利索-全球专利检索

  1. 登录
  2. 注册

搜索结果

30 条记录 (耗时 0.02 秒)

    Micro-Conformal Templates for Nanoimprint Lithography
    1.
    发明申请
    Micro-Conformal Templates for Nanoimprint Lithography 有权
    纳米压印光刻的微型保形模板

    公开(公告)号：US20110183027A1

    公开(公告)日：2011-07-28

    申请号：US13014354

    申请日：2011-01-26

    申请人： Michael N. Miller ,  Frank Y. Xu ,  Nicholas A. Stacey

    发明人： Michael N. Miller ,  Frank Y. Xu ,  Nicholas A. Stacey

    IPC分类号： B28B11/08 ,  B29C33/38

    CPC分类号： G03F7/0002 ,  B82Y10/00 ,  B82Y40/00

    摘要： A micro-conformal nanoimprint lithography template includes a backing layer and a nanopatterned layer adhered to the backing layer. The elastic modulus of the backing layer exceeds the elastic modulus of the nanopatterned layer. The micro-conformal nanoimprint lithography template can be used to form a patterned layer from an imprint resist on a substrate, the substrate having a micron-scale defect, such that an excluded distance from an exterior surface of the micron-scale defect to the patterned layer formed by the nanoimprint lithography template is less than a height of the defect. The nanoimprint lithography template can be used to form multiple imprints with no reduction in feature fidelity.

    摘要翻译： 微型共形纳米压印光刻模板包括背衬层和粘附到背衬层的纳米图案化层。 背衬层的弹性模量超过纳米图案层的弹性模量。 微型共形纳米压印光刻模板可以用于从基底上的抗蚀刻剂形成图案化层，该衬底具有微米级缺陷，使得从微米级缺陷的外表面到图案化的排除距离 由纳米压印光刻模板形成的层小于缺陷的高度。 纳米压印光刻模板可以用于形成多个压印，而不会降低特征保真度。

    Reverse tone patterning on surfaces having planarity perturbations
    3.
    发明授权
    Reverse tone patterning on surfaces having planarity perturbations 有权
    具有平面扰动的表面上的反向色调图案

    公开(公告)号：US07241395B2

    公开(公告)日：2007-07-10

    申请号：US10946577

    申请日：2004-09-21

    申请人： Sidlgata V. Sreenivasan ,  Nicholas A. Stacey

    发明人： Sidlgata V. Sreenivasan ,  Nicholas A. Stacey

    IPC分类号： C03C25/68 ,  B44C1/22

    CPC分类号： G03F7/0002 ,  B29C43/021 ,  B29C2043/025 ,  B82Y10/00 ,  B82Y40/00 ,  H01L21/3081 ,  H01L21/3086 ,  H01L21/31116 ,  H01L21/31138 ,  H01L21/31144 ,  H01L21/312 ,  H01L21/3121

    摘要： The present invention features a method of patterning a substrate that includes forming, on the substrate, a first film having an original pattern that includes a plurality of projections a subset of which extends from a nadir surface terminating in an apex surface defining a height therebetween. A second film is disposed upon the first film and defines a surface spaced-apart from the apex surface of the plurality of projections. A variation in a distance between the apex surface of any one of the plurality of projections and the surface being within a predetermined range. A recorded pattern is transferred onto the substrate that corresponds to the original pattern, within the predetermined range being selected to minimize pattern distortions in the recorded pattern.

    摘要翻译： 本发明的特征在于一种图案化衬底的方法，其包括在衬底上形成具有原始图案的第一膜，该第一膜包括多个突起，该多个突起的一个子集从终止于限定其间的高度的顶点表面的最低点表面延伸。 第二膜设置在第一膜上并且限定与多个突起的顶点间隔开的表面。 多个突起中的任何一个的顶点表面与表面之间的距离的变化在预定范围内。 在被选择的预定范围内，将记录图案转印到与原始图案对应的基板上，以使记录图案中的图案失真最小化。

    Photoimageable, aqueous acid soluble polyimide polymers
    6.
    发明授权
    Photoimageable, aqueous acid soluble polyimide polymers 失效

    公开(公告)号：US06559245B2

    公开(公告)日：2003-05-06

    申请号：US10038270

    申请日：2002-01-03

    申请人： Guoping Mao ,  Nanayakkara L. D. Somasiri ,  Nicholas A. Stacey

    发明人： Guoping Mao ,  Nanayakkara L. D. Somasiri ,  Nicholas A. Stacey

    IPC分类号： C08F28304

    CPC分类号： C08G73/1007 ,  C08G73/1025 ,  G03F7/0387 ,  G03F7/164 ,  H05K3/287 ,  H05K2203/135 ,  Y10S430/136

    摘要： A photoimageable, aqueous acid soluble polyimide polymer comprising an anhydride, including a substituted benzophenone nucleus, a diamine reacted with the anhydride to form a photosensitive polymer intermediate, and at least 60 Mole % of solubilizing amine reacted with the photosensitive polymer intermediate to form the photoimageable, aqueous acid soluble polyimide polymer. An emulsion for electrophoretic deposition of a coating of a photoimageable, aqueous acid soluble polyimide polymer comprises a dispersed phase, including the photoimageable aqueous acid soluble polyimide polymer, dissolved in an organic solvent and a dispersion phase including a coalescence promoter and water. The emulsion may be applied, by electrophoretic deposition, to a conductive structure to provide a photoimageable coating on the conductive structure. After exposing the coating to a pattern of radiation for photocrosslinking exposed parts of the photoimageable aqueous acid soluble polyimide polymer, an aqueous acid developer solution removes unexposed photoimageable aqueous acid soluble polyimide polymer to reveal a crosslinked polyimide polymer image of the radiation pattern.

    Materials for imprint lithography
    8.
    发明授权
    Materials for imprint lithography 有权
    压印光刻材料

    公开(公告)号：US08076386B2

    公开(公告)日：2011-12-13

    申请号：US10784911

    申请日：2004-02-23

    申请人： Frank Y. Xu ,  Michael P. C. Watts ,  Nicholas A. Stacey

    发明人： Frank Y. Xu ,  Michael P. C. Watts ,  Nicholas A. Stacey

    IPC分类号： C08J7/16 ,  C08J7/18 ,  C08K3/00 ,  C08K5/54 ,  C08K5/541

    CPC分类号： G03F7/0002 ,  B82Y10/00 ,  B82Y40/00 ,  C09D11/101

    摘要： The present invention is directed to a material for use in imprint lithography that features a composition having a viscosity associated therewith and including a surfactant, a polymerizable component, and an initiator responsive to a stimuli to vary the viscosity in response thereto, with the composition, in a liquid state, having the viscosity being lower than about 100 centipoises, a vapor pressure of less than about 20 Torr, and in a solid cured state a tensile modulus of greater than about 100 MPa, a break stress of greater than about 3 MPa and an elongation at break of greater than about 2%.

    摘要翻译： 本发明涉及一种用于压印光刻的材料，其特征在于具有与之相关的粘度的组合物，并且包括表面活性剂，可聚合组分和响应于刺激物的引发剂以响应于其而改变粘度， 在液体状态下，其粘度低于约100厘泊，蒸气压小于约20托，并且在固体固化状态下，拉伸模量大于约100MPa，断裂应力大于约3MPa 并且断裂伸长率大于约2％。