 10 mm or longer in the base material is 60 wt % or more relative to a total amount of the carbon fibers, and an average value of orientation degrees of carbon fibers contained in the base material is 2-10.
摘要翻译： 通过将基质树脂浸渍到片状基材中而制备的碳纤维增强塑料包括不连续的碳纤维，其中基材中长度为10mm以上的碳纤维的含量比例为60重量％以上 相对于碳纤维的总量，基材中所含的碳纤维的取向度的平均值为2-10。
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79.发明授权Photomask blank, photomask, method of manufacturing the same, and method of manufacturing a semiconductor device 有权光掩模坯料，光掩模，其制造方法以及半导体装置的制造方法公开(公告)号：US08940462B2
公开(公告)日：2015-01-27
申请号：US13121851
申请日：2009-09-30
摘要： [Object] A photomask blank for use in producing a photomask for exposure with an ArF excimer laser. The photomask blank is intended to be applied to the 32-nm DRAM half-pitch (hp) and succeeding generations in the semiconductor design rule.[Solution] The photomask blank is for use in producing a photomask to which an exposure light having a wavelength not longer than 200 nm is applied. The photomask blank is characterized by comprising a transparent substrate, a light-shielding film formed on the transparent substrate and containing molybdenum and silicon, and an etching mask film formed directly on the light-shielding film and containing chromium. The photomask blank is further characterized in that the light-shielding film comprises a light-shielding layer and an antireflection layer which have been disposed in this order from the transparent substrate side, the light-shielding layer having a molybdenum content of 9-40 at %, and that the etching mask film has a chromium content of 45 at % or lower.
摘要翻译： [目的]一种用于制造用ArF准分子激光曝光的光掩模的光掩模坯料。 光掩模坯料旨在应用于半导体设计规则中的32nm DRAM半间距（hp）和后代。 [解决方案]光掩模坯料用于制造其中施加具有不超过200nm的波长的曝光光的光掩模。 光掩模坯料的特征在于包括透明基板，形成在透明基板上并含有钼和硅的遮光膜，以及直接形成在遮光膜上并含有铬的蚀刻掩模膜。 光掩模坯料的特征还在于，所述遮光膜包括从透明基板侧依次设置的遮光层和防反射层，所述遮光层的钼含量为9〜40个 ％，蚀刻掩模膜的铬含量为45原子％以下。
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公开(公告)号：US08883022B2
公开(公告)日：2014-11-11
申请号：US13641220
申请日：2011-04-04
申请人： Osamu Nozawa , Masahiro Hashimoto
发明人： Osamu Nozawa , Masahiro Hashimoto
CPC分类号： G11B5/855 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F7/0015
摘要： Provided is a mask blank which is used for manufacturing an imprinting mold and which may form a fine mold pattern with high pattern accuracy. A mask blank (10) includes a transparent substrate (1) and a thin film (2) contacted with a surface of the substrate. The thin film (2) includes a laminated film including an upper layer (4) which is composed of a material containing silicon (Si) or a material containing tantalum (Ta), and a lower layer (3) which is composed of a material containing at least one of hafnium (Hf) and zirconium (Zr) and containing substantially no oxygen.
摘要翻译： 提供了用于制造压印模具的掩模坯料，并且可以形成具有高图案精度的精细模具图案。 掩模板（10）包括透明基板（1）和与基板表面接触的薄膜（2）。 薄膜（2）包括层叠膜，该层叠膜包括由含有硅（Si）的材料或含有钽（Ta）的材料构成的上层（4）和由材料构成的下层（3） 含有铪（Hf）和锆（Zr）中的至少一种并且基本上不含氧。
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