公开(公告)号：US07800062B2

公开(公告)日：2010-09-21

申请号：US10912792

申请日：2004-08-06

申请人： Alex Goldenshtein ,  Radel Ben-Av ,  Asher Pearl ,  Igor Petrov ,  Nadav Haas ,  Pavel Adamec ,  Yaron Gold

发明人： Alex Goldenshtein ,  Radel Ben-Av ,  Asher Pearl ,  Igor Petrov ,  Nadav Haas ,  Pavel Adamec ,  Yaron Gold

IPC分类号： G01B15/04

CPC分类号： G01N23/22 ,  G01N23/203 ,  H01J37/1478 ,  H01J37/265 ,  H01J2237/202 ,  H01J2237/2611 ,  H01J2237/281

摘要： The present invention provides, according to a first aspect, a method for the examination of specimen with a beam of charged particles. The method provides one or more images of the specimen made with different view angles, so that, compared to a single image of the specimen, a lot of additional information about the specimen can be accessed. The different view angles (angles of incidence) are achieved by tilting the beam between the two images and moving the specimen to a new position so that the displacement of the beam caused by the tilting of the beam is compensated. Accordingly, while displaying/recording the second image the beam scans over the same area as it has scanned while displaying/recording the first image.

摘要翻译： 根据第一方面，本发明提供一种用带电粒子束检查样品的方法。 该方法提供了具有不同视角的样本的一个或多个图像，使得与样本的单个图像相比，可以访问大量关于样本的附加信息。 通过在两个图像之间倾斜光束并将样本移动到新位置来实现不同的视角（入射角），使得由光束的倾斜引起的光束的位移被补偿。 因此，当显示/记录第二图像时，在显示/记录第一图像的同时，光束扫描与其扫描的相同的区域。

公开(公告)号：US20050116164A1

公开(公告)日：2005-06-02

申请号：US10912792

申请日：2004-08-06

申请人： Alex Goldenshtein ,  Radel Ben-Av ,  Asher Pearl ,  Igor Petrov ,  Nadav Haas

发明人： Alex Goldenshtein ,  Radel Ben-Av ,  Asher Pearl ,  Igor Petrov ,  Nadav Haas

IPC分类号： G01N23/203 ,  G01N23/22 ,  G21K7/00 ,  G01N23/00

CPC分类号： G01N23/22 ,  G01N23/203 ,  H01J37/1478 ,  H01J37/265 ,  H01J2237/202 ,  H01J2237/2611 ,  H01J2237/281

摘要： The present invention provides, according to a first aspect, a method for the examination of specimen with a beam of charged particles. The method provides one or more images of the specimen made with different view angles, so that, compared to a single image of the specimen, a lot of additional information about the specimen can be accessed. The different view angles (angles of incidence) are achieved by tilting the beam between the two images and moving the specimen to a new position so that the displacement of the beam caused by the tilting of the beam is compensated. Accordingly, while displaying/recording the second image the beam scans over the same area as it has scanned while displaying/recording the first image.

摘要翻译： 根据第一方面，本发明提供一种用带电粒子束检查样品的方法。 该方法提供了具有不同视角的样本的一个或多个图像，使得与样本的单个图像相比，可以访问大量关于样本的附加信息。 通过在两个图像之间倾斜光束并将样本移动到新位置来实现不同的视角（入射角），使得由光束的倾斜引起的光束的位移被补偿。 因此，当显示/记录第二图像时，在显示/记录第一图像的同时，光束扫描与其扫描的相同的区域。

公开(公告)号：US07400390B2

公开(公告)日：2008-07-15

申请号：US10999227

申请日：2004-11-29

申请人： Alex Goldenshtein ,  Emanuel Elyasaf

发明人： Alex Goldenshtein ,  Emanuel Elyasaf

IPC分类号： G01N21/00

CPC分类号： G03F7/70666 ,  G01N21/956

摘要： A method for inspecting a reticle, that includes the following stages: providing a reticle designed to be exposed by light of a first wavelength during a photolithography process; defining optical characteristics of an inspection system, whereas the optical characteristics include a second wavelength that differs from the first wavelength; and configuring an inspection system in response to the defined optical characteristics. An inspection system that includes: an illumination path adapted to direct light of a second wavelength towards a reticle designed to be exposed by light of a first wavelength during a photolithography process; a collection path adapted to collect light transmitted through the reticle; whereas at least one of the illumination path and collection path is configurable such that the inspection system emulates the photolithographic process while utilizing light of the second wavelength.

摘要翻译： 一种用于检查掩模版的方法，包括以下阶段：在光刻工艺期间提供设计成被第一波长的光曝光的掩模版; 定义检查系统的光学特性，而光学特性包括不同于第一波长的第二波长; 以及响应于所定义的光学特性来配置检查系统。 一种检查系统，包括：照明路径，其适于将第二波长的光引向设计成在光刻工艺期间被第一波长的光曝光的掩模版; 收集路径，其适于收集透过所述标线的光; 而照明路径和收集路径中的至少一个是可配置的，使得检查系统在利用第二波长的光的同时模拟光刻工艺。

公开(公告)号：US07072502B2

公开(公告)日：2006-07-04

申请号：US09876955

申请日：2001-06-07

申请人： Shirley Hemar ,  Alex Goldenshtein ,  Gadi Greenberg ,  Mula Friedman ,  Boaz Kenan

发明人： Shirley Hemar ,  Alex Goldenshtein ,  Gadi Greenberg ,  Mula Friedman ,  Boaz Kenan

IPC分类号： G06K9/00

CPC分类号： G03F7/70483 ,  G01N21/95607 ,  G03F1/30 ,  G03F1/84

摘要： A reticle inspection system and method for complete and fast inspection of phase shift mask reticles, both for incoming inspection and for periodic and pre-exposure inspection tool, is employable by facilities such as mask shops as an inspection tool compatible to the mask shop's customers. The inventive system and method detect phase errors in an aerial image by acquiring the image of the phase shift mask under the same optical conditions as the exposure conditions (i.e. wavelength, numerical aperture, sigma, and illumination aperture type). Images are acquired at a positive out-of-focus and a negative out-of-focus, and are compared in order to enhance possible phase error. The term “phase error” refers to the acceptable range of the phase deviation from the programmed 180° on the phase shift mask, by using the exposure system to achieve the image on the photoresist, satisfying the requirements of the wafer specification.

公开(公告)号：US20060114453A1

公开(公告)日：2006-06-01

申请号：US10999227

申请日：2004-11-29

申请人： Alex Goldenshtein ,  Emanuel Elyasaf

发明人： Alex Goldenshtein ,  Emanuel Elyasaf

IPC分类号： G01N21/88

CPC分类号： G03F7/70666 ,  G01N21/956

摘要： A method for inspecting a reticle, that includes the following stages: providing a reticle designed to be exposed by light of a first wavelength during a photolithography process; defining optical characteristics of an inspection system, whereas the optical characteristics include a second wavelength that differs from the first wavelength; and configuring an inspection system in response to the defined optical characteristics. An inspection system that includes: an illumination path adapted to direct light of a second wavelength towards a reticle designed to be exposed by light of a first wavelength during a photolithography process; a collection path adapted to collect light transmitted through the reticle; whereas at least one of the illumination path and collection path is configurable such that the inspection system emulates the photolithographic process while utilizing light of the second wavelength.

摘要翻译： 一种用于检查掩模版的方法，包括以下阶段：在光刻工艺期间提供设计成被第一波长的光曝光的掩模版; 定义检查系统的光学特性，而光学特性包括不同于第一波长的第二波长; 以及响应于所定义的光学特性配置检查系统。 一种检查系统，包括：照明路径，其适于将第二波长的光引向设计成在光刻工艺期间被第一波长的光曝光的掩模版; 收集路径，其适于收集透过所述标线的光; 而照明路径和收集路径中的至少一个是可配置的，使得检查系统在利用第二波长的光的同时模拟光刻工艺。