公开(公告)号：US20090036026A1

公开(公告)日：2009-02-05

申请号：US12185719

申请日：2008-08-04

申请人： Jeffrey Drue David ,  Dominic J. Benvegnu ,  Harry Q. Lee ,  Boguslaw A. Swedek ,  Lakshmanan Karuppiah

发明人： Jeffrey Drue David ,  Dominic J. Benvegnu ,  Harry Q. Lee ,  Boguslaw A. Swedek ,  Lakshmanan Karuppiah

IPC分类号： B24B49/04 ,  B24B49/12

CPC分类号： B24B49/12 ,  B24B37/013 ,  B24B37/205 ,  B24B49/08 ,  B24D7/14 ,  H01L21/31053 ,  H01L21/3212 ,  H01L22/26

摘要： A computer program product that determines a polishing endpoint includes obtaining spectra from different zones on a substrate during different times in a polishing sequence, matches the spectra with indexes in a library and uses the indexes to determining a polishing rate for each of the different zones from the indexes. An adjusted polishing rate can be determined for one of the zones, which causes the substrate to have a desired profile when the polishing end time is reached.

摘要翻译： 确定抛光终点的计算机程序产品包括在抛光序列的不同时间内从基板上的不同区域获得光谱，将光谱与库中的索引匹配，并使用该指标来确定每个不同区域的抛光速率 指标。 可以为一个区域确定调整的抛光速率，这导致当达到抛光结束时间时，基板具有期望的轮廓。

公开(公告)号：US20080243433A1

公开(公告)日：2008-10-02

申请号：US12059435

申请日：2008-03-31

申请人： Abraham Ravid ,  Boguslaw A. Swedek ,  Dominic J. Benvegnu ,  Jeffrey Drue David ,  Jun Qian ,  Sidney P. Huey ,  Ingemar Carlsson ,  Lakshmanan Karuppiah ,  Harry Q. Lee

发明人： Abraham Ravid ,  Boguslaw A. Swedek ,  Dominic J. Benvegnu ,  Jeffrey Drue David ,  Jun Qian ,  Sidney P. Huey ,  Ingemar Carlsson ,  Lakshmanan Karuppiah ,  Harry Q. Lee

IPC分类号： G01B5/06

CPC分类号： G01N21/31 ,  G01N21/253 ,  H01L21/67161 ,  H01L21/67207 ,  H01L21/67253 ,  H01L21/67766

摘要： A method of generating a library from a reference substrate for use in processing product wafers is described. The method includes measuring substrate characteristics at a plurality of well-defined points of a reference substrate, measuring spectra at plurality of measurement points of the reference substrate, there being more measurement points than well-defined points, and associating measured spectra with measured substrate characteristics.

摘要翻译： 描述了从用于处理产品晶片的参考基板产生库的方法。 该方法包括在参考基板的多个明确定义的点处测量衬底特性，测量参考衬底的多个测量点处的光谱，存在比明确定义的点多的测量点，以及将测量的光谱与测量的衬底特性相关联 。