IMPRINT APPARATUS, IMPRINT METHOD, AND METHOD OF MANUFACTURING ARTICLE
    6.
    发明申请
    IMPRINT APPARATUS, IMPRINT METHOD, AND METHOD OF MANUFACTURING ARTICLE 审中-公开
    IMPRINT APPARATUS,IMPRINT METHOD,AND METHOD OF MANUFACTURING ARTICLE

    公开(公告)号:US20160193758A1

    公开(公告)日:2016-07-07

    申请号:US14978559

    申请日:2015-12-22

    IPC分类号: B29C43/58 B29C33/42 B29C43/02

    摘要: The present invention provides an imprint apparatus which forms a pattern in an imprint material on a substrate by using a mold, the apparatus including a tilt unit configured to tilt the mold and the substrate relatively, a detection unit configured to detect an interference pattern between light reflected by the mold and light reflected by the substrate, and a control unit configured to control, based on the interference pattern detected by the detection unit in a state in which the mold and the imprint material on the substrate are in contact with each other, the tilt unit to reduce relative tilts between the mold and the substrate in the state.

    摘要翻译: 本发明提供一种压印装置,其通过使用模具在基板上的压印材料中形成图案,所述装置包括相对于倾斜模具和基板的倾斜单元,被配置为检测光的干涉图案的检测单元 由模具反射的光和由基板反射的光;以及控制单元,被配置为基于在基板上的模具和压印材料彼此接触的状态下基于由检测单元检测到的干涉图案, 该倾斜单元在该状态下减少模具和基板之间的相对倾斜度。

    MOLDING APPARATUS, MOLDING APPARATUS UNIT, AND MOLDING METHOD
    8.
    发明申请
    MOLDING APPARATUS, MOLDING APPARATUS UNIT, AND MOLDING METHOD 审中-公开
    成型设备,成型设备和成型方法

    公开(公告)号:US20150224686A1

    公开(公告)日:2015-08-13

    申请号:US14353437

    申请日:2013-10-03

    IPC分类号: B29C43/58

    摘要: A molding apparatus (1) includes: a servomotor (11) for pressing a resin component (W) by moving an upper mold (MU) in a direction in which the upper mold (MU) is made close to a lower mold (ML); servomotors (12a and 13a) each of which retains X-coordinate and Y-coordinate positions of the lower mold (ML); and a position detection section (41) which determines whether or not the resin component which is sandwiched between the upper mold and the lower mold has been cured, the servomotors each terminating the retention of the lower mold when the resin component has been cured. This makes it possible to obtain a molded product while preventing positional displacement caused by a decrease in volume of a resin which is being cured.

    摘要翻译: 成形装置(1)包括:伺服电动机(11),用于通过使上模(MU)沿上模(MU)靠近下模(ML)的方向移动上模(MU)来按压树脂部件(W) ; 每个保持下模具(ML)的X坐标和Y坐标位置的伺服电动机(12a和13a); 以及位置检测部(41),其判定夹在上模和下模之间的树脂成分是否已经固化,当树脂成分固化时,伺服电动机各自终止下模的保持。 这使得可以在防止由正在固化的树脂的体积减小引起的位置偏移的同时获得模制产品。

    Method and system for determining and dispensing resin for a compression molding process flow
    9.
    发明授权
    Method and system for determining and dispensing resin for a compression molding process flow 有权
    用于确定和分配用于压缩成型工艺流程的树脂的方法和系统

    公开(公告)号:US09011127B2

    公开(公告)日:2015-04-21

    申请号:US13586749

    申请日:2012-08-15

    摘要: The present disclosure is directed to a system and method for forming a plurality of packaged dice on a carrier, the carrier including a storage medium configured to store an indication of a total number of unpackaged dice on the carrier. The forming includes providing a quantity of molding compound to a molding module based on the total number of the unpackaged dice on the carrier. The providing includes accessing the indication of the total number of the unpackaged dice on the carrier from the storage medium, determining the quantity of molding compound based on the indication of the total number of unpackaged dice on the carrier, and molding the unpackaged dice into the packaged dice using the quantity of molding compound.

    摘要翻译: 本公开涉及用于在载体上形成多个包装骰子的系统和方法,所述载体包括存储介质,所述存储介质被配置为在所述载体上存储未包装骰子总数量的指示。 成形包括基于载体上未包装的骰子的总数量向模制模块提供一定量的模塑料。 所述提供包括从所述存储介质访问所述载体上的未包装的骰子的总数量的指示,基于所述载体上未包装骰子的总数量的指示,确定所述模制复合物的数量,以及将所述未包装的骰子模制成 包装骰子使用量的模塑料。

    Mask manufacturing method for nanoimprinting
    10.
    发明授权
    Mask manufacturing method for nanoimprinting 有权
    面膜制造方法纳米压印

    公开(公告)号:US08658537B2

    公开(公告)日:2014-02-25

    申请号:US13768432

    申请日:2013-02-15

    发明人: Masamitsu Itoh

    IPC分类号: H01L21/311

    摘要: According to one embodiment, a mask manufacturing method includes acquiring positional deviation information between an actual position of a pattern formed on a mask substrate and a design position decided at the time of designing the pattern; calculating an irradiating amount and an irradiating position of radiation to be irradiated to a predetermined area of a square on the mask substrate according to the calculated positional deviation information; and irradiating the radiation based on the calculated irradiating amount and the calculated irradiating position to form in a part of the mask substrate a heterogeneous layer of which volume is expanded more greatly than that of the surrounding mask substrate region.

    摘要翻译: 根据一个实施例,掩模制造方法包括获取在掩模基板上形成的图案的实际位置与设计图案时确定的设计位置之间的位置偏差信息; 根据计算出的位置偏差信息计算要照射到掩模基板上的正方形的预定区域的辐射的照射量和照射位置; 并且基于所计算的照射量和所计算的照射位置照射所述辐射,以在所述掩模基板的一部分中形成比所述周围掩模基板区域的体积膨胀更大的异质层。