公开(公告)号：US07216331B2

公开(公告)日：2007-05-08

申请号：US10981343

申请日：2004-11-03

申请人： Shao-Po Wu ,  Seonghun Cho ,  Yao-Ting Wang

发明人： Shao-Po Wu ,  Seonghun Cho ,  Yao-Ting Wang

IPC分类号： G06F17/50

CPC分类号： G03F1/30

摘要： A method of assigning phases to shifters on a layout is provided. The method includes creating a link between any two shifters within a predetermined distance from each other. In one embodiment, the predetermined distance is larger than a minimum feature size on the layout, and smaller than a combined minimum pitch and regulator width. A weight can be assigned to each created link. Phases can be assigned to the shifters, wherein if a phase-shift conflict exists on the layout, then one or more links can be broken based on their weight.

摘要翻译： 提供了一种在布局上为移位器分配相位的方法。 该方法包括在彼此之间的预定距离内创建任何两个移位器之间的链接。 在一个实施例中，预定距离大于布局上的最小特征尺寸，并且小于组合的最小间距和调节器宽度。 可以将权重分配给每个创建的链接。 可以将相位分配给移位器，其中如果在布局上存在相移冲突，则可以基于它们的权重来断开一个或多个链路。

公开(公告)号：US06901575B2

公开(公告)日：2005-05-31

申请号：US10012069

申请日：2001-12-05

申请人： Shao-Po Wu ,  Seonghun Cho ,  Yao-Ting Wang

发明人： Shao-Po Wu ,  Seonghun Cho ,  Yao-Ting Wang

IPC分类号： G03F1/00 ,  G06F17/50 ,  G03F9/00

CPC分类号： G03F1/30

摘要： A method of assigning phases to shifters on a layout is provided. The method includes creating a link between any two shifters within a predetermined distance from each other. In one embodiment, the predetermined distance is larger than a minimum feature size on the layout, and smaller than a combined minimum pitch and regulator width. A weight can be assigned to each created link. Phases can be assigned to the shifters, wherein if a phase-shift conflict exists on the layout, then one or more links can be broken based on their weight.

公开(公告)号：US20050060682A1

公开(公告)日：2005-03-17

申请号：US10981343

申请日：2004-11-03

申请人： Shao-Po Wu ,  Seonghun Cho ,  Yao-Ting Wang

发明人： Shao-Po Wu ,  Seonghun Cho ,  Yao-Ting Wang

IPC分类号： G03F1/00 ,  G06F17/50 ,  G03F9/00 ,  G06F19/00 ,  G21K5/00

CPC分类号： G03F1/30

摘要： A method of assigning phases to shifters on a layout is provided. The method includes creating a link between any two shifters within a predetermined distance from each other. In one embodiment, the predetermined distance is larger than a minimum feature size on the layout, and smaller than a combined minimum pitch and regulator width. A weight can be assigned to each created link. Phases can be assigned to the shifters, wherein if a phase-shift conflict exists on the layout, then one or more links can be broken based on their weight.

摘要翻译： 提供了一种在布局上为移位器分配相位的方法。 该方法包括在彼此之间的预定距离内创建任何两个移位器之间的链接。 在一个实施例中，预定距离大于布局上的最小特征尺寸，并且小于组合的最小间距和调节器宽度。 可以将权重分配给每个创建的链接。 可以将相位分配给移位器，其中如果在布局上存在相移冲突，则可以基于它们的权重来断开一个或多个链路。

公开(公告)号：US20070245291A1

公开(公告)日：2007-10-18

申请号：US11766047

申请日：2007-06-20

申请人： Shao-Po Wu ,  Yao-Ting Wang

发明人： Shao-Po Wu ,  Yao-Ting Wang

IPC分类号： G06F17/50

CPC分类号： G03F1/30 ,  G06F17/5081 ,  G06F2217/12 ,  Y02P90/265

摘要： Phase shifting allows generating very narrow features in a printed features layer. Thus, forming a fabrication layout for a physical design layout having critical features typically includes providing a layout for shifters. Specifically, pairs of shifters can be placed to define critical features, wherein the pairs of shifters conform to predetermined design rules. After placement, phase information for the shifters associated with the set of critical features can be assigned. Complex designs can lead to phase-shift conflicts among shifters in the fabrication layout. An irresolvable conflict can be passed to the design process earlier than in a conventional processes, thereby saving valuable time in the fabrication process for printed circuits.

摘要翻译： 相移允许在打印的要素图层中生成非常窄的特征。 因此，形成具有关键特征的物理设计布局的制造布局通常包括为移位器提供布局。 具体地，可以放置移位器对以定义关键特征，其中移位器对符合预定的设计规则。 放置后，可以分配与该组关键特征相关联的移位器的相位信息。 复杂的设计可能导致制造布局中移位器之间的相移冲突。 可以比传统方法更早地将设计过程传递给设计过程，从而节省印刷电路制造过程中的宝贵时间。

公开(公告)号：US07827518B2

公开(公告)日：2010-11-02

申请号：US11766047

申请日：2007-06-20

申请人： Shao-Po Wu ,  Yao-Ting Wang

发明人： Shao-Po Wu ,  Yao-Ting Wang

IPC分类号： G06F17/50

CPC分类号： G03F1/30 ,  G06F17/5081 ,  G06F2217/12 ,  Y02P90/265

摘要： Phase shifting allows generating very narrow features in a printed features layer. Thus, forming a fabrication layout for a physical design layout having critical features typically includes providing a layout for shifters. Specifically, pairs of shifters can be placed to define critical features, wherein the pairs of shifters conform to predetermined design rules. After placement, phase information for the shifters associated with the set of critical features can be assigned. Complex designs can lead to phase-shift conflicts among shifters in the fabrication layout. An irresolvable conflict can be passed to the design process earlier than in a conventional processes, thereby saving valuable time in the fabrication process for printed circuits.

摘要翻译： 相移允许在打印的要素图层中生成非常窄的特征。 因此，形成具有关键特征的物理设计布局的制造布局通常包括为移位器提供布局。 具体地，可以放置移位器对以定义关键特征，其中移位器对符合预定的设计规则。 放置后，可以分配与该组关键特征相关联的移位器的相位信息。 复杂的设计可能导致制造布局中移位器之间的相移冲突。 可以比传统方法更早地将设计过程传递给设计过程，从而节省印刷电路制造过程中的宝贵时间。

公开(公告)号：US06698007B2

公开(公告)日：2004-02-24

申请号：US09975414

申请日：2001-10-09

申请人： Shao-Po Wu ,  Seonghun Cho ,  Alexandre Arkhipov ,  Ilya Grishashvili

发明人： Shao-Po Wu ,  Seonghun Cho ,  Alexandre Arkhipov ,  Ilya Grishashvili

IPC分类号： G06F1750

CPC分类号： G03F1/30

摘要： One embodiment of the invention provides a system that automatically resolves conflicts between phase shifters during creation of a phase shifting mask to be used in an optical lithography process for manufacturing an integrated circuit. Upon receiving a specification of a layout on the integrated circuit, the system identifies critical-dimension features within the layout. Next, the system places phase shifters comprised of phase shifting geometries on the phase shifting mask to precisely define the critical-dimension features. In doing so, the system identifies junctions within and/or between the critical-dimension features, and removes phase shifting geometries associated with the junctions to obviate coloring conflicts between phase shifters on the phase shifting mask. In one embodiment of the invention, the junctions include T-junctions and/or L-junctions.

摘要翻译： 本发明的一个实施例提供了一种系统，其在创建用于制造集成电路的光学光刻工艺中使用的相移掩模期间自动地解决移相器之间的冲突。 在接收到集成电路上的布局规范之后，系统识别布局内的关键维度特征。 接下来，该系统将由相移几何形状组成的移相器放置在相移掩模上以精确地定义关键维度特征。 在这样做时，系统识别临界尺寸特征之内和/或之间的结，并消除与结点相关联的相移几何，以消除相移掩模上移相器之间的着色冲突。 在本发明的一个实施方案中，连接包括T结和/或L结。

公开(公告)号：US06605481B1

公开(公告)日：2003-08-12

申请号：US10094487

申请日：2002-03-08

申请人： Shao-Po Wu ,  Seonghun Cho ,  Yu-Yu Chou

发明人： Shao-Po Wu ,  Seonghun Cho ,  Yu-Yu Chou

IPC分类号： H01L2166

CPC分类号： G03F7/70466 ,  G03F1/26

摘要： One embodiment of the invention provides a method that facilitates selectively varying how much of a layout of an integrated circuit is defined by phase shifters during an optical lithography process used in manufacturing the integrated circuit. During operation, the method receives a specification of the layout of the integrated circuit. The method then assigns features within the layout to zones associated with different phase shifting priorities. Next, the method generates a phase shifter placement by placing phase shifters comprised of phase shifting geometries onto a phase shifting mask to define the features within the layout, wherein the phase shifter placement is subject to coloring constraints. Note that in general there is no restriction on the order of zone placement. During this placement process, if coloring constraints cannot be satisfied, the method resolves conflicts and/or removes features from being phase-shifted based upon phase shifting priorities of the zones.

摘要翻译： 本发明的一个实施例提供了一种方法，其有助于选择性地改变在用于制造集成电路的光学光刻过程中由移相器定义多少集成电路的布局。 在操作过程中，该方法接收集成电路布局的规格。 然后，该方法将布局内的特征分配给与不同相移优先级相关联的区域。 接下来，该方法通过将包括相移几何的移相器放置在相移掩模上来产生移相器放置，以定义布局内的特征，其中移相器放置受到着色约束。 注意，一般来说，区域布置顺序没有限制。 在该放置过程中，如果不能满足着色约束，则该方法基于区域的相移优先级来解决冲突和/或去除特征被相移。

公开(公告)号：US07281226B2

公开(公告)日：2007-10-09

申请号：US10377341

申请日：2003-02-27

申请人： Shao-Po Wu ,  Yao-Ting Wang

发明人： Shao-Po Wu ,  Yao-Ting Wang

IPC分类号： G06F17/50

CPC分类号： G03F1/30 ,  G06F17/5081 ,  G06F2217/12 ,  Y02P90/265

摘要： Phase shifting allows generating very narrow features in a printed features layer. Thus, forming a fabrication layout for a physical design layout having critical features typically includes providing a layout for shifters. Specifically, pairs of shifters can be placed to define critical features, wherein the pairs of shifters conform to predetermined design rules. After placement, phase information for the shifters associated with the set of critical features can be assigned. Complex designs can lead to phase-shift conflicts among shifters in the fabrication layout. An irresolvable conflict can be passed to the design process earlier than in a conventional processes, thereby saving valuable time in the fabrication process for printed circuits.

摘要翻译： 相移允许在打印的要素图层中生成非常窄的特征。 因此，形成具有关键特征的物理设计布局的制造布局通常包括为移位器提供布局。 具体地，可以放置移位器对以定义关键特征，其中移位器对符合预定的设计规则。 放置后，可以分配与该组关键特征相关联的移位器的相位信息。 复杂的设计可能导致制造布局中移位器之间的相移冲突。 可以比传统方法更早地将设计过程传递给设计过程，从而节省印刷电路制造过程中的宝贵时间。

公开(公告)号：US06622288B1

公开(公告)日：2003-09-16

申请号：US09823146

申请日：2001-03-29

申请人： Yao-Ting Wang ,  Kent Richardson ,  Shao-Po Wu ,  Christophe Pierrat ,  Michael Sanie

发明人： Yao-Ting Wang ,  Kent Richardson ,  Shao-Po Wu ,  Christophe Pierrat ,  Michael Sanie

IPC分类号： G06F1750

CPC分类号： G03F1/30

摘要： Techniques for forming a design layout with phase-shifted features, such as an integrated circuit layout, include receiving information about a particular phase-shift conflict in a first physical design layout. The information indicates one or more features logically associated with the particular phase-shift conflict. Then the first physical design layout is adjusted based on that information to produce a second design layout. The adjustments rearrange features in a unit of the design layout to collect free space around a selected feature associated with the phase-shift conflict. With these techniques, a unit needing more space for additional shifters can obtain the needed space during the physical design process making the adjustment. The needed space so obtained allows the fabrication design process to avoid or resolve phase conflicts while forming a fabrication layout, such as a mask, for substantiating the design layout in a printed features layer, such as in an actual integrated circuit.

摘要翻译： 用于形成具有诸如集成电路布局的相移特征的设计布局的技术包括在第一物理设计布局中接收关于特定相移冲突的信息。 该信息指示与特定相移冲突逻辑关联的一个或多个特征。 然后根据该信息调整第一个物理设计布局以产生第二个设计布局。 调整重新排列设计布局中的功能，以收集与相移冲突相关的所选功能周围的可用空间。 利用这些技术，在进行调整的物理设计过程中，需要更多空间的单元可以获得额外的移位器的空间。 如此获得的所需空间允许制造设计过程避免或解决相位冲突，同时形成诸如掩模的制造布局，用于证实印刷特征层（例如在实际集成电路中）的设计布局。

公开(公告)号：US06584610B1

公开(公告)日：2003-06-24

申请号：US09823380

申请日：2001-03-29

申请人： Shao-Po Wu ,  Yao-Ting Wang

发明人： Shao-Po Wu ,  Yao-Ting Wang

IPC分类号： G06F1750

CPC分类号： G03F1/30 ,  G06F17/5081 ,  G06F2217/12 ,  Y02P90/265

摘要： Phase shifting generates features in a printed features layer, such as a printed circuit, that are narrower than the features on a fabrication layout, such as a mask, projected onto the printed features layer using the same optical system without phase shifting. Techniques for forming a fabrication layout for a physical design layout having critical features employing phase shifting include techniques for providing a layout for shifters. The techniques include establishing placement of multiple pairs of shifters for a set of critical features. A critical feature employs phase shifting. The set of critical features constitutes a subset of all critical features in a layout. After establishing placement of the pairs of shifters, phase information for the shifters associated with the set of critical features is assigned. This and related techniques expedite resolving phase-shift conflicts in fabrication layouts for phase-shifted features. Complex designs can lead to phase-shift conflicts among shifters in the fabrication layout. According to these techniques, a conflict that cannot be resolved by a fabrication design process is passed to the design process earlier than in a conventional processes, saving valuable time in the fabrication process for printed circuits.

摘要翻译： 相移产生诸如印刷电路的印刷特征层中的特征，其比制造布局（例如掩模）上的特征窄，使用相同的没有相移的光学系统投影到印刷特征层上。 用于形成具有采用相移的关键特征的物理设计布局的制造布局的技术包括用于为移位器提供布局的技术。 这些技术包括为一组关键特征建立多对移位器的放置。 关键特征是采用相移。 一组关键特征构成布局中所有关键特征的一个子集。 在建立移位器对之后，分配与该组关键特征相关联的移位器的相位信息。该相关技术加速了相移特征制造布局中的相移冲突。 复杂的设计可能导致制造布局中移位器之间的相移冲突。 根据这些技术，制造设计过程无法解决的冲突比传统工艺更早地传递给设计过程，从而节省印刷电路制造过程中的宝贵时间。