Backlight module
    1.
    发明授权
    Backlight module 有权
    背光模组

    公开(公告)号:US08337070B2

    公开(公告)日:2012-12-25

    申请号:US12951036

    申请日:2010-11-20

    IPC分类号: F21V7/04

    摘要: A backlight module comprises a light source circuit board having a plurality of light emitters disposed thereon; a securing component for supporting the light source circuit board rigidly, the securing component comprising a holding portion and an adhesive layer, the adhesive layer being utilized for assembling the light source circuit board and the securing component together to form an assembly; and a casing having a receiving slot, the assembly of the light source circuit board and the securing component being detachably disposed in the receiving slot, the holding portion being utilized for a user to grip when moving the securing component, and the holding portion having a locating hole for being fastened in the casing. The backlight module is capable of reducing the risk of scratching optical films and invasion by foreign objects in a replacement process of the light source circuit board, thereby increasing the lifespan of displays.

    摘要翻译: 背光模块包括:光源电路板,其上设置有多个发光体; 用于刚性地支撑光源电路板的固定部件,所述固定部件包括保持部分和粘合剂层,所述粘合剂层用于将光源电路板和固定部件组装在一起以形成组件; 以及壳体,其具有接收槽,所述光源电路板的组件和所述固定部件可拆卸地设置在所述接收槽中,所述保持部用于使用户在移动所述固定部件时抓握,并且所述保持部具有 用于固定在外壳中的定位孔。 背光模块能够降低在光源电路板的更换过程中划伤光学膜和异物的侵入的风险,从而增加显示器的寿命。

    Lithographic process for multi-etching steps by using single reticle
    2.
    发明授权
    Lithographic process for multi-etching steps by using single reticle 有权
    通过使用单个掩模版进行多次蚀刻步骤的平版印刷工艺

    公开(公告)号:US07129026B2

    公开(公告)日:2006-10-31

    申请号:US10366089

    申请日:2003-02-12

    IPC分类号: G03C5/00

    摘要: This invention provides a lithographic process for multi-etching steps by using single reticle, wherein the develop step is performed next to a bake step after the photoresist layer has been exposed, such that a photoresist residue is formed on the peripheral region around a transformed pattern of the photoresist. Because the photoresist residue has thinner thickness compared to the photoresist layer, this kind of developed photoresist layer can be used as the very mask for multi-etching steps.

    摘要翻译: 本发明提供了通过使用单个掩模版的多次蚀刻步骤的平版印刷工艺,其中在曝光光致抗蚀剂层之后,在烘烤步骤之后执行显影步骤,使得在变换图案周围的周边区域上形成光致抗蚀剂残留物 的光刻胶。 因为与光致抗蚀剂层相比,光致抗蚀剂残留物具有更薄的厚度,所以这种显影的光致抗蚀剂层可以用作多次蚀刻步骤的非常掩模。

    Manufacturing method and structure of copper lines for a liquid crystal panel

    公开(公告)号:US20050164592A1

    公开(公告)日:2005-07-28

    申请号:US11085907

    申请日:2005-03-21

    申请人: Yu-Chou Lee

    发明人: Yu-Chou Lee

    CPC分类号: H01L21/76877 G02F1/136286

    摘要: In those conventional arts, for large-size LCD, the process of copper damascene interconnect has some problems of forming a uneven copper seed layer and forming hollows during electrical plating due to the electrical plating area being too large to electroplate uniformly. In this invention, it employs a Cu tape to directly stick on a substrate to replace forming a copper seed layer and electroplating. Hence, the invention avoids the problem of unevenness and hollows in those conventional arts and so the Cu lines can be applied to the large-size LCD.

    Method for reducing contact impedance of thin film transistor
    4.
    发明授权
    Method for reducing contact impedance of thin film transistor 失效
    降低薄膜晶体管接触阻抗的方法

    公开(公告)号:US06844222B2

    公开(公告)日:2005-01-18

    申请号:US10465016

    申请日:2003-06-18

    IPC分类号: H01L29/49 H01L21/00 H01L21/84

    CPC分类号: H01L29/4908

    摘要: The present invention relates to reduce contact impedance of a gate electrode of a thin film transistor (TFT). It employs a double layer of AlNd/Cr or AlNd/Cr silicide as a material of the gate electrode and employs plasma atmosphere to clean a contact surface of the gate electrode.

    摘要翻译: 本发明涉及减小薄膜晶体管(TFT)的栅电极的接触阻抗。 其采用双层AlNd / Cr或AlNd / Cr硅化物作为栅电极的材料,并采用等离子体气氛来清洁栅电极的接触表面。

    Device and method for protecting gate terminal and lead
    5.
    发明授权
    Device and method for protecting gate terminal and lead 有权
    用于保护栅极端子和引线的装置和方法

    公开(公告)号:US07561223B2

    公开(公告)日:2009-07-14

    申请号:US11078245

    申请日:2005-03-09

    IPC分类号: G02F1/1333

    CPC分类号: H01L27/1288 H01L27/1214

    摘要: A resist region covering the gate terminal and lead and between a passivation layer and a gate insulating layer is used to protect the gate terminal and lead. The resist region is located at a scribing line on margin of the color filter substrate of a panel, thereby the resist region can protect the passivation layer and the gate insulating layer from cracking, and the gate terminal and the lead from corrosion after a portion of the color filter substrate is removed along the scribing line.

    摘要翻译: 使用覆盖栅极端子和引线以及钝化层和栅极绝缘层之间的抗蚀剂区域来保护栅极端子和引线。 抗蚀剂区域位于面板的滤色器基板的边缘上的划痕线上,由此抗蚀剂区域可以保护钝化层和栅极绝缘层免受开裂,并且栅极端子和引线在一部分 彩色滤光片基板沿划刻线移除。

    Manufacturing method and structure of copper lines for a liquid crystal panel
    7.
    发明授权
    Manufacturing method and structure of copper lines for a liquid crystal panel 失效
    液晶面板铜线的制造方法和结构

    公开(公告)号:US06979242B2

    公开(公告)日:2005-12-27

    申请号:US10449366

    申请日:2003-05-29

    申请人: Lee Yu-Chou

    发明人: Lee Yu-Chou

    CPC分类号: H01L21/76877 G02F1/136286

    摘要: In those conventional arts, for large-size LCD, the process of copper damascene interconnect has some problems of forming a uneven copper seed layer and forming hollows during electrical plating due to the electrical plating area being too large to electroplate uniformly. In this invention, it employs a Cu tape to directly stick on a substrate to replace forming a copper seed layer and electroplating. Hence, the invention avoids the problem of unevenness and hollows in those conventional arts and so the Cu lines can be applied to the large-size LCD.

    摘要翻译: 在这些传统技术中,对于大尺寸LCD,铜镶嵌互连的过程在电镀期间由于电镀面积太大而不能均匀地电镀而形成不均匀的铜籽晶层并形成中空部分的一些问题。 在本发明中,采用Cu带直接贴在基板上以代替形成铜籽晶层和电镀。 因此,本发明避免了这些现有技术中的凹凸和凹陷的问题,因此Cu线可以应用于大尺寸LCD。

    Device and method for protecting gate terminal and lead
    8.
    发明申请
    Device and method for protecting gate terminal and lead 有权
    用于保护栅极端子和引线的装置和方法

    公开(公告)号:US20050156247A1

    公开(公告)日:2005-07-21

    申请号:US11078245

    申请日:2005-03-09

    CPC分类号: H01L27/1288 H01L27/1214

    摘要: A resist region covering the gate terminal and lead of the gate electrode line and between a passivation layer and a gate insulating layer is used to protect the gate terminal and lead. The resist region is located at a scribing line on margin of the color filter substrate of a panel, thereby the resist region can protect the passivation layer and the gate insulating layer from cracking, and the gate terminal and the lead from corrosion after a portion of the color filter substrate is removed along the scribing line.

    摘要翻译: 覆盖栅极端子和栅电极引线之间以及钝化层和栅极绝缘层之间的抗蚀剂区域用于保护栅极端子和引线。 抗蚀剂区域位于面板的滤色器基板的边缘上的划痕线上,由此抗蚀剂区域可以保护钝化层和栅极绝缘层免受开裂,并且栅极端子和引线在一部分 彩色滤光片基板沿划刻线移除。