公开(公告)号：US5871848A

公开(公告)日：1999-02-16

申请号：US944364

申请日：1997-10-06

申请人： Michael J. Bozack ,  Lynwood W. Swanson ,  Anthony E. Bell ,  William M. Clark Jr. ,  Mark W. Utlaut ,  Edmund K. Storms

发明人： Michael J. Bozack ,  Lynwood W. Swanson ,  Anthony E. Bell ,  William M. Clark Jr. ,  Mark W. Utlaut ,  Edmund K. Storms

IPC分类号： H01J27/22 ,  B32B9/00

CPC分类号： H01J27/22 ,  Y10T428/30

摘要： A binary, boron-based alloy as a source for field-emission-type, ion-beam generating devices, wherein boron predominates in the alloy, preferably with a presence of about 60 atomic percent. The other constituent in the alloy is selected from the group of elements consisting of nickel, palladium and platinum. Predominance of boron in these alloys, during operation, promotes combining of boron with trace impurities of carbon in the alloys to form B.sub.4 C and thus to promote wetting of an associated carbon support substrate.

摘要翻译： 二元硼基合金作为场致发射型离子束产生装置的源，其中硼在合金中占优势，优选约为60原子百分比。 合金中的其他成分选自镍，钯和铂组成的元素组。 在这些合金中硼的优势在操作过程中促进硼与合金中的微量微量杂质结合形成B 4 C，从而促进相关碳支撑基底的润湿。

公开(公告)号：US4755683A

公开(公告)日：1988-07-05

申请号：US104410

申请日：1987-10-05

申请人： Anthony E. Bell ,  Lynwood W. Swanson

发明人： Anthony E. Bell ,  Lynwood W. Swanson

IPC分类号： H01J27/26 ,  H01J27/02

CPC分类号： H01J27/26

摘要： A corrosion-resistant, long-life, high-capacity, power-efficient source substructure for a source of liquid-metal ions useable in focused-ion-beam apparatus. The substructure takes the form of an elongate carbon needle, pointed at one end, structurally supported entirely within the turns of an electrical heating coil having end leads which are conductively connected to, and structurally supported by, a pair of larger cross section electrical feeder legs.

摘要翻译： 用于聚焦离子束设备中的液态金属离子源的耐腐蚀，长寿命，高容量，功率有效的源子结构。 子结构采取细长碳针的形式，指向一端，其结构上完全支撑在电加热线圈的匝内，该电加热线圈的端部引线导电地连接到一对较大横截面的馈电支腿 。

公开(公告)号：US4670685A

公开(公告)日：1987-06-02

申请号：US851755

申请日：1986-04-14

申请人： William M. Clark, Jr. ,  Mark W. Utlaut ,  Joseph A. Wysocki ,  Edmund K. Storms ,  Eugene G. Szklarz ,  Robert G. Behrens ,  Lynwood W. Swanson ,  Anthony E. Bell

发明人： William M. Clark, Jr. ,  Mark W. Utlaut ,  Joseph A. Wysocki ,  Edmund K. Storms ,  Eugene G. Szklarz ,  Robert G. Behrens ,  Lynwood W. Swanson ,  Anthony E. Bell

IPC分类号： H01J27/26 ,  H01J37/08 ,  H01J1/05

CPC分类号： H01J37/08 ,  H01J27/26

摘要： A liquid metal ion source and alloy for the simultaneous ion evaporation of arsenic and boron, arsenic and phosphorus, or arsenic, boron and phosphorus. The ionic species to be evaporated are contained in palladium-arsenic-boron and palladium-arsenic-boron-phosphorus alloys. The ion source, including an emitter means such as a needle emitter and a source means such as U-shaped heater element, is preferably constructed of rhenium and tungsten, both of which are readily fabricated. The ion sources emit continuous beams of ions having sufficiently high currents of the desired species to be useful in ion implantation of semiconductor wafers for preparing integrated circuit devices. The sources are stable in operation, experience little corrosion during operation, and have long operating lifetimes.

摘要翻译： 一种液态金属离子源和合金，用于同时离子蒸发砷和硼，砷和磷，或砷，硼和磷。 待蒸发的离子物质包含在钯 - 砷 - 硼和钯 - 砷 - 硼 - 磷合金中。 包括诸如针发射器和诸如U形加热器元件的源装置的发射器装置的离子源优选地由铼和钨构成，这两者都容易制造。 离子源发射具有足够大的所需物质电流的连续离子束，以用于制备集成电路器件的半导体晶片的离子注入。 来源运行稳定，运行时腐蚀小，使用寿命长。