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    APPARATUS
    3.
    发明申请
    APPARATUS 有权
    仪器

    公开(公告)号：US20100219740A1

    公开(公告)日：2010-09-02

    申请号：US12305848

    申请日：2007-06-29

    申请人： Mervyn Howard Davis ,  Andrew James Timothy Holmes

    发明人： Mervyn Howard Davis ,  Andrew James Timothy Holmes

    IPC分类号： H01J27/02

    CPC分类号： H01J37/04 ,  H01J27/024 ,  H01J37/3056 ,  H01J2237/04735 ,  H01J2237/08 ,  H05H15/00

    摘要： An apparatus (200) for accelerating an ion beam comprising: a) a first electrode (202) having a proximal side and a distal side and having at least one aperture (201) therethrough, the wall of the aperture being shaped such that the radius of the aperture on the distal side of the first electrode is greater than that on the proximal side of the electrode; b) a second electrode (204) located such that it is adjacent to but spaced from the distal side of the first electrode and having at least one aperture therethrough; and c) a third electrode (206) located such that it is adjacent to and spaced from the second electrode and having at least one aperture therethrough, said at least one apertures in each electrode being aligned with corresponding apertures in the other electrodes; wherein the electrodes are arranged such that there is a potential difference between the first and second electrodes and a potential difference between the second and third electrodes.

    摘要翻译： 一种用于加速离子束的装置（200），包括：a）具有近侧和远侧的第一电极（202），并且具有穿过其中的至少一个孔（201），孔的壁成形为使得半径 在第一电极的远侧上的孔径大于电极的近侧上的孔径; b）第二电极（204），其定位成使得其与第一电极的远侧相邻但间隔开并且具有穿过其中的至少一个孔; 以及c）第三电极（206），其定位成使得其与所述第二电极相邻并间隔开并且具有穿过其中的至少一个孔，每个电极中的所述至少一个孔与其它电极中的相应孔对齐; 其中所述电极被布置成使得在所述第一和第二电极之间存在电位差和所述第二和第三电极之间的电位差。

    Apparatus
    4.
    发明授权
    Apparatus 有权
    仪器

    公开(公告)号：US08471452B2

    公开(公告)日：2013-06-25

    申请号：US12305848

    申请日：2007-06-29

    申请人： Mervyn Howard Davis ,  Andrew James Timothy Holmes

    发明人： Mervyn Howard Davis ,  Andrew James Timothy Holmes

    IPC分类号： H01J27/02

    CPC分类号： H01J37/04 ,  H01J27/024 ,  H01J37/3056 ,  H01J2237/04735 ,  H01J2237/08 ,  H05H15/00

    摘要： An apparatus (200) for accelerating an ion beam comprising: a) a first electrode (202) having a proximal side and a distal side and having at least one aperture (201) therethrough, the wall of the aperture being shaped such that the radius of the aperture on the distal side of the first electrode is greater than that on the proximal side of the electrode; b) a second electrode (204) located such that it is adjacent to but spaced from the distal side of the first electrode and having at least one aperture therethrough; and c) a third electrode (206) located such that it is adjacent to and spaced from the second electrode and having at least one aperture therethrough, said at least one apertures in each electrode being aligned with corresponding apertures in the other electrodes; wherein the electrodes are arranged such that there is a potential difference between the first and second electrodes and a potential difference between the second and third electrodes.

    摘要翻译： 一种用于加速离子束的装置（200），包括：a）具有近侧和远侧的第一电极（202），并且具有穿过其中的至少一个孔（201），孔的壁成形为使得半径 在第一电极的远侧上的孔径大于电极的近侧上的孔径; b）第二电极（204），其定位成使得其与第一电极的远侧相邻但间隔开并且具有穿过其中的至少一个孔; 以及c）第三电极（206），其定位成使得其与所述第二电极相邻并间隔开并且具有穿过其中的至少一个孔，每个电极中的所述至少一个孔与其它电极中的相应孔对齐; 其中所述电极被布置成使得在所述第一和第二电极之间存在电位差和所述第二和第三电极之间的电位差。

    Magnet array
    5.
    发明授权
    Magnet array 有权
    磁铁阵列

    公开(公告)号：US06190517B1

    公开(公告)日：2001-02-20

    申请号：US09180457

    申请日：1999-02-22

    申请人： Mervyn Howard Davis ,  David Ian Charles Pearson ,  Simon Richard Reeves ,  Barry Diver

    发明人： Mervyn Howard Davis ,  David Ian Charles Pearson ,  Simon Richard Reeves ,  Barry Diver

    IPC分类号： H01J3734

    CPC分类号： H01J37/3429 ,  H01F7/20 ,  H01J37/3402 ,  H01J37/3426

    摘要： An electro-magnet array for use in a sputtering apparatus. The array has a magnetisable core member extending substantially horizontally and having magnetisable outward projections arranged as at least two pairs of symmetrically opposed projections projecting outwardly from the core member. A pole member is associated with each projection and vertically displaced with respect thereto. A magnetisable coupler is arranged to couple each pole piece magnetically to its respective projection. A magnetising coil around each projection is arranged for producing a magnetic field aligned substantially with a horizontal axis of symmetry of its respective projection in dependence upon the direction of flow of electric current through the magnetising coil. The magnetising coils are arranged so that, upon energisation, the magnetic field of one coil of a pair of projections can produce a south pole at an inward side of its respective pole piece while the magnetic field of the coil of the other projection of the pair produces a north pole at an inward side of its respective pole piece. At any moment, at least two inwardly facing south poles are produced on the pole pieces on one side of a vertical plane of symmetry through the array and an equal number of inwardly facing north poles are produced on the pole pieces on the other side of the vertical plane of symmetry.

    摘要翻译： 一种用于溅射装置的电磁体阵列。 阵列具有基本上水平延伸的可磁化芯部构件，并且具有可磁化的向外突出部，其布置为从芯构件向外突出的至少两对对称相对的突出部。 极构件与每个突起相关联并且相对于其垂直移位。 可磁化耦合器被布置成将每个极片磁性地耦合到其相应的突起。 布置在每个突起周围的磁化线圈，用于根据其通过磁化线圈的电流的流动方向产生基本上与其各自的突起的水平对称轴对准的磁场。 磁化线圈被布置成使得在通电时，一对突起的一个线圈的磁场可以在其相应极片的内侧产生南极，同时该对的另一个突起的线圈的磁场 在其各自的极片的内侧产生北极。 在任何时候，通过阵列在垂直对称平面的一侧的极片上产生至少两个向内的南极，并且在另一侧的极片上产生相等数目的向内的北极 垂直对称平面。

    Apparatus
    7.
    发明申请
    Apparatus 审中-公开
    仪器

    公开(公告)号：US20090260975A1

    公开(公告)日：2009-10-22

    申请号：US12469282

    申请日：2009-05-20

    申请人： Mervyn Howard Davis

    发明人： Mervyn Howard Davis

    IPC分类号： C23C14/34

    CPC分类号： H01J37/3473 ,  C23C14/3464 ,  C23C14/352 ,  C23C14/568

    摘要： A vacuum sputtering apparatus capable of depositing a plurality of thin film layers on a substrate, the apparatus comprising: a vacuum chamber (1) having gas inlet means and gas evacuation means; a substrate support table (2) arranged to be rotatable about at least one axis perpendicular to the plane of the table; means for rotating the substrate support table about said at least one axis; a plurality of sputtering targets (5) spaced around the walls of the chamber, each sputtering target having electrode means associated therewith; and means for altering the position of the substrate support table relative to each one of the plurality of sputtering targets (4) such that in use a substrate placed on the substrate support table may have a film deposited thereon of atoms sputtered from at least one of the said plurality of targets and subsequently, following alteration of the position of the substrate support table, have at least one further film deposited thereon by exposure to atoms form at least one other of said plurality of targets. A method of depositing multi-layer materials on a substrate and a method of controlling stoichiometry of deposited alloys are also provided.

    摘要翻译： 一种能够在基板上沉积多个薄膜层的真空溅射装置，该装置包括：真空室（1），具有气体入口装置和排气装置; 基板支撑台（2），布置成可绕垂直于工作台平面的至少一个轴线旋转; 用于使所述基板支撑台围绕所述至少一个轴线旋转的装置; 多个溅射靶（5）围绕室的壁间隔开，每个溅射靶具有与其相关联的电极装置; 以及用于相对于所述多个溅射靶（4）中的每一个改变所述衬底支撑台的位置的装置，使得在使用中，放置在所述衬底支撑台上的衬底可以具有沉积在其上的至少一个溅射靶 所述多个靶并且随后在衬底支撑台的位置改变之后，通过暴露于原子形成至少一个另外的膜，所述至少一个另外的膜形成所述多个靶中的至少另一个靶。 还提供了在衬底上沉积多层材料的方法和控制沉积合金的化学计量的方法。