公开(公告)号：US08920564B2

公开(公告)日：2014-12-30

申请号：US13169373

申请日：2011-06-27

Applicant: Gwo-Chuan Tzu ,  Xiaoxiong Yuan ,  Amit Khandelwal ,  Benjamin Cheng Wang ,  Avgerinos V. Gelatos ,  Kai Wu ,  Michael P. Karazim ,  Jing Lin ,  Olkan Cuvalci

Inventor： Gwo-Chuan Tzu ,  Xiaoxiong Yuan ,  Amit Khandelwal ,  Benjamin Cheng Wang ,  Avgerinos V. Gelatos ,  Kai Wu ,  Michael P. Karazim ,  Jing Lin ,  Olkan Cuvalci

IPC: C23C16/00 ,  C23C16/44 ,  C23C16/455 ,  C23C16/52 ,  C23C16/458 ,  C23C16/46

CPC classification number: C23C16/4412 ,  C23C16/45565 ,  C23C16/45587 ,  C23C16/4585 ,  C23C16/46 ,  C23C16/52

Abstract: A substrate support may include a body; an inner ring disposed about the body; an outer ring disposed about the inner ring forming a first opening therebetween; a first seal ring disposed above the first opening; a shadow ring disposed above the inner ring, extending inward from the outer ring and forming a second opening between the shadow and outer rings; a second seal ring disposed above the second opening; a space at least partially defined by the body and the inner, outer, first, second, and shadow rings; a first gap defined between a processing surface of a substrate when present and the shadow ring; and a plurality of second gaps fluidly coupled to the space; wherein the first gap and the plurality of second gaps are configured such that, when a substrate is present, a gas provided to the space flows out of the space through the first gap.

Abstract translation: 衬底支撑件可以包括主体; 围绕身体设置的内圈; 围绕所述内圈设置的外圈，在其间形成第一开口; 设置在所述第一开口上方的第一密封环; 设置在所述内圈上方的从所述外圈向内延伸并在所述阴影和外圈之间形成第二开口的阴影环; 设置在所述第二开口上方的第二密封环; 至少部分地由身体和内，外，第一，第二和第二和阴影环限定的空间; 限定在衬底的处理表面和阴影环之间的第一间隙; 以及流体耦合到所述空间的多个第二间隙; 其中所述第一间隙和所述多个第二间隙被配置为使得当存在基板时，设置到所述空间的气体通过所述第一间隙流出所述空间。

公开(公告)号：US20120003388A1

公开(公告)日：2012-01-05

申请号：US13169373

申请日：2011-06-27

Applicant: GWO-CHUAN TZU ,  XIAOXIONG YUAN ,  AMIT KHANDELWAL ,  BENJAMIN CHENG WANG ,  AVGERINOS V. GELATOS ,  KAI WU ,  MICHAEL P. KARAZIM ,  JING LIN ,  OLKAN CUVALCI

Inventor： GWO-CHUAN TZU ,  XIAOXIONG YUAN ,  AMIT KHANDELWAL ,  BENJAMIN CHENG WANG ,  AVGERINOS V. GELATOS ,  KAI WU ,  MICHAEL P. KARAZIM ,  JING LIN ,  OLKAN CUVALCI

IPC: C23C16/455 ,  C23C16/06 ,  C23C16/46 ,  C23C16/52 ,  B05C11/00 ,  C23C16/458

CPC classification number: C23C16/4412 ,  C23C16/45565 ,  C23C16/45587 ,  C23C16/4585 ,  C23C16/46 ,  C23C16/52

Abstract: A substrate support may include a body; an inner ring disposed about the body; an outer ring disposed about the inner ring forming a first opening therebetween; a first seal ring disposed above the first opening; a shadow ring disposed above the inner ring, extending inward from the outer ring and forming a second opening between the shadow and outer rings; a second seal ring disposed above the second opening; a space at least partially defined by the body and the inner, outer, first, second, and shadow rings; a first gap defined between a processing surface of a substrate when present and the shadow ring; and a plurality of second gaps fluidly coupled to the space; wherein the first gap and the plurality of second gaps are configured such that, when a substrate is present, a gas provided to the space flows out of the space through the first gap.

Abstract translation: 衬底支撑件可以包括主体; 围绕身体设置的内圈; 围绕所述内圈设置的外圈，在其间形成第一开口; 设置在所述第一开口上方的第一密封环; 设置在所述内圈上方的从所述外圈向内延伸并在所述阴影和外圈之间形成第二开口的阴影环; 设置在所述第二开口上方的第二密封环; 至少部分地由身体和内，外，第一，第二和第二和阴影环限定的空间; 限定在衬底的处理表面和阴影环之间的第一间隙; 以及流体耦合到所述空间的多个第二间隙; 其中所述第一间隙和所述多个第二间隙被配置为使得当存在基板时，设置到所述空间的气体通过所述第一间隙流出所述空间。