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公开(公告)号:US06676814B1
公开(公告)日:2004-01-13
申请号:US09687845
申请日:2000-10-13
IPC分类号: C23C1434
CPC分类号: C23C14/228 , C03C17/245 , C03C2217/228 , C03C2218/155 , C23C14/0057 , C23C14/0063 , C23C14/081
摘要: A method for manufacturing a display panel substrate has the steps of flowing a working gas along and out of a slit defined between two sputtering targets of Mg and toward the substrate thereby selecting the purity of the Mg material of the targets to be at least 99% and thereby blowing sputtered-off material out of the slit and toward the substrate. Introduction, in an area between the slit and the substrate, of a reactive gas containing oxygen, follows, and reacting the sputtered-off material with the reactive gas results in depositing on the substrate, an MgO layer. The method also includes setting the temperature of the substrate during the coating process.
摘要翻译: 一种制造显示面板基板的方法,其特征在于,使工作气体沿着Mg两个溅射靶之间限定的狭缝流过基板,从而将靶材的Mg材料的纯度选择为99%以上, 从而将溅出的材料吹出狭缝并朝向基板。 在狭缝和衬底之间的区域中介绍含有氧的反应性气体,随后将溅射材料与反应性气体反应,导致在衬底上沉积MgO层。 该方法还包括在涂覆过程中设置衬底的温度。
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公开(公告)号:US06623607B1
公开(公告)日:2003-09-23
申请号:US08985880
申请日:1997-12-05
IPC分类号: C23C1434
CPC分类号: C23C14/228 , C03C17/245 , C03C2217/228 , C03C2218/155 , C23C14/0057 , C23C14/0063 , C23C14/081
摘要: A method and apparatus for producing a substrate which is coated with a Mgo-layer, includes a pair of Mg targets which define a slit and which have a target purity of at least 99 percent. A working gas flows along the slit. Oxygen is provided in an area between the slit and the substrate to be coated. The temperature of the substrate is set by heating or cooling the substrate during the coating process.
摘要翻译: 用于制造涂有Mgo层的基材的方法和装置包括一对限定狭缝并且目标纯度至少为99%的Mg靶。 工作气体沿狭缝流动。 氧气设置在狭缝和待涂覆的基材之间的区域中。 通过在涂布过程中加热或冷却基底来设定基底的温度。
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