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公开(公告)号：US20100173034A1
公开(公告)日：2010-07-08
申请号：US12717664
申请日：2010-03-04
CPC分类号： B29C43/003 , B29C2043/025 , B82Y10/00 , B82Y40/00 , G03F7/0002 , Y10S977/887
摘要： The present invention includes a template for patterning liquids disposed on a substrate. The template includes a body having opposed first and second surfaces with one surface having at least one recess and the other surface having a patterning region. In one embodiment, the template may be mounted to a fluid chamber having an inlet and a throughway. The template may be connected to the throughway and the inlet is connected to a fluid source.
摘要翻译： 本发明包括用于图案化液体的模板，该模板设置在基板上。 模板包括具有相对的第一和第二表面的主体，一个表面具有至少一个凹部，另一个表面具有图案化区域。 在一个实施例中，模板可以安装到具有入口和通道的流体室。 模板可以连接到通道，并且入口连接到流体源。
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公开(公告)号：US20100140841A1
公开(公告)日：2010-06-10
申请号：US12707365
申请日：2010-02-17
IPC分类号： B28B11/08
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , C23F1/08
摘要： The present invention provides a method for patterning a substrate with a template having a mold that features positioning conformable material between the substrate and the mold and filling a volume defined between the mold and the substrate with the conformable material through capillary action between the conformable material and one of the mold and the substrate. Thereafter, the conformable material is solidified. Specifically, the distance between the mold and the substrate is controlled to a sufficient degree to attenuate, if not avoid, compressive forces between the mold and the substrate. As a result, upon initial contact of the mold with the conformable material, spontaneous capillary filling of the volume between the mold and the substrate occurs.
摘要翻译： 本发明提供了一种用模板图案化模板的方法，该模板具有在基板和模具之间具有定位适形材料的模具，并且通过适形材料之间的毛细管作用在适形材料之间填充限定在模具和基板之间的体积， 模具和基材之一。 此后，使适形材料固化。 具体地说，模具和基板之间的距离被控制到足够的程度以减小模具和基板之间的压缩力（如果不是避免的话）。 结果，在模具与适形材料初次接触时，发生模具和基板之间的体积的自发毛细管填充。
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公开(公告)号：US20100112310A1
公开(公告)日：2010-05-06
申请号：US12607547
申请日：2009-10-28
申请人： Van Nguyen Truskett , Gerard M. Schmid , Michael N. Miller , Douglas J. Resnick , Benjamin G. Eynon, JR. , Byung-Jin Choi , Kosta S. Selinidis , Sidlgata V. Sreenivasan , Nicholas A. Stacey
发明人： Van Nguyen Truskett , Gerard M. Schmid , Michael N. Miller , Douglas J. Resnick , Benjamin G. Eynon, JR. , Byung-Jin Choi , Kosta S. Selinidis , Sidlgata V. Sreenivasan , Nicholas A. Stacey
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , G03F9/708 , G03F9/7084 , Y10T428/24802
摘要： Systems and methods for providing identification patterns on substrates are described.
摘要翻译： 描述了在基板上提供识别图案的系统和方法。
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公开(公告)号：US20100015270A1
公开(公告)日：2010-01-21
申请号：US12498748
申请日：2009-07-07
申请人： Byung-Jin Choi , Kosta S. Selinidis
发明人： Byung-Jin Choi , Kosta S. Selinidis
IPC分类号： B29C59/02
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： A nano-imprint lithography template system having a support layer with at least one port, and a patterned surface layer coupled to the support layer. Coupling of the patterned surface layer to the support layer forms a cavity. Pressure within the cavity is controlled through the port of the support layer.
摘要翻译： 一种纳米压印光刻模板系统，其具有至少一个端口的支撑层，以及耦合到所述支撑层的图案化表面层。 图案化表面层与支撑层的耦合形成空腔。 通过支撑层的端口控制空腔内的压力。
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公开(公告)号：US07636999B2
公开(公告)日：2009-12-29
申请号：US11047499
申请日：2005-01-31
IPC分类号： B23Q7/00
CPC分类号： H01L21/6831 , H01L21/6838 , Y10T29/4978 , Y10T29/49998
摘要： A method of retaining a substrate to a wafer chuck. The method features accelerating a portion of the substrate toward the wafer chuck, generating a velocity of travel of the substrate toward the wafer chuck, and reducing the velocity before the substrate reaches the wafer chuck. In this manner, the force of impact of the portion with the wafer chuck is greatly reduced, which is believed to reduce the probability that the structural integrity of the substrate, and layers on the substrate and/or the wafer chuck, are damaged.
摘要翻译： 将基板保持在晶片卡盘上的方法。 该方法特征在于，将基板的一部分朝向晶片卡盘加速，产生基板朝向晶片卡盘的移动速度，并降低基板到达晶片卡盘之前的速度。 以这种方式，晶片卡盘的部分的冲击力大大降低，这被认为降低了基板的结构完整性和基板和/或晶片卡盘上的层被损坏的可能性。
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86.发明授权公开(公告)号：US07635445B2
公开(公告)日：2009-12-22
申请号：US11108208
申请日：2005-04-18
申请人： Byung-Jin Choi , Anshuman Cherala , Yeong-jun Choi , Mario J. Meissl , Sidlgata V. Sreenivasan , Norman E. Schumaker , Xiaoming Lu , Ian M. McMackin , Daniel A. Babbs
发明人： Byung-Jin Choi , Anshuman Cherala , Yeong-jun Choi , Mario J. Meissl , Sidlgata V. Sreenivasan , Norman E. Schumaker , Xiaoming Lu , Ian M. McMackin , Daniel A. Babbs
IPC分类号： H01L21/31 , H01L21/469
CPC分类号： H01L21/6875 , B82Y10/00 , B82Y40/00 , G03F7/0002 , H01L21/6838 , Y10S977/887
摘要： The present invention is directed towards a method of separating a mold, included in a template, from a layer disposed on a substrate, the method including, inter alia, applying a separation force to the template to separate the template from the layer; and facilitating localized deformation in the substrate to reduce the separation force required to achieve separation.
摘要翻译： 本发明涉及一种将包含在模板中的模具与设置在基板上的层分离的方法，该方法尤其包括向模板施加分离力以将模板与层分离; 并且促进基板中的局部变形以减小实现分离所需的分离力。
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公开(公告)号：US20090214761A1
公开(公告)日：2009-08-27
申请号：US12392663
申请日：2009-02-25
IPC分类号： C23C16/52
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： Defects and/or particles during an imprint lithography process may provide exclusion zones and/or transition zones in the patterned layer. Exclusion zones and/or transition zones in the patterned layer may be identified to provide a region of interest on a template.
摘要翻译： 在压印光刻过程中的缺陷和/或颗粒可以在图案化层中提供排除区和/或过渡区。 可以识别图案化层中的排除区和/或过渡区以在模板上提供感兴趣的区域。
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公开(公告)号：US07462028B2
公开(公告)日：2008-12-09
申请号：US11695263
申请日：2007-04-02
IPC分类号： B28B11/08
CPC分类号： G03F7/0002 , B29C43/003 , B29C43/021 , B29C2043/025 , B29C2043/5833 , B82Y10/00 , B82Y40/00
摘要： The present invention is directed towards a method and a system to create and maintain a desired environment in the vicinity of a nano-imprint lithography template by creation of a partial vacuum using channels or holes in the template holding the nano-imprint mold.
摘要翻译： 本发明涉及通过使用保持纳米压印模具的模板中的通道或孔产生部分真空来在纳米压印光刻模板附近创建和维持所需环境的方法和系统。
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公开(公告)号：US07432634B2
公开(公告)日：2008-10-07
申请号：US11068526
申请日：2005-02-28
IPC分类号： H02N2/00
CPC分类号： G03F7/0002 , B29C43/021 , B29C43/50 , B29C2043/025 , B29C2043/5007 , B29C2043/5092 , B29C2791/008 , B82Y10/00 , B82Y40/00 , Y10T156/1168
摘要： An apparatus to control displacement of a body spaced-apart from a surface includes a flexure system having a first flexure member defining a first axis of rotation and a second flexure member defining a second axis of rotation. A body is coupled to the flexure system to move about a plurality of axes. An actuation system is coupled to the flexure system to selectively constrain movement of the body along a subset of the plurality of axes.
摘要翻译： 用于控制与表面间隔开的物体的位移的装置包括具有限定第一旋转轴线的第一弯曲构件和限定第二旋转轴线的第二挠曲构件的挠曲系统。 身体联接到挠曲系统以围绕多个轴线移动。 致动系统联接到挠曲系统以选择性地限制身体沿着多个轴的子集的运动。
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公开(公告)号：US07387508B2
公开(公告)日：2008-06-17
申请号：US11142838
申请日：2005-06-01
IPC分类号： B29C59/02
CPC分类号： G03F7/0002 , B29C43/021 , B29C2043/025 , B29C2043/5858 , B82Y10/00 , B82Y40/00 , Y10S977/887
摘要： The present invention is directed to a compliant device comprising a support body, a floating body, and a plurality of flexure arms. Each of the plurality of flexure arms is connected between the support body and the floating body to transfer a load therebetween in parallel. To that end, the flexure arms have first and second sets of flexure joints. The first set of flexure joints facilitate rotational movement of said flexure arm about a first axis extending along a first direction. The second set of flexure joints are arranged to facilitate rotational movement of the flexure arm about a second axis, extending along a second direction that is transverse to the first direction. The flexure joints are resolute joints.
摘要翻译： 本发明涉及一种包括支撑体，浮体和多个弯曲臂的柔性装置。 多个挠曲臂中的每一个连接在支撑体和浮体之间，以在它们之间平行地传送负载。 为此，弯曲臂具有第一组和第二组挠曲接头。 第一组弯曲接头便于围绕围绕第一方向延伸的第一轴线的所述弯曲臂的旋转运动。 第二组弯曲接头被布置成便于弯曲臂围绕第二轴线的旋转运动，第二轴线沿着横向于第一方向的第二方向延伸。 挠性接头是坚固的接头。
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