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公开(公告)号：US20090280435A1
公开(公告)日：2009-11-12
申请号：US12115776
申请日：2008-05-06
CPC分类号： G03F7/091
摘要： The invention relates to an antireflective coating composition comprising a polymer, a crosslinker and a thermal acid generator, where the polymer comprises at least one unit of structure (1), at least one unit of structure (2) and at least one structure of structure (3), where R1 to R9 is independently selected from H and C1-C6 alkyl, R′ and R″ is independently selected from H and C1-C6 alkyl, X is C1-C6 alkylene, Y is C1-C6 alkylene. The invention further relates to a process for imaging a photoresist coated over the antireflective coating composition.
摘要翻译： 本发明涉及包含聚合物，交联剂和热酸发生剂的抗反射涂料组合物，其中聚合物包含至少一个结构单元（1），至少一个结构单元（2）和至少一个结构结构 （3），其中R 1至R 9独立地选自H和C 1 -C 6烷基，R'和R“独立地选自H和C 1 -C 6烷基，X是C 1 -C 6亚烷基，Y是C 1 -C 6亚烷基。 本发明还涉及一种用于对涂覆在抗反射涂层组合物上的光致抗蚀剂进行成像的方法。
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公开(公告)号：US08017296B2
公开(公告)日：2011-09-13
申请号：US11872962
申请日：2007-10-16
申请人： Francis Houlihan , David Abdallah , M. Dalil Rahman , Douglas McKenzie , Ruzhi Zhang , Allen G. Timko , WooKyu Kim , Ping-Hung Lu
发明人： Francis Houlihan , David Abdallah , M. Dalil Rahman , Douglas McKenzie , Ruzhi Zhang , Allen G. Timko , WooKyu Kim , Ping-Hung Lu
IPC分类号： G03F7/04
CPC分类号： C09D165/00 , G03F7/091 , H01L21/0276
摘要： The present invention relates to an organic spin coatable antireflective coating composition comprising a polymer comprising at least one unit with 3 or more fused aromatic rings in the backbone of the polymer and at least one unit with an aliphatic moeity in the backbone of the polymer. The invention further relates to a process for imaging the present composition.
摘要翻译： 本发明涉及一种有机可旋涂的抗反射涂料组合物，其包含聚合物，该聚合物包含至少一个在聚合物主链中具有3个或更多个稠合芳环的单元和至少一个在聚合物主链中具有脂族摩尔的单元。 本发明还涉及用于对本发明组合物进行成像的方法。
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公开(公告)号：US07932018B2
公开(公告)日：2011-04-26
申请号：US12115776
申请日：2008-05-06
CPC分类号： G03F7/091
摘要： The invention relates to an antireflective coating composition comprising a polymer, a crosslinker and a thermal acid generator, where the polymer comprises at least one unit of structure (1), at least one unit of structure (2) and at least one structure of structure (3), where R1 to R9 is independently selected from H and C1-C6 alkyl, R′ and R″ is independently selected from H and C1-C6 alkyl, X is C1-C6 alkylene, Y is C1-C6 alkylene. The invention further relates to a process for imaging a photoresist coated over the antireflective coating composition.
摘要翻译： 本发明涉及包含聚合物，交联剂和热酸发生剂的抗反射涂料组合物，其中聚合物包含至少一个结构单元（1），至少一个结构单元（2）和至少一个结构结构 （3），其中R 1至R 9独立地选自H和C 1 -C 6烷基，R'和R“独立地选自H和C 1 -C 6烷基，X是C 1 -C 6亚烷基，Y是C 1 -C 6亚烷基。 本发明还涉及一种用于对涂覆在抗反射涂层组合物上的光致抗蚀剂进行成像的方法。
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公开(公告)号：US20080292995A1
公开(公告)日：2008-11-27
申请号：US11872962
申请日：2007-10-16
申请人： Francis Houlihan , David Abdallah , M. Dalil Rahman , Douglas McKenzie , Ruzhi Zhang , Allen G. Timko , Wookyu Kim , Ping-Hung Lu
发明人： Francis Houlihan , David Abdallah , M. Dalil Rahman , Douglas McKenzie , Ruzhi Zhang , Allen G. Timko , Wookyu Kim , Ping-Hung Lu
CPC分类号： C09D165/00 , G03F7/091 , H01L21/0276
摘要： The present invention relates to an organic spin coatable antireflective coating composition comprising a polymer comprising at least one unit with 3 or more fused aromatic rings in the backbone of the polymer and at least one unit with an aliphatic moeity in the backbone of the polymer. The invention further relates to a process for imaging the present composition.
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