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    Antireflective Coating Compositions Comprising Siloxane Polymer
    4.
    发明申请
    Antireflective Coating Compositions Comprising Siloxane Polymer 审中-公开
    包含硅氧烷聚合物的抗反射涂料组合物

    公开(公告)号：US20070298349A1

    公开(公告)日：2007-12-27

    申请号：US11425813

    申请日：2006-06-22

    申请人： Ruzhi Zhang ,  Mark O. Neisser ,  Woo-Kyu Kim ,  David J. Abdallah ,  Francis Houlihan ,  Ping-Hung Lu ,  Hong Zhuang

    发明人： Ruzhi Zhang ,  Mark O. Neisser ,  Woo-Kyu Kim ,  David J. Abdallah ,  Francis Houlihan ,  Ping-Hung Lu ,  Hong Zhuang

    IPC分类号： G03C1/00

    CPC分类号： C09D183/04 ,  G03F7/038 ,  G03F7/0757 ,  G03F7/091 ,  H01L21/02126 ,  H01L21/02216 ,  H01L21/02282

    摘要： The present invention relates to a novel antireflective coating composition for forming an underlayer for a photoresist comprising an acid generator and a novel siloxane polymer, where the siloxane polymer comprises at least one absorbing chromophore and at least one self-crosslinking functionality of structure (1), where m is 0 or 1, W and W′ are independently a valence bond or a connecting group linking the cyclic ether to the silicon of the polymer and L is selected from hydrogen, W′ and W, or L and W′ are combined to comprise a cycloaliphatic linking group linking the cyclic ether to the silicon of the polymer. The invention also relates to a process for imaging the photoresist coated over the novel antireflective coating composition and provides good lithographic results. The invention further relates to a novel siloxane polymer, where the siloxane polymer comprises at least one absorbing chromophore and at least one self-crosslinking functionality of structure (1).

    摘要翻译： 本发明涉及一种用于形成光致抗蚀剂底层的新型抗反射涂料组合物，其包含酸产生剂和新型硅氧烷聚合物，其中硅氧烷聚合物包含至少一种吸收发色团和至少一种结构（1）的自交联官能团， 其中m为0或1，W和W'独立地为价键或连接环状醚与聚合物硅的连接基团，L选自氢，W'和W，或L和W'组合 包括将环醚与聚合物的硅连接的脂环族连接基团。 本发明还涉及一种用于对涂覆在新型抗反射涂料组合物上的光致抗蚀剂进行成像的方法，并提供良好的光刻结果。 本发明还涉及新的硅氧烷聚合物，其中硅氧烷聚合物包含至少一种吸收发色团和至少一种结构（1）的自交联官能团。