公开(公告)号：US20130328246A1

公开(公告)日：2013-12-12

申请号：US13493735

申请日：2012-06-11

申请人： Andrew B. Wells ,  N. William Parker ,  Clive D. Chandler ,  Mark W. Utlaut

发明人： Andrew B. Wells ,  N. William Parker ,  Clive D. Chandler ,  Mark W. Utlaut

IPC分类号： H01J37/26 ,  H01J37/20

CPC分类号： G01N1/32 ,  H01J37/3023 ,  H01J37/3056 ,  H01J2237/31745

摘要： A system for creating a substantially planar face in a substrate, the system including directing one or more beams at a first surface of a substrate to remove material from a first location, the beam being offset from a normal to the first surface by a curtaining angle; sweeping the one or more beams in a plane that is perpendicular to the first surface to mill one or more initial cuts, the initial cuts exposing a second surface that is substantially perpendicular to the first surface; rotating the substrate about an axis other than an axis normal to the first beam or parallel to the first beam; directing the first beam at the second surface to remove additional material from the substrate without changing the curtaining angle; and scanning the one or more beams in across the second surface to mill one or more finishing cuts.

摘要翻译： 一种用于在基板中产生基本上平坦的面的系统，所述系统包括在基板的第一表面处引导一个或多个光束以从第一位置移除材料，所述光束从第一表面的法线偏移一个展示角 ; 在垂直于第一表面的平面中扫掠一个或多个光束以研磨一个或多个初始切割，初始切割暴露基本上垂直于第一表面的第二表面; 围绕除了垂直于第一光束的轴的轴线或平行于第一光束的轴线旋转基板; 在所述第二表面处引导所述第一光束以从所述衬底移除附加材料而不改变所述观察角度; 并且扫描穿过第二表面的一个或多个光束以研磨一个或多个精加工切割。

公开(公告)号：US20130015765A1

公开(公告)日：2013-01-17

申请号：US13182187

申请日：2011-07-13

申请人： Anthony Graupera ,  Sean Kellogg ,  Mark W. Utlaut ,  N. William Parker

发明人： Anthony Graupera ,  Sean Kellogg ,  Mark W. Utlaut ,  N. William Parker

IPC分类号： H05H1/46

CPC分类号： H01J37/3002 ,  H01J37/08 ,  H01J37/18 ,  H01J2237/006 ,  H01J2237/08 ,  H01J2237/0827

摘要： An openable gas passage provides for rapid pumpout of process or bake out gases in an inductively coupled plasma source in a charged particle beam system. A valve, typically positioned in the source electrode or part of the gas inlet, increases the gas conductance when opened to pump out the plasma chamber and closes during operation of the plasma source.

摘要翻译： 可打开的气体通道提供在带电粒子束系统中的电感耦合等离子体源中快速抽出工艺或烘烤气体。 通常定位在源电极或气体入口的一部分中的阀在打开时增加气体导电性，以便在等离子体源的操作期间泵出等离子体室并关闭。

公开(公告)号：US08319181B2

公开(公告)日：2012-11-27

申请号：US13017016

申请日：2011-01-30

申请人： N. William Parker ,  Mark W. Utlaut

发明人： N. William Parker ,  Mark W. Utlaut

IPC分类号： H01J37/26 ,  G01N21/64 ,  G01N23/00

CPC分类号： G01N21/6428 ,  G01N21/6458 ,  G01N21/6486 ,  G01N23/225 ,  H01J37/228 ,  H01J37/28 ,  H01J37/285 ,  H01J2237/206 ,  H01J2237/2443 ,  H01J2237/24455 ,  H01J2237/2448 ,  H01J2237/2803 ,  H01J2237/2857

摘要： A method and system for the imaging and localization of fluorescent markers such as fluorescent proteins or quantum dots within biological samples is disclosed. The use of recombinant genetics technology to insert “reporter” genes into many species is well established. In particular, green fluorescent proteins (GFPs) and their genetically-modified variants ranging from blue to yellow, are easily spliced into many genomes at the sites of genes of interest (GoIs), where the GFPs are expressed with no apparent effect on the functioning of the proteins of interest (PoIs) coded for by the GoIs. One goal of biologists is more precise localization of PoIs within cells. The invention is a method and system for enabling more rapid and precise PoI localization using charged particle beam-induced damage to GFPs. Multiple embodiments of systems for implementing the method are presented, along with an image processing method relatively immune to high statistical noise levels.

摘要翻译： 公开了用于生物样品中荧光标记如荧光蛋白或量子点的成像和定位的方法和系统。 使用重组遗传技术将报道基因插入许多物种已经很成熟。 特别地，绿色荧光蛋白（GFP）及其从蓝色到黄色的遗传修饰的变体易于在感兴趣的基因（GoI）的位点处接合到许多基因组中，其中GFP表达对功能没有明显的影响 的由GoI编码的感兴趣的蛋白质（PoI）。 生物学家的一个目标是更精确地定位细胞内的PoI。 本发明是一种方法和系统，用于使得能够使用带电粒子束对GFP的损伤进行更快速和精确的PoI定位。 提出了用于实现该方法的系统的多个实施例，以及相对不受高统计噪声水平影响的图像处理方法。

公开(公告)号：US08314410B2

公开(公告)日：2012-11-20

申请号：US13082372

申请日：2011-04-07

申请人： Marcus Straw ,  Mark W. Utlaut ,  N. William Parker

发明人： Marcus Straw ,  Mark W. Utlaut ,  N. William Parker

IPC分类号： H01J37/26 ,  H01J3/14 ,  H01J37/00

CPC分类号： H01J37/28 ,  H01J37/226 ,  H01J37/244 ,  H01J37/3056 ,  H01J2237/2815 ,  H01J2237/2855 ,  H01J2237/3174 ,  H01J2237/31749

摘要： A combined laser and charged particle beam system. A pulsed laser enables milling of a sample at material removal rates several orders of magnitude larger than possible for a focused ion beam. In some embodiments, a scanning electron microscope enables high resolution imaging of the sample during laser processing. In some embodiments, a focused ion beam enables more precise milling of the sample. A method and structure for deactivating the imaging detectors during laser milling enables the removal of imaging artifacts arising from saturation of the detector due to a plasma plume generated by the laser beam. In some embodiments, two types of detectors are employed: type-1 detectors provide high gain imaging during scanning of the sample with an electron or ion beam, while type-2 detectors enable lower gain imaging and endpoint detection during laser milling.

摘要翻译： 组合激光和带电粒子束系统。 脉冲激光器可以以比聚焦离子束可能的数个数量级的材料去除速率对样品进行铣削。 在一些实施例中，扫描电子显微镜能够在激光加工期间对样品进行高分辨率成像。 在一些实施例中，聚焦离子束使得能够更精确地研磨样品。 用于在激光研磨期间去激活成像检测器的方法和结构使得能够消除由激光束产生的等离子体羽流引起的由检测器的饱和引起的成像伪影。 在一些实施例中，采用两种类型的检测器：第一类检测器在用电子或离子束扫描样品期间提供高增益成像，而类型2检测器在激光研磨期间能够进行较低增益成像和端点检测。

公开(公告)号：US20110248164A1

公开(公告)日：2011-10-13

申请号：US13082372

申请日：2011-04-07

申请人： Marcus Straw ,  Mark W. Utlaut ,  N. William Parker

发明人： Marcus Straw ,  Mark W. Utlaut ,  N. William Parker

IPC分类号： H01J37/26 ,  H01J3/14

CPC分类号： H01J37/28 ,  H01J37/226 ,  H01J37/244 ,  H01J37/3056 ,  H01J2237/2815 ,  H01J2237/2855 ,  H01J2237/3174 ,  H01J2237/31749

摘要： A combined laser and charged particle beam system. A pulsed laser enables milling of a sample at material removal rates several orders of magnitude larger than possible for a focused ion beam. In some embodiments, a scanning electron microscope enables high resolution imaging of the sample during laser processing. In some embodiments, a focused ion beam enables more precise milling of the sample. A method and structure for deactivating the imaging detectors during laser milling enables the removal of imaging artifacts arising from saturation of the detector due to a plasma plume generated by the laser beam. In some embodiments, two types of detectors are employed: type-1 detectors provide high gain imaging during scanning of the sample with an electron or ion beam, while type-2 detectors enable lower gain imaging and endpoint detection during laser milling.

摘要翻译： 组合激光和带电粒子束系统。 脉冲激光器可以以比聚焦离子束可能的数个数量级的材料去除速率对样品进行铣削。 在一些实施例中，扫描电子显微镜能够在激光加工期间对样品进行高分辨率成像。 在一些实施例中，聚焦离子束使得能够更精确地研磨样品。 用于在激光研磨期间去激活成像检测器的方法和结构使得能够消除由激光束产生的等离子体羽流引起的由检测器的饱和引起的成像伪影。 在一些实施例中，采用两种类型的检测器：第一类检测器在用电子或离子束扫描样品期间提供高增益成像，而类型2检测器在激光研磨期间能够进行较低增益成像和端点检测。

公开(公告)号：US06683320B2

公开(公告)日：2004-01-27

申请号：US09859295

申请日：2001-05-16

申请人： Robert L. Gerlach ,  Mark W. Utlaut

发明人： Robert L. Gerlach ,  Mark W. Utlaut

IPC分类号： H01J3726

CPC分类号： H01J37/3056 ,  H01J37/08 ,  H01J2237/0822 ,  H01J2237/0825 ,  H01J2237/244

摘要： An electron source provides electrons that are directed through the final lens of an ion optical column to neutralize at least a portion of the accumulated charge on a sample. The invention can optionally be combined with collection of secondary electrons through the final ion lens. A deflector directs the neutralizing electrons onto the ion beam optical axis and deflects the secondary electrons away from the optical axis for detection. For imaging, a high-pass energy filter separates secondary electrons generated from the neutralizing electron beam from secondary electrons generated by the ion beam.

摘要翻译： 电子源提供被引导通过离子光学柱的最终透镜的电子，以中和样品上的累积电荷的至少一部分。 本发明可以任选地与通过最终离子透镜收集二次电子组合。 偏转器将中和电子引导到离子束光轴上，并将二次电子偏离光轴以进行检测。 对于成像，高通能量滤波器将由中和电子束产生的二次电子与离子束产生的二次电子分开。

公开(公告)号：US5871848A

公开(公告)日：1999-02-16

申请号：US944364

申请日：1997-10-06

申请人： Michael J. Bozack ,  Lynwood W. Swanson ,  Anthony E. Bell ,  William M. Clark Jr. ,  Mark W. Utlaut ,  Edmund K. Storms

发明人： Michael J. Bozack ,  Lynwood W. Swanson ,  Anthony E. Bell ,  William M. Clark Jr. ,  Mark W. Utlaut ,  Edmund K. Storms

IPC分类号： H01J27/22 ,  B32B9/00

CPC分类号： H01J27/22 ,  Y10T428/30

摘要： A binary, boron-based alloy as a source for field-emission-type, ion-beam generating devices, wherein boron predominates in the alloy, preferably with a presence of about 60 atomic percent. The other constituent in the alloy is selected from the group of elements consisting of nickel, palladium and platinum. Predominance of boron in these alloys, during operation, promotes combining of boron with trace impurities of carbon in the alloys to form B.sub.4 C and thus to promote wetting of an associated carbon support substrate.

摘要翻译： 二元硼基合金作为场致发射型离子束产生装置的源，其中硼在合金中占优势，优选约为60原子百分比。 合金中的其他成分选自镍，钯和铂组成的元素组。 在这些合金中硼的优势在操作过程中促进硼与合金中的微量微量杂质结合形成B 4 C，从而促进相关碳支撑基底的润湿。

公开(公告)号：US4775818A

公开(公告)日：1988-10-04

申请号：US851757

申请日：1986-04-14

申请人： William M. Clark, Jr. ,  Mark W. Utlaut ,  Robert G. Behrens ,  Eugene G. Szklarz ,  Edmund K. Storms ,  Robert P. Santandrea ,  Lynwood W. Swanson

发明人： William M. Clark, Jr. ,  Mark W. Utlaut ,  Robert G. Behrens ,  Eugene G. Szklarz ,  Edmund K. Storms ,  Robert P. Santandrea ,  Lynwood W. Swanson

IPC分类号： H01J27/26 ,  H01J37/08 ,  H01J27/02

CPC分类号： H01J27/26

摘要： A liquid metal ion source and alloy, wherein the species to be emitted from the ion source is contained in a congruently vaporizing alloy. In one embodiment, the liquid metal ion source acts as a source of arsenic, and in a source alloy the arsenic is combined with palladium, preferably in a liquid alloy having a range of compositions from about 24 to about 33 atomic percent arsenic. Such an alloy may be readily prepared by a combustion synthesis technique. Liquid metal ion sources thus prepared produce arsenic ions for implantation, have long lifetimes, and are highly stable in operation.

摘要翻译： 一种液体金属离子源和合金，其中从离子源发射的物质包含在一致的气化合金中。 在一个实施方案中，液体金属离子源用作砷源，并且在源合金中，砷与钯结合，优选在液体合金中，其组成范围为约24至约33原子％的砷。 这种合金可以通过燃烧合成技术容易地制备。 如此制备的液态金属离子源产生用于植入的砷离子，寿命长，操作高度稳定。

公开(公告)号：US08928210B2

公开(公告)日：2015-01-06

申请号：US13307830

申请日：2011-11-30

申请人： Sean Kellogg ,  Anthony Graupera ,  N. William Parker ,  Andrew B. Wells ,  Mark W. Utlaut ,  Walter Skoczylas ,  Gregory A. Schwind ,  Shouyin Zhang ,  Noel Smith

发明人： Sean Kellogg ,  Anthony Graupera ,  N. William Parker ,  Andrew B. Wells ,  Mark W. Utlaut ,  Walter Skoczylas ,  Gregory A. Schwind ,  Shouyin Zhang ,  Noel Smith

IPC分类号： H01J1/02

摘要： An inductively coupled plasma charged particle source for focused ion beam systems includes a plasma reaction chamber with a removably attached source electrode. A fastening mechanism connects the source electrode with the plasma reaction chamber and allows for a heat-conductive, vacuum seal to form. With a removable source electrode, improved serviceability and reuse of the plasma source tube are now possible.

公开(公告)号：US08759764B2

公开(公告)日：2014-06-24

申请号：US13538851

申请日：2012-06-29

申请人： Anthony Graupera ,  N. William Parker ,  Mark W. Utlaut

发明人： Anthony Graupera ,  N. William Parker ,  Mark W. Utlaut

IPC分类号： H01J37/256

CPC分类号： H01J37/256 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/2448

摘要： A split grid multi-channel secondary particle detector for a charged particle beam system includes a first grid segment and a second grid segment, each having independent bias voltages creating an electric field such that the on-axis secondary particles that are emitted from the target are directed to one of the grids. The bias voltages of the grids can be changed or reversed so that each grid can be used to detect the secondary particles and the multi-channel particle detector as a whole can extend its lifetime.

摘要翻译： 用于带电粒子束系统的分裂网格多通道二次粒子检测器包括第一栅格区段和第二栅极区段，每个区段具有独立的偏置电压，从而产生电场，使得从靶发射的轴上二次颗粒为 指向其中一个网格。 网格的偏置电压可以改变或反转，以便每个网格可以用于检测次级粒子，并且多通道粒子检测器作为一个整体可以延长其寿命。