Abrasive Particles And Production Method Thereof
    8.
    发明申请
    Abrasive Particles And Production Method Thereof 有权
    研磨颗粒及其制备方法

    公开(公告)号:US20150175864A1

    公开(公告)日:2015-06-25

    申请号:US14406143

    申请日:2013-06-10

    IPC分类号: C09K3/14

    摘要: In order to use less cerium oxide and achieve higher durability and polishing speeds, these abrasive particles used in an abrasive have: a shell layer (3) which is the outermost shell layer of the abrasive particles and is formed with cerium oxide as the main component; and a middle layer (2) which contains cerium oxide and an oxide of at least one element selected from Al, Sc, Ti, V, Cr, Mn, Fe, Co, Ni, Cu, Zn, Ga, Ge, Zr, In, Sn, Y, Gd, Tb, Dy, Ho, Er, Tm, Yb, Lu, W, Bi, Th, and the alkali earth metals, and which is formed closer to the center of the abrasive particles than the shell layer (3).

    摘要翻译: 为了使用较少的氧化铈并获得更高的耐久性和抛光速度,用于磨料的这些磨料颗粒具有:作为磨粒的最外壳层的壳层(3),并以氧化铈为主要成分 ; 以及包含氧化铈和选自Al,Sc,Ti,V,Cr,Mn,Fe,Co,Ni,Cu,Zn,Ga,Ge,Zr,In中的至少一种元素的氧化物的中间层(2) ,Sn,Y,Gd,Tb,Dy,Ho,Er,Tm,Yb,Lu,W,Bi,Th和碱土金属,并且比壳层更靠近磨料颗粒的中心 3)。

    CMP PAD DRESSERS HAVING LEVELED TIPS AND ASSOCIATED METHODS
    9.
    发明申请
    CMP PAD DRESSERS HAVING LEVELED TIPS AND ASSOCIATED METHODS 审中-公开
    具有等级提示和相关方法的CMP PAD连接器

    公开(公告)号:US20150133036A1

    公开(公告)日:2015-05-14

    申请号:US14506476

    申请日:2014-10-03

    申请人: Chien-Min Sung

    发明人: Chien-Min Sung

    IPC分类号: B24B53/017 B24D3/00 B24B53/12

    CPC分类号: B24B53/017 B24B53/12 B24D3/00

    摘要: CMP pad dressers having leveled tips and associated methods are provided. In one aspect, for example, a CMP pad dresser can include a support substrate and a plurality of superabrasive particles secured to the support substrate with each superabrasive particle extending away from the support substrate to a protrusion distance, where a highest protruding tip of each of the plurality of superabrasive particles align along a designated profile with a tip variation of from about 5 microns to about 100 microns.

    摘要翻译: 提供具有调平尖端和相关方法的CMP抛光垫修整器。 在一个方面,例如,CMP抛光修整器可以包括支撑基板和固定到支撑基板的多个超级磨料颗粒,每个超级磨料颗粒从支撑基板延伸到突出距离,其中每个的最高突出尖端 多个超研磨颗粒沿着指定的轮廓排列,其尖端变化为约5微米至约100微米。

    BORON NITRIDE COMPOSITES
    10.
    发明申请
    BORON NITRIDE COMPOSITES 有权
    硼酸盐复合材料

    公开(公告)号:US20150052823A1

    公开(公告)日:2015-02-26

    申请号:US14010423

    申请日:2013-08-26

    IPC分类号: B24D3/14

    CPC分类号: B24D3/04 B24D3/00 B24D18/0009

    摘要: According to one embodiment, a composite product includes hexagonal boron nitride (hBN), and a plurality of cubic boron nitride (cBN) particles, wherein the plurality of cBN particles are dispersed in a matrix of the hBN. According to another embodiment, a composite product includes a plurality of cBN particles, and one or more borate-containing binders.

    摘要翻译: 根据一个实施方案,复合产品包括六方氮化硼(hBN)和多个立方氮化硼(cBN)颗粒,其中多个cBN颗粒分散在hBN的基质中。 根据另一个实施方案,复合产品包括多个cBN颗粒和一种或多种含硼酸盐的粘合剂。