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1.发明授权Polishing pad having an advantageous micro-texture and methods relating thereto 有权抛光垫具有有利的微观结构和与之有关的方法公开(公告)号：US06641471B1
公开(公告)日：2003-11-04
申请号：US09693401
申请日：2000-10-20
IPC分类号： B24D1700
CPC分类号： B24B37/26 , B24B37/04 , B24D3/00 , B24D13/14 , B24D2203/00
摘要： A statistically uniform micro-texture on a polishing pad surface improves break-in preconditioning time, and is measured by: Land Surface Roughness, Ra, from about 0.01 &mgr;m to about 25 &mgr;m; Average Peak to Valley Roughness, Rtm, from about 2 &mgr;m to about 40 &mgr;m; Core roughness depth, Rk, from about 1 to about 10; Reduced Peak Height, Rpk, from about 0.1 to about 5; Reduced Valley Height, Rvk, from about 0.1 to about 10; and Peak density expressed as a surface area ratio, RSA, ([Surf.Area/(Area−1)]), 0.001 to 2.0.
摘要翻译： 在抛光垫表面上统计均匀的微观结构提高了预处理预处理时间，并且通过以下方法测量：土地表面粗糙度Ra，约0.01μm至约25μm;平均峰谷谷粗糙度Rtm约2μm 至约40μm;芯粗糙度深度R k为约1至约10;降低峰高度Rpk为约0.1至约5;降谷高度Rvk为约0.1至约10; 和表面积比RSA，（[Surf.Area /（Area-1）]）的表观密度为0.001〜2.0。
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公开(公告)号：US06387312B1
公开(公告)日：2002-05-14
申请号：US09666418
申请日：2000-09-20
IPC分类号： B29B700
CPC分类号： B24B37/205 , B24D3/28
摘要： A polishing pad is formed by solidifying a flowable polymeric material at different rates of cooling to provide a polishing pad with a transparent region and an adjacent opaque region. Types of polymeric material suitable for making the polishing pad include a single thermoplastic material, a blend of thermoplastic materials, and a reactive thermosetting polymer.
摘要翻译： 通过以不同的冷却速度固化可流动的聚合物材料形成抛光垫，以提供具有透明区域和相邻不透明区域的抛光垫。 适用于制造抛光垫的聚合物材料的类型包括单一热塑性材料，热塑性材料的共混物和反应性热固性聚合物。
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3.发明授权Polishing pad having an advantageous micro-texture and methods relating thereto 有权抛光垫具有有利的微观结构和与之有关的方法公开(公告)号：US06679769B2
公开(公告)日：2004-01-20
申请号：US09775972
申请日：2001-02-02
IPC分类号： B24D328
摘要： This invention relates to polishing pads and a method for making the polishing pad surface readily machineable thereby facilitating permanent alteration of the polishing pad surface to create an advantageous micro-texture. The advantageous micro-texture is statistically uniform and provides a polishing pad with improved break-in preconditioning time. Polishing pads of this invention find application to the polishing/planarization of substrates such as glass, dielectric/metal composites and substrates containing copper, silicon, silicon dioxide, platinum, and tungsten typically encountered in integrated circuit fabrication.
摘要翻译： 本发明涉及抛光垫和一种使抛光垫表面易于加工的方法，从而有助于抛光垫表面的永久性改变以产生有利的微观纹理。 有利的微观结构在统计学上是统一的，并且提供了具有改进的突破预处理时间的抛光垫。 本发明的抛光垫适用于在集成电路制造中通常遇到的诸如玻璃，电介质/金属复合物和含有铜，硅，二氧化硅，铂和钨的基板的抛光/平面化。
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公开(公告)号：US06171181B2
公开(公告)日：2001-01-09
申请号：US09375962
申请日：1999-08-17
IPC分类号： B24D1100
CPC分类号： B24B37/205 , B24D3/28
摘要： A polishing pad is formed as a one-piece article having a region which is transparent and an adjacent region which is opaque. The article is formed by solidifying a flowable polymeric material which at least initially has a uniform composition. The flowable polymeric material is processed during a molding operation to provide the transparent region and the adjacent opaque region. Types of polymeric material suitable for making the polishing pad include a single thermoplastic material, a blend of thermoplastic materials, and a reactive thermosetting polymer.
摘要翻译： 抛光垫形成为具有透明区域和不透明的相邻区域的单件制品。 该制品通过固化至少最初具有均匀组成的可流动的聚合材料而形成。 在模制操作期间处理可流动的聚合物材料以提供透明区域和相邻的不透明区域。 适用于制造抛光垫的聚合物材料的类型包括单一热塑性材料，热塑性材料的共混物和反应性热固性聚合物。
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