公开(公告)号：US20150101754A1

公开(公告)日：2015-04-16

申请号：US14504988

申请日：2014-10-02

Applicant: PSK INC.

Inventor： Seung Kook YANG

IPC: H01L21/677 ,  H01L21/687

CPC classification number: H01L21/67748 ,  H01L21/67201 ,  H01L21/67742 ,  H01L21/67745

Abstract: Provided is an apparatus for treating a substrate. The apparatus for treating the substrate includes a carrying unit between a second chamber and a loadlock chamber. The carrying unit includes an arm, a blade for supporting the substrate, and a rotation driver for rotating the arm. The carrying unit disposed between the second chamber and the loadlock chamber receives the substrate transferred in the loadlock chamber to transfer the substrate onto a substrate supporter in the second chamber.

Abstract translation: 提供了一种处理基板的装置。 用于处理基板的装置包括在第二室和装载室之间的承载单元。 承载单元包括臂，支撑基板的叶片和用于旋转臂的旋转驱动器。 设置在第二室和负载锁定室之间的承载单元容纳转移到负载锁定室中的衬底，以将衬底转移到第二室中的衬底支撑件上。

公开(公告)号：US20150020974A1

公开(公告)日：2015-01-22

申请号：US13946162

申请日：2013-07-19

Applicant: PSK INC.

Inventor： YoungYeon JI

IPC: H05H15/00

CPC classification number: H01J37/3244 ,  H01J37/32633 ,  H01J37/32853 ,  H01J37/32862

Abstract: The present invention relates to a substrate treating apparatus, and more particularly, to an apparatus treating a substrate using plasma. In an embodiment, a baffle is formed with holes distributing a process gas excited to a plasma state, and has a surface which is treated with a surface treating material comprising a silicon compound.

Abstract translation: 本发明涉及一种基板处理装置，更具体地，涉及使用等离子体处理基板的装置。 在一个实施例中，挡板形成有分配被激发到等离子体状态的处理气体的孔，并且具有用包含硅化合物的表面处理材料处理的表面。

公开(公告)号：US20140083612A1

公开(公告)日：2014-03-27

申请号：US13963162

申请日：2013-08-09

Applicant: PSK INC.

Inventor： YoungYeon JI

IPC: H01L21/02

CPC classification number: H01L21/02041 ,  H01J37/321 ,  H01J37/32357 ,  H01J37/32422 ,  H01J37/32477 ,  H01J37/32633

Abstract: Provided is a baffle. The baffle has holes for distributing a process gas excited in a plasma state. A surface of the baffle is treated by using a surface treating material containing an aromatic compound.

Abstract translation: 提供挡板。 挡板具有用于分配以等离子体状态激发的工艺气体的孔。 通过使用含有芳族化合物的表面处理材料处理挡板的表面。