公开(公告)号：US06901575B2

公开(公告)日：2005-05-31

申请号：US10012069

申请日：2001-12-05

申请人： Shao-Po Wu ,  Seonghun Cho ,  Yao-Ting Wang

发明人： Shao-Po Wu ,  Seonghun Cho ,  Yao-Ting Wang

IPC分类号： G03F1/00 ,  G06F17/50 ,  G03F9/00

CPC分类号： G03F1/30

摘要： A method of assigning phases to shifters on a layout is provided. The method includes creating a link between any two shifters within a predetermined distance from each other. In one embodiment, the predetermined distance is larger than a minimum feature size on the layout, and smaller than a combined minimum pitch and regulator width. A weight can be assigned to each created link. Phases can be assigned to the shifters, wherein if a phase-shift conflict exists on the layout, then one or more links can be broken based on their weight.

公开(公告)号：US20050064347A1

公开(公告)日：2005-03-24

申请号：US10949678

申请日：2004-09-24

申请人： Yao-Ting Wang

发明人： Yao-Ting Wang

IPC分类号： G03F7/20

CPC分类号： G03F7/70466 ,  G03F7/701 ,  G03F7/70125 ,  G03F7/70283 ,  G03F7/70425 ,  G03F7/70566 ,  G03F7/70575

摘要： Systems and methods for generating an image are provided. These systems and methods include generating multiple light beams from a light source by controlling at least one parameter of the light source to be different among each of the multiple light beams. The systems and methods further include forming multiple light patterns of circuit structures that are separated in frequency by directing each of the light beams at a mask of circuit features. The systems and methods, when used in lithography for example, further include directing each of the light patterns toward a silicon substrate. The silicon substrate includes a silicon wafer having a surface at least partially covered with at least one of a photoresist material and a reversible contrast enhancement material (R-CEM).

摘要翻译： 提供了用于生成图像的系统和方法。 这些系统和方法包括通过控制光源的至少一个参数在多个光束中的每一个之间不同来产生来自光源的多个光束。 这些系统和方法还包括通过将每个光束指向电路特征的掩模来形成通过频率分离的电路结构的多个光图案。 当例如在光刻中使用时，所述系统和方法还包括将每个光图案导向硅衬底。 硅衬底包括具有至少部分被光致抗蚀剂材料和可逆对比度增强材料（R-CEM）中的至少一种覆盖的表面的硅晶片。

公开(公告)号：US20050060682A1

公开(公告)日：2005-03-17

申请号：US10981343

申请日：2004-11-03

申请人： Shao-Po Wu ,  Seonghun Cho ,  Yao-Ting Wang

发明人： Shao-Po Wu ,  Seonghun Cho ,  Yao-Ting Wang

IPC分类号： G03F1/00 ,  G06F17/50 ,  G03F9/00 ,  G06F19/00 ,  G21K5/00

CPC分类号： G03F1/30

摘要： A method of assigning phases to shifters on a layout is provided. The method includes creating a link between any two shifters within a predetermined distance from each other. In one embodiment, the predetermined distance is larger than a minimum feature size on the layout, and smaller than a combined minimum pitch and regulator width. A weight can be assigned to each created link. Phases can be assigned to the shifters, wherein if a phase-shift conflict exists on the layout, then one or more links can be broken based on their weight.

摘要翻译： 提供了一种在布局上为移位器分配相位的方法。 该方法包括在彼此之间的预定距离内创建任何两个移位器之间的链接。 在一个实施例中，预定距离大于布局上的最小特征尺寸，并且小于组合的最小间距和调节器宽度。 可以将权重分配给每个创建的链接。 可以将相位分配给移位器，其中如果在布局上存在相移冲突，则可以基于它们的权重来断开一个或多个链路。

公开(公告)号：US06818385B2

公开(公告)日：2004-11-16

申请号：US10341290

申请日：2003-01-13

申请人： Yao-Ting Wang ,  Yagyensh C. Pati

发明人： Yao-Ting Wang ,  Yagyensh C. Pati

IPC分类号： G03F900

CPC分类号： G03F7/70283 ,  G03F1/26 ,  G03F1/30 ,  G03F1/34 ,  G03F1/36 ,  G03F1/70 ,  G03F7/2022 ,  G03F7/70433 ,  G03F7/70441 ,  G03F7/705 ,  G06F17/5068

摘要： A method for manufacturing integrated circuits using opaque field, phase shift masking. One embodiment of the invention includes using a two mask process. The first mask is an opaque-field phase shift mask and the second mask is a single phase structure mask. A phase shift window is aligned with the opaque field using a phase shift overlap area on the opaque field. The phase shift mask primarily defines regions requiring phase shifting. The single phase structure mask primarily defines regions not requiring phase shifting. The single phase structure mask also prevents the erasure of the phase shifting regions and prevents the creation of undesirable artifact regions that would otherwise be created by the phase shift mask.

摘要翻译： 一种使用不透光场，相移屏蔽制造集成电路的方法。 本发明的一个实施例包括使用两个掩模过程。 第一掩模是不透明场相移掩模，第二掩模是单相结构掩模。 使用不透明场上的相移重叠区域将相移窗与不透明场对准。 相移掩模主要限定需要相移的区域。 单相结构掩模主要限定不需要相移的区域。 单相结构掩模还防止相移区域的擦除，并且防止产生否则将由相移掩模产生的不期望的伪影区域。

公开(公告)号：US5858580A

公开(公告)日：1999-01-12

申请号：US931921

申请日：1997-09-17

申请人： Yao-Ting Wang ,  Yagyensh C. Pati

发明人： Yao-Ting Wang ,  Yagyensh C. Pati

IPC分类号： G03F1/00 ,  G03F1/26 ,  G03F1/30 ,  G03F1/36 ,  G03F7/20 ,  G06F17/50 ,  G03F9/00

CPC分类号： G03F1/30 ,  G03F1/26 ,  G03F1/36 ,  G03F1/70 ,  G03F7/2022 ,  G03F7/70283 ,  G03F7/70433 ,  G03F7/70441 ,  G03F7/705 ,  G06F17/5068

摘要： A method and apparatus for creating a phase shifting mask and a structure mask for shrinking integrated circuit designs. One embodiment of the invention includes using a two mask process. The first mask is a phase shift mask and the second mask is a single phase structure mask. The phase shift mask primarily defines regions requiring phase shifting. The single phase structure mask primarily defines regions not requiring phase shifting. The single phase structure mask also prevents the erasure of the phase shifting regions and prevents the creation of undesirable artifact regions that would otherwise be created by the phase shift mask. Both masks are derived from a set of masks used in a larger minimum dimension process technology.