公开(公告)号：US11915907B2

公开(公告)日：2024-02-27

申请号：US17590148

申请日：2022-02-01

Applicant: Carl Zeiss Microscopy GmbH

Inventor： Dirk Preikszas ,  Simon Diemer

IPC: H01J37/21 ,  H01J37/28 ,  H01J37/12 ,  H01J37/244

CPC classification number: H01J37/21 ,  H01J37/12 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/04735

Abstract: A method for operating a particle beam microscopy system includes recording a first particle-microscopic image at a given first focus and varying the excitations of the first deflection device within a given first range. The method also includes changing the focus to a second focus, and determining a second range of excitations of the first deflection device on the basis of the first range, the first excitation, the second excitation and a machine parameter determined in advance. The method further includes recording a second particle-microscopic image at the second focus and varying the excitations of the first deflection device within the determined second range. The second range of excitations is determined so that a region of the object represented in the second particle-microscopic image was also represented in the first particle-microscopic image.

公开(公告)号：US20170110286A1

公开(公告)日：2017-04-20

申请号：US14882518

申请日：2015-10-14

Applicant: Varian Semiconductor Equipment Associates, Inc.

Inventor： Shengwu Chang ,  Kristen Rounds ,  William Leavitt ,  Daniel Brosnan

IPC: H01J37/30 ,  H01J37/317

CPC classification number: H01J37/3002 ,  H01J37/12 ,  H01J37/3171 ,  H01J2237/047 ,  H01J2237/04735 ,  H01J2237/04756 ,  H01J2237/04924

Abstract: Provided herein are approaches for controlling an ion beam within an accelerator/decelerator. In an exemplary approach, an ion implantation system includes an ion source for generating an ion beam, and a terminal suppression electrode coupled to a terminal, wherein the terminal suppression electrode is configured to conduct the ion beam through an aperture of the terminal suppression electrode and to apply a first potential to the ion beam from a first voltage supply. The system further includes a lens coupled to the terminal and disposed adjacent the terminal suppression electrode, wherein the lens is configured to conduct the ion beam through an aperture of the lens and to apply a second potential to the ion beam from a second voltage supply. In an exemplary approach, the lens is electrically insulated from the terminal suppression electrode and independently driven, thus allowing for an increased beam current operation range.

公开(公告)号：US09443692B2

公开(公告)日：2016-09-13

申请号：US14803964

申请日：2015-07-20

Applicant: FEI Company

Inventor： Mostafa Maazouz

IPC: H01J3/14 ,  H01J37/07 ,  H01J37/21 ,  H01J37/10 ,  H01J37/04 ,  H01J37/305 ,  H01J3/02 ,  H01J37/06 ,  H01J37/147 ,  H01J37/248

CPC classification number: H01J37/07 ,  H01J3/026 ,  H01J37/04 ,  H01J37/06 ,  H01J37/10 ,  H01J37/1477 ,  H01J37/21 ,  H01J37/248 ,  H01J37/3056 ,  H01J37/3178 ,  H01J2237/0473 ,  H01J2237/04735 ,  H01J2237/04756 ,  H01J2237/1518 ,  H01J2237/1534 ,  H01J2237/28 ,  H01J2237/31749

Abstract: The invention provides a charged particle beam system wherein the middle section of the focused ion beam column is biased to a high negative voltage allowing the beam to move at higher potential than the final beam energy inside that section of the column. At low kV potential, the aberrations and coulomb interactions are reduced, which results in significant improvements in spot size.

公开(公告)号：US20150083929A1

公开(公告)日：2015-03-26

申请号：US14565051

申请日：2014-12-09

Applicant: FEI Company

Inventor： Mostafa Maazouz

IPC: H01J37/147 ,  H01J37/248 ,  H01J37/06

CPC classification number: H01J37/07 ,  H01J3/026 ,  H01J37/04 ,  H01J37/06 ,  H01J37/10 ,  H01J37/1477 ,  H01J37/21 ,  H01J37/248 ,  H01J37/3056 ,  H01J37/3178 ,  H01J2237/0473 ,  H01J2237/04735 ,  H01J2237/04756 ,  H01J2237/1518 ,  H01J2237/1534 ,  H01J2237/28 ,  H01J2237/31749

Abstract: The invention provides a charged particle beam system wherein the middle section of the focused ion beam column is biased to a high negative voltage allowing the beam to move at higher potential than the final beam energy inside that section of the column. At low kV potential, the aberrations and coulomb interactions are reduced, which results in significant improvements in spot size.

公开(公告)号：US20140158902A1

公开(公告)日：2014-06-12

申请号：US14165573

申请日：2014-01-27

Applicant: Applied Materials Israel, Ltd. ,  Carl Zeiss Microscopy GmbH

Inventor： Rainer Knippelmeyer ,  Oliver Kienzle ,  Thomas Kemen ,  Heiko Mueller ,  Stephan Uhlemann ,  Maximilian Haider ,  Antonio Casares ,  Steven Rogers

IPC: H01J37/30 ,  H01J37/317 ,  H01J37/10

CPC classification number: H01J37/04 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/09 ,  H01J37/10 ,  H01J37/14 ,  H01J37/153 ,  H01J37/28 ,  H01J37/3007 ,  H01J37/3177 ,  H01J2237/0435 ,  H01J2237/0453 ,  H01J2237/047 ,  H01J2237/04735 ,  H01J2237/04756 ,  H01J2237/06 ,  H01J2237/14 ,  H01J2237/2817 ,  H01J2237/31774

Abstract: A particle-optical arrangement comprises a charged-particle source for generating a beam of charged particles; a multi-aperture plate arranged in a beam path of the beam of charged particles, wherein the multi-aperture plate has a plurality of apertures formed therein in a predetermined first array pattern, wherein a plurality of charged-particle beamlets is formed from the beam of charged particles downstream of the multi-aperture plate, and wherein a plurality of beam spots is formed in an image plane of the apparatus by the plurality of beamlets, the plurality of beam spots being arranged in a second array pattern; and a particle-optical element for manipulating the beam of charged particles and/or the plurality of beamlets; wherein the first array pattern has a first pattern regularity in a first direction, and the second array pattern has a second pattern regularity in a second direction electron-optically corresponding to the first direction, and wherein the second regularity is higher than the first regularity.

Abstract translation: 粒子光学装置包括用于产生带电粒子束的带电粒子源; 布置在带电粒子束的光束路径中的多孔板，其中多孔板具有以预定的第一阵列图案形成在其中的多个孔，其中多个带电粒子子束由束形成 在多孔板下游的带电粒子，并且其中通过所述多个子束在所述装置的图像平面中形成多个束斑，所述多个束斑以第二阵列图案布置; 以及用于操纵带电粒子束和/或多个子束的粒子光学元件; 其中所述第一阵列图案在第一方向上具有第一图案规则性，并且所述第二阵列图案在与所述第一方向对应的电子 - 光学上的第二方向上具有第二图案规则性，并且其中所述第二规则性高于所述第一规则性。

公开(公告)号：US20130284948A1

公开(公告)日：2013-10-31

申请号：US13997522

申请日：2011-12-27

Applicant: Kouichi Iwamoto

Inventor： Kouichi Iwamoto

IPC: H01J1/02 ,  H01B13/06

CPC classification number: H01J1/02 ,  C04B35/117 ,  C04B35/478 ,  C04B35/62655 ,  C04B35/6455 ,  C04B2235/3217 ,  C04B2235/3234 ,  C04B2235/658 ,  C04B2235/6582 ,  H01B13/06 ,  H01J37/147 ,  H01J2237/047 ,  H01J2237/04735 ,  H01J2237/04756

Abstract: A ceramic member containing an insulating member is disclosed. The ceramic member comprises a ceramic body and an insulating layer on the ceramic body. The ceramic body contains aluminum oxide crystals and aluminum titanate crystals. The insulating layer contains silicon oxide as a main component. The ceramic body includes a first region that includes a first surface portion covered by the insulating layer, and a second region outside the first region, and having a surface resistivity of 1×106 to 1×109Ω/□. A surface resistivity of the first region is higher than the surface resistivity of the second region.

Abstract translation: 公开了一种包含绝缘构件的陶瓷构件。 陶瓷构件包括陶瓷体和陶瓷体上的绝缘层。 陶瓷体含有氧化铝晶体和钛酸铝晶体。 绝缘层包含氧化硅作为主要成分。 陶瓷体包括第一区域，其包括由绝缘层覆盖的第一表面部分和第一区域外部的第二区域，并且具有1×10 6至1×10 9Ω/□的表面电阻率。 第一区域的表面电阻率高于第二区域的表面电阻率。

公开(公告)号：US07999239B2

公开(公告)日：2011-08-16

申请号：US11968527

申请日：2008-01-02

Applicant: Kasegn D. Tekletsadik ,  Russell J. Low

Inventor： Kasegn D. Tekletsadik ,  Russell J. Low

IPC: G21K5/04 ,  H05H5/06

CPC classification number: H01J37/3171 ,  H01J2237/0206 ,  H01J2237/032 ,  H01J2237/038 ,  H01J2237/047 ,  H01J2237/04735 ,  H01J2237/04756

Abstract: Techniques for reducing an electrical stress in a acceleration/deceleration system are disclosed. In one particular exemplary embodiment, the techniques may be realized as an acceleration/deceleration system. The acceleration/deceleration system may comprise an acceleration column including a plurality of electrodes having apertures through which a charged particle beam may pass. The acceleration/deceleration system may also comprise a plurality of voltage grading components respectively electrically coupled to the plurality of electrodes. The acceleration/deceleration system may further comprise a plurality of insulated conductors disposed proximate the plurality of voltage grading components to modify an electrical field about the plurality of voltage grading components.

Abstract translation: 公开了一种用于减小加速/减速系统中的电应力的技术。 在一个特定的示例性实施例中，这些技术可以被实现为加速/减速系统。 加速/减速系统可以包括加速度柱，其包括多个具有带孔粒子束可以穿过的孔的电极。 加速/减速系统还可以包括分别电耦合到多个电极的多个电压分级部件。 加速/减速系统还可以包括多个绝缘导体，其布置在多个电压分级部件附近，以修改围绕多个电压分级部件的电场。

公开(公告)号：US07902527B2

公开(公告)日：2011-03-08

申请号：US12194515

申请日：2008-08-19

Applicant: Jiong Chen ,  Nicholas R. White

Inventor： Jiong Chen ,  Nicholas R. White

IPC: H01J37/317 ,  H01J37/28 ,  G21K1/00

CPC classification number: H01J37/08 ,  H01J37/147 ,  H01J37/1472 ,  H01J37/3171 ,  H01J2237/022 ,  H01J2237/04735 ,  H01J2237/04756 ,  H01J2237/055 ,  H01J2237/057 ,  H01J2237/083 ,  H01J2237/1503 ,  H01J2237/201 ,  H01J2237/31701

Abstract: An ion implantation apparatus with multiple operating modes is disclosed. The ion implantation apparatus has an ion source and an ion extraction means for extracting a ribbon-shaped ion beam therefrom. The ion implantation apparatus includes a magnetic analyzer for selecting ions with specific mass-to-charge ratio to pass through a mass slit to project onto a substrate. Multipole lenses are provided to control beam uniformity and collimation. A two-path beamline in which a second path incorporates a deceleration or acceleration system incorporating energy filtering is disclosed. Finally, methods of ion implantation are disclosed in which the mode of implantation may be switched from one-dimensional scanning of the target to two-dimensional scanning.

Abstract translation: 公开了一种具有多种工作模式的离子注入装置。 离子注入装置具有离子源和用于从其提取带状离子束的离子提取装置。 离子注入装置包括用于选择具有特定质荷比的离子的磁分析器，以通过质量狭缝投影到基底上。 提供多极镜头以控制光束的均匀性和准直。 公开了一种二路光束线，其中第二路径包括并入能量过滤的减速或加速系统。 最后，公开了离子注入的方法，其中注入模式可以从目标的一维扫描切换到二维扫描。

公开(公告)号：US07820986B2

公开(公告)日：2010-10-26

申请号：US11854852

申请日：2007-09-13

Applicant: Piotr R. Lubicki ,  Russell J. Low ,  Joseph C. Olson ,  Anthony Renau

Inventor： Piotr R. Lubicki ,  Russell J. Low ,  Joseph C. Olson ,  Anthony Renau

IPC: H01J37/317 ,  H05H5/06

CPC classification number: H01J37/04 ,  H01J37/3171 ,  H01J2237/04735 ,  H01J2237/04756 ,  H05H15/00

Abstract: Techniques for controlling a charged particle beam are disclosed. In one particular exemplary embodiment, the techniques may be realized as a charged particle acceleration/deceleration system. The charged particle acceleration/deceleration system may comprise an acceleration column. The acceleration column may comprise a plurality of electrodes having apertures through which a charged particle beam may pass. The charged particle acceleration/deceleration system may also comprise a plurality of resistors electrically coupled to the plurality of electrodes. The charged particle acceleration/deceleration system may further comprise a plurality of switches electrically coupled to the plurality of electrodes and the plurality of resistors, each of the plurality of switches may be configured to be selectively switched respectively in a plurality of operation modes.

Abstract translation: 公开了用于控制带电粒子束的技术。 在一个特定的示例性实施例中，这些技术可以被实现为带电粒子加速/减速系统。 带电粒子加速/减速系统可以包括加速度列。 加速柱可以包括具有孔的多个电极，带电粒子束可以通过该孔。 带电粒子加速/减速系统还可以包括电耦合到多个电极的多个电阻器。 带电粒子加速/减速系统还可以包括电耦合到多个电极和多个电阻器的多个开关，多个开关中的每一个可被配置为分别以多种操作模式选择性地切换。

公开(公告)号：US07718976B2

公开(公告)日：2010-05-18

申请号：US11762802

申请日：2007-06-14

Applicant: Takeshi Kawasaki ,  Mitsugu Sato ,  Makoto Ezumi ,  Tomonori Nakano

Inventor： Takeshi Kawasaki ,  Mitsugu Sato ,  Makoto Ezumi ,  Tomonori Nakano

IPC: G21K1/08

CPC classification number: H01J37/153 ,  H01J37/248 ,  H01J37/28 ,  H01J2237/04735 ,  H01J2237/1534

Abstract: The present invention provides a stable charged particle beam apparatus to enable high-resolution observation by reducing the influence of the noise of a large number of power supplies used in an aberration corrector. The charged particle beam apparatus that has: an SEM column for irradiating an electron beam onto a specimen and making the electron beam scan it; a specimen chamber for housing a specimen stage on which the specimen is placed and held; a detector for detecting secondary electrons generated by the scanning of the electron beam; display means for displaying an output signal of the detector as an SEM image; and a control unit for controlling component parts including the SEM column, the specimen chamber, and the display means. The SEM column has a pair of accelerating electrodes and an aberration corrector that is placed between the pair of accelerating electrodes and corrects aberration of the electron beam, and accelerates the electron beam during a period when being transmitted through the aberration corrector by a high voltage being impressed across the pair of accelerating electrodes.

Abstract translation: 本发明提供了一种稳定的带电粒子束装置，通过减少在像差校正器中使用的大量电源的噪声的影响来实现高分辨率观察。 具有：用于将电子束照射到试样上并使电子束扫描的SEM柱的带电粒子束装置; 用于容纳放置和保持所述试样的试样台的试样室; 用于检测由扫描电子束产生的二次电子的检测器; 用于将检测器的输出信号显示为SEM图像的显示装置; 以及用于控制包括SEM柱，样品室和显示装置的部件的控制单元。 SEM列具有一对加速电极和像差校正器，该像素校正器被放置在一对加速电极之间并校正电子束的像差，并且通过高电压透过像差校正器的期间加速电子束 穿过该对加速电极。