公开(公告)号：US20070041410A1

公开(公告)日：2007-02-22

申请号：US11588387

申请日：2006-10-27

申请人： Mikio Hongo ,  Sachio Uto ,  Mineo Nomoto ,  Toshihiko Nakata ,  Mutsuko Hatano ,  Shinya Yamaguchi ,  Makoto Ohkura

发明人： Mikio Hongo ,  Sachio Uto ,  Mineo Nomoto ,  Toshihiko Nakata ,  Mutsuko Hatano ,  Shinya Yamaguchi ,  Makoto Ohkura

IPC分类号： H01S3/10 ,  G02B27/10

CPC分类号： H01L21/02683 ,  H01L21/0268 ,  H01L21/02691 ,  H01L21/2026 ,  H01L21/268 ,  H01L27/1285 ,  H01L29/04 ,  H01L29/66757

摘要： Apparatus for fabricating a display device includes a stage capable of mounting an insulating substrate of the display device and moving the insulating substrate, linear scales which detect a position or moving distance of the substrate, a laser oscillator which generates continuous-waves laser light, a modulator which turns ON/OFF the continuous-wave laser light, a beam forming optic which shapes the continuous-wave laser light passing through the modulator into a linear or rectangular form, an objective lens which projects the at least one of the laser light on the insulating substrate so as to irradiate the insulating substrate with the laser light. The controller counts signals generated by the linear scales for every movement of the stage for a given distance, causes the modulator to turn the generated continuous-wave laser light in an ON state at time when a position of the insulating substrate on which the laser light irradiation is to be started reaches an area on which the laser light is projected, and causes the modulator to turn the generated continuous-wave laser light in an OFF state at another time.

摘要翻译： 用于制造显示装置的装置包括能够安装显示装置的绝缘基板并移动绝缘基板的台，检测基板的位置或移动距离的线性标尺，产生连续波激光的激光振荡器， 将连续波激光切换为ON / OFF的调制器，将通过调制器的连续波激光成形为直线或矩形的光束形成光学器件，将至少一个激光投射到的物镜 绝缘基板，以激光照射绝缘基板。 控制器对于给定距离的级的每次移动来对由线性标尺产生的信号进行计数，使得调制器将产生的连续波激光在其上的激光的绝缘基板的位置处于接通状态 照射开始到达投射激光的区域，并且使得调制器在另一时间将所产生的连续波激光转为OFF状态。

公开(公告)号：US20060215171A1

公开(公告)日：2006-09-28

申请号：US11188732

申请日：2005-07-26

申请人： Toshihiko Nakata ,  Masahiro Watanabe ,  Shuichi Baba ,  Yasuhiro Yoshitake ,  Mineo Nomoto

发明人： Toshihiko Nakata ,  Masahiro Watanabe ,  Shuichi Baba ,  Yasuhiro Yoshitake ,  Mineo Nomoto

IPC分类号： G01B9/02

CPC分类号： G01B9/02057 ,  G01B9/02003 ,  G01B9/02081 ,  G01B2290/30 ,  G01B2290/70 ,  G03F7/70775

摘要： In a displacement measurement apparatus using light interference, a probe light path is spatially separated from a reference light path. Therefore, when a temperature or refractive index distribution by a fluctuation of air or the like, or a mechanical vibration is generated, an optical path difference fluctuates between both of the optical paths, and a measurement error is generated. In the solution, an optical axis of probe light is brought close to that of reference light by a distance which is not influenced by any disturbance, a sample is irradiated with the probe light, a reference surface is irradiated with the reference light, reflected light beams are allowed to interfere with each other, and a displacement of the sample is obtained from the resultant interference light to thereby prevent the measurement error from being generated by the fluctuation of the optical path difference.

公开(公告)号：US06825437B2

公开(公告)日：2004-11-30

申请号：US10231267

申请日：2002-08-30

申请人： Hiroyuki Nakano ,  Takeshi Arai ,  Toshihiko Nakata

发明人： Hiroyuki Nakano ,  Takeshi Arai ,  Toshihiko Nakata

IPC分类号： B23K1000

CPC分类号： G01N21/51 ,  G01N21/94 ,  H01J2237/0225

摘要： When determining the presence of foreign particles in a processing chamber by radiating a laser beam inside a processing chamber and detecting scattered light from foreign particles within the processing chamber, the detection of scattered light is performed using a detecting lens having a wide field angle and deep focal depth. Accordingly, the detection of foreign particles floating in the processing chamber can be performed across a wide range, and with uniform sensitivity, with a detecting optical system having a simple constitution.

摘要翻译： 当通过在处理室内辐射激光束并且检测处理室内的异物的散射光来确定处理室中外来颗粒的存在时，使用具有宽场角和深度的检测透镜来执行散射光的检测 焦点深度 因此，利用具有简单结构的检测光学系统，可以在宽范围内以及具有均匀灵敏度的方式对漂浮在处理室中的异物进行检测。

公开(公告)号：US06355570B1

公开(公告)日：2002-03-12

申请号：US09260074

申请日：1999-03-02

申请人： Toshihiko Nakata ,  Takanori Ninomiya ,  Sachio Uto ,  Hiroyuki Nakano

发明人： Toshihiko Nakata ,  Takanori Ninomiya ,  Sachio Uto ,  Hiroyuki Nakano

IPC分类号： H01L21302

CPC分类号： G01N21/53 ,  G01N21/94 ,  G01N21/9501

摘要： The present invention provides a semiconductor manufacturing method, a plasma processing method and a plasma processing apparatus for generating a plasma in a processing chamber and carrying out processing on material to be processed by using the plasma, comprising a floating-foreign-particle measuring apparatus including: a light radiating optical system for radiating a light having a desired wavelength and completing intensity modulation at a desired frequency to the processing chamber; a scattered-light detecting optical system for separating a component with the desired wavelength from scattered lights obtained from the processing chamber as a result of radiation of the light by the light radiating optical system, for optically receiving the component and for converting the component into a first signal; and a foreign-particle-signal extracting unit which separates a second signal representing foreign particle floating in the plasma or in an area in proximity to the plasma from a third signal obtained by emission of the plasma for detection of the second signal by extraction of a component with the desired frequency used for the intensity modulation from the first signal obtained from the scattered-light detecting optical system.

公开(公告)号：US5062715A

公开(公告)日：1991-11-05

申请号：US479712

申请日：1990-02-14

申请人： Toshihiko Nakata ,  Yukio Kembo

发明人： Toshihiko Nakata ,  Yukio Kembo

IPC分类号： G01N29/00 ,  G01N29/04 ,  G01N29/24 ,  G02B21/00

CPC分类号： G02B21/0072 ,  G01N29/2418 ,  G01N2291/0423 ,  G01N2291/2697

摘要： A photoacoustic signal detecting method and apparatus for intensity-modulating light having a wavelength penetrating a sample such as a semiconductor device at a desired frequency, the light being emitted from a first light source, focusing the intensity-modulated light on the sample as a light spot, by changing the position of the sample and the optical constant of the means for focusing, scanning the light spot inside the sample in a depth direction thereof to detect the photoacoustic effect generated in the sample, and extracting information relative to the surface and inside of the sample and defect information therein. The photoacoustic effect is detected using an interferometer. Light incident on the sample surface for a second light source in order to obtain interference light and the interference light reflected from the sample surface are adjusted in response to a signal indicative of the depth of the light spot to detect optimum interference light. Light reflected from the sample surface when light emitted from a third light source is incident on the surface is detected through the focusing optical system to generate the signal indicative of the depth of the light spot.

摘要翻译： 一种光声信号检测方法和装置，用于强度调制具有以期望频率穿透诸如半导体器件的样品的波长的光，所述光从第一光源发射，将强度调制光聚焦在样品上作为光 通过改变样品的位置和聚焦装置的光学常数，扫描样品内的光斑在其深度方向上，以检测样品中产生的光声效应，并提取相对于表面和内部的信息 的样品和缺陷信息。 使用干涉仪检测光声效应。 为了获得干涉光和从样品表面反射的干涉光，入射到用于第二光源的样品表面上的光被响应于指示光斑的深度的信号来调节以检测最佳干涉光。 通过聚焦光学系统检测从第三光源发射的光入射在表面上的从样品表面反射的光，以产生指示光斑深度的信号。

公开(公告)号：US5046847A

公开(公告)日：1991-09-10

申请号：US262573

申请日：1988-10-25

申请人： Toshihiko Nakata ,  Nobuyuki Akiyama ,  Yoshihiko Yamuchi ,  Mitsuyoshi Koizumi ,  Yoshimasa Oshima

发明人： Toshihiko Nakata ,  Nobuyuki Akiyama ,  Yoshihiko Yamuchi ,  Mitsuyoshi Koizumi ,  Yoshimasa Oshima

IPC分类号： G01N21/21 ,  G01N21/94 ,  G03F9/00

CPC分类号： G03F9/70 ,  G01N21/94 ,  G01N21/95623 ,  G01N2021/473 ,  G01N21/21

摘要： A method and apparatus for detecting foreign matter on a sample by illuminating a stripe-shaped region with linearly polarized light. Some of the light reflected by the sample is intercepted by a light intercepting stage, and the rest of the light reflected by the sample, which passes through the light intercepting stage is directed to a detecting optical system, to be detected by a photo-detector. The sample is illuminated obliquely at a predetermined angle with respect to a group of straight lines constituting a primary pattern on the sample. The angle is selected so that the diffraction light reflected by the group of straight lines does not enter the detecting optical system. A polarizing spatial filter using a liquid crystal element may be disposed in a predetermined restricted region in a spacial frequency region, or Fourier transformation plane, within the detecting optical system. The light scattered by the sample may further be separated in the detecting optical system into partial beams having different wave orientation characteristics, which characteristics are detected by a number of one-dimensional solid state imaging elements. The signals are processed by a driver, adder, and quantizer in synchronism with the one-dimensional solid state imaging elements.

摘要翻译： 一种通过用线性偏振光照射条形区域来检测样品上的异物的方法和装置。 由样品反射的一些光被遮光阶段遮挡，并且通过遮光台的由样品反射的其余光指向检测光学系统，由光检测器检测 。 样品相对于构成样品上的主要图案的一组直线以预定角度倾斜照射。 选择该角度使得由直线组反射的衍射光不进入检测光学系统。 使用液晶元件的偏振空间滤光片可以设置在检测光学系统内的空间频率区域或傅立叶变换平面的预定限制区域中。 由样本散射的光可以在检测光学系统中进一步分离成具有不同波取向特性的部分光束，该特征由多个一维固态成像元件检测。 信号由驱动器，加法器和量化器与一维固态成像元件同步处理。

公开(公告)号：US4906852A

公开(公告)日：1990-03-06

申请号：US305006

申请日：1989-01-31

申请人： Toshihiko Nakata ,  Masataka Shiba

发明人： Toshihiko Nakata ,  Masataka Shiba

IPC分类号： G03F9/00 ,  H01L21/027 ,  H01L21/30 ,  H01L21/68

CPC分类号： G03F9/7076

摘要： A projection alignment method of aligning a mask and a wafer with each other through an optical imaging system and an apparatus for performing the method are disclosed. The apparatus comprises an optical illumination system for illuminating with highly coherent illumination light an alignment pattern formed with a stepped pattern on the wafer and a flat or planar portion of the wafer in the vicinity of the alignment pattern, an optical interference system for making reflected light from the alignment pattern on the wafer and reflected light from the flat portion of the wafer illuminated by the optical illumination system interfere with each other while optically superimposing optical images of both the reflected lights obtained through the optical imaging system on each other. A photo-electric conversion element subjects an interference pattern obtained by the optical interference system to photo-electric conversion, thereby obtaining a signal having a symmetry which represents a stepped portion of the alignment pattern, whereby alignment for the wafer is performed on the basis of the signal obtained from the photoelectric conversion element. With such a construction, any influence of uneven thickness of a resist film applied on the alignment pattern can be reduced and hence a highly symmetrical signal corresponding to the stepped portion of the alignment pattern can be obtained, thereby realizing alignment with high precision.

摘要翻译： 公开了一种通过光学成像系统和用于执行该方法的装置将掩模和晶片彼此对准的投影对准方法。 该装置包括一个光学照明系统，用于以高度相干的照明光照射在晶片上形成有阶梯图案的对准图案，以及在对准图案附近的晶片的平坦或平面部分，用于制造反射光的光学干涉系统 从晶片上的对准图案和由光学照明系统照射的晶片的平坦部分的反射光彼此干涉，同时将通过光学成像系统获得的反射光的光学图像彼此光学地叠加。 光电转换元件将由光学干涉系统获得的干涉图案进行光电转换，从而获得具有对称性的信号，该对称性表示对准图案的阶梯部分，由此基于 从光电转换元件获得的信号。 通过这样的结构，可以减少施加在取向图案上的抗蚀剂膜的不均匀厚度的影响，从而可以获得与对准图案的阶梯部分对应的高度对称的信号，从而实现高精度的对准。

公开(公告)号：US4795261A

公开(公告)日：1989-01-03

申请号：US944524

申请日：1986-12-22

申请人： Toshihiko Nakata ,  Yoshitada Oshida ,  Masataka Shiba

发明人： Toshihiko Nakata ,  Yoshitada Oshida ,  Masataka Shiba

IPC分类号： G03F9/00 ,  G01B11/00

CPC分类号： G03F9/7076

摘要： A reduction projection type aligner in a reduction projection exposing device for exposing a circuit pattern on a mask through a reduction projection lens onto a wafer by the step and repeat of the wafer, which comprises: a light source for irradiating coherent irradiation light, a reflection mirror for reflecting the coherent irradiation light irradiated from the light source, a detection optical system for detecting an interference pattern by optically causing interference between an alignment pattern reflection light obtained by entering the coherent irradiation light irradiated from the light source through the reduction projection lens to the alignment pattern portion of the wafer, which is then reflected at the alignment pattern portion and then passed through the reduction projection lens and a reflection light reflected at the reflection mirror, and means for aligning a mask and a wafer relatively by detecting the position of the wafer by the video image signals in the interference pattern detected by the detection optical system.

摘要翻译： 一种还原投影型对准器，用于通过晶片的步骤和重复将通过还原投影透镜将还原投影透镜上的电路图案曝露在晶片上的还原投影曝光装置中，包括：用于照射相干照射光的光源，反射 用于反射从光源照射的相干照射光的反射镜;检测光学系统，用于通过光学地引起通过将从光源经过还原投影透镜照射的相干照射光进入的对准图案反射光之间的干涉，检测干涉图案， 晶片的对准图案部分然后在对准图案部分反射然后通过还原投影透镜和在反射镜处反射的反射光，以及用于通过检测掩模和晶片的位置相对地对准掩模和晶片的位置 晶片由视频信号在干涉中 检测光学系统检测到的图案。

公开(公告)号：US4668089A

公开(公告)日：1987-05-26

申请号：US684292

申请日：1984-12-20

申请人： Yoshitada Oshida ,  Masataka Shiba ,  Toshihiko Nakata ,  Mitsuyoshi Koizumi ,  Naoto Nakashima

发明人： Yoshitada Oshida ,  Masataka Shiba ,  Toshihiko Nakata ,  Mitsuyoshi Koizumi ,  Naoto Nakashima

IPC分类号： H01L21/30 ,  G03F9/00 ,  G01B11/26 ,  G01J1/32

CPC分类号： G03F9/7049

摘要： An exposure apparatus comprises a light source, a mask plate having an exposure pattern area section and an alignment/reflection area section, a projection lens, a movable stage for holding a workpiece having a workpiece alignment mark, an alignment control and a driver for the movable stage. Before the exposure pattern area section is illuminated by the light source to be projected through the projection lens onto the workpiece, the workpiece is properly aligned with the mask. Alignment between the mask plate and the workpiece is performed by the effective use of the alignment/reflection area section specifically arranged and having a specific structure. The alignment/reflection area section is on that surface of the mask plate which does not face the light source and includes a reflection portion for conducting light from another light source to the workpiece and conducting light scattered from the workpiece and passing through the projection lens to the alignment control and a mask alignment mark portion of providing, when illuminated, an image of the mask alignment mark portion to the alignment control so that it detects the positional relation between the mask alignment mark portion and the workpiece alignment mark and produces a control signal for achieving alignment between the mask plate and the workpiece.

摘要翻译： 曝光装置包括光源，具有曝光图案区域部分和对准/反射区域部分的掩模板，投影透镜，用于保持具有工件对准标记的工件的可动台，对准控制和用于 活动舞台。 在通过投影透镜投射到工件上的光源照射曝光图案区域部分之前，工件与掩模正确对准。 掩模板与工件之间的对准通过有效地使用具体排列并具有特定结构的对准/反射区域部分进行。 对准/反射区域在掩模板的不面向光源的表面上，并且包括用于将来自另一光源的光传导到工件的反射部分，并且传导从工件散射的光并通过投影透镜到 对准控制和掩模对准标记部分，当照明时，将掩模对准标记部分的图像提供给对准控制，使得其检测掩模对准标记部分和工件对准标记之间的位置关系，并产生控制信号 以实现掩模板和工件之间的对准。

公开(公告)号：US08483035B2

公开(公告)日：2013-07-09

申请号：US13482065

申请日：2012-05-29

申请人： Kaifeng Zhang ,  Takenori Hirose ,  Masahiro Watanabe ,  Shinji Homma ,  Tsuneo Nakagomi ,  Teruaki Tokutomi ,  Toshihiko Nakata ,  Takehiro Tachizaki

发明人： Kaifeng Zhang ,  Takenori Hirose ,  Masahiro Watanabe ,  Shinji Homma ,  Tsuneo Nakagomi ,  Teruaki Tokutomi ,  Toshihiko Nakata ,  Takehiro Tachizaki

IPC分类号： G11B7/00 ,  G11B5/09

CPC分类号： G11B5/455 ,  G11B2005/0021

摘要： In a method and an apparatus for inspecting a thermally assisted magnetic recording head element, a specimen is mounted on a table movable in a plane of a scanning probe microscope device, evanescent light is generated from a portion of light emission of evanescent light of the specimen, scattered light of the evanescent light is detected by moving the table in the plane while a cantilever of the scanning probe microscope having a probe is vertically vibrated in the vicinity of a surface of the specimen, and an intensity distribution of the evanescent light emitted from the portion of light emission of evanescent light or a surface profile of the portion of light emission of evanescent light of the specimen is inspected using position information of generation of the evanescent light based on the detected scattered light.

摘要翻译： 在用于检查热辅助磁记录头元件的方法和装置中，将样本安装在可在扫描探针显微镜装置的平面中移动的台上，从所述样本的渐逝光的发光部分产生ev逝光 通过在平面中移动台来检测ev逝光的散射光，同时具有探针的扫描探针显微镜的悬臂在试样的表面附近垂直振动，并且从from射光发射的ev逝光的强度分布 使用基于检测到的散射光的ev逝光的产生的位置信息来检查ev逝光的发光部分或试样的ev逝光的发光部分的表面轮廓。