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1.发明授权公开(公告)号：US07585609B2
公开(公告)日：2009-09-08
申请号：US11492276
申请日：2006-07-25
CPC分类号： G03F7/095 , G03F7/0382 , G03F7/0392 , G03F7/094
摘要： The present invention provides methods for forming images in positive- or negative-tone chemically amplified photoresists. The methods of the present invention rely on the vertical up-diffusion of photoacid generated by patternwise imaging of an underlayer disposed on a substrate and overcoated with a polymer containing acid labile functionality. In accordance with the present invention, the vertical up-diffusion can be the sole mechanism for imaging formation or the methods of the present invention can be used in conjunction with conventional imaging processes.
摘要翻译： 本发明提供了在正或负色调化学放大的光致抗蚀剂中形成图像的方法。 本发明的方法依赖于通过对设置在基底上的底层的图案成像产生的光酸的垂直向上扩散，并且用含有酸不稳定性功能的聚合物涂覆。 根据本发明，垂直向上扩散可以是用于成像成像的唯一机构，或者本发明的方法可以与传统的成像过程结合使用。
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公开(公告)号：US07288362B2
公开(公告)日：2007-10-30
申请号：US11063940
申请日：2005-02-23
申请人： Robert David Allen , Phillip Joe Brock , Dario Gil , William Dinan Hinsberg , Carl Eric Larson , Linda Karin Sundberg , Gregory Michael Wallraff
发明人： Robert David Allen , Phillip Joe Brock , Dario Gil , William Dinan Hinsberg , Carl Eric Larson , Linda Karin Sundberg , Gregory Michael Wallraff
CPC分类号： G03F7/11 , G03F7/0046 , G03F7/2041 , Y10S430/108 , Y10S430/111
摘要： A topcoat material for applying on top of a photoresist material is disclosed. The topcoat material comprises at least one solvent and a polymer which has a dissolution rate of at least 3000 Å/second in aqueous alkaline developer. The polymer contains a hexafluoroalcohol monomer unit comprising one of the following two structures: wherein n is an integer. The topcoat material may be used in lithography processes, wherein the topcoat material is applied on a photoresist layer. The topcoat material is preferably insoluble in water, and is therefore particularly useful in immersion lithography techniques using water as the imaging medium.
摘要翻译： 公开了一种用于施加在光致抗蚀剂材料上的面漆材料。 面漆材料包含至少一种溶剂和在含水碱性显影剂中具有至少3000 /秒的溶解速率的聚合物。 聚合物含有包含以下两种结构之一的六氟醇单体单元：其中n是整数。 面漆材料可以用于光刻工艺中，其中将顶涂层材料施加在光致抗蚀剂层上。 面漆材料优选不溶于水，因此特别适用于使用水作为成像介质的浸渍光刻技术。
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公开(公告)号：US07855045B2
公开(公告)日：2010-12-21
申请号：US11868320
申请日：2007-10-05
申请人： Robert David Allen , Phillip Joe Brock , Dario Gil , William Dinan Hinsberg , Carl Eric Larson , Linda Karin Sundberg , Gregory Michael Wallraff
发明人： Robert David Allen , Phillip Joe Brock , Dario Gil , William Dinan Hinsberg , Carl Eric Larson , Linda Karin Sundberg , Gregory Michael Wallraff
CPC分类号： G03F7/11 , G03F7/0046 , G03F7/2041 , Y10S430/108 , Y10S430/111
摘要： A topcoat material for applying on top of a photoresist material is disclosed. The topcoat material comprises at least one solvent and a polymer which has a dissolution rate of at least 3000 Å/second in aqueous alkaline developer. The polymer contains a hexafluoroalcohol monomer unit comprising one of the following two structures: wherein n is an integer. The topcoat material may be used in lithography processes, wherein the topcoat material is applied on a photoresist layer. The topcoat material is preferably insoluble in water, and is therefore particularly useful in immersion lithography techniques using water as the imaging medium.
摘要翻译： 公开了一种用于施加在光致抗蚀剂材料上的面漆材料。 面漆材料包含至少一种溶剂和在含水碱性显影剂中具有至少3000 /秒的溶解速率的聚合物。 聚合物含有包含以下两种结构之一的六氟醇单体单元：其中n是整数。 面漆材料可以用于光刻工艺中，其中将顶涂层材料施加在光致抗蚀剂层上。 面漆材料优选不溶于水，因此特别适用于使用水作为成像介质的浸渍光刻技术。
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4.发明授权Method for employing vertical acid transport for lithographic imaging applications 失效用于平版印刷成像应用的垂直酸运输方法公开(公告)号：US07160665B2
公开(公告)日：2007-01-09
申请号：US10334219
申请日：2002-12-30
CPC分类号： G03F7/095 , G03F7/0382 , G03F7/0392 , G03F7/094
摘要： The present invention provides methods for forming images in positive- or negative-tone chemically amplified photoresists. The methods of the present invention rely on the vertical up-diffusion of photoacid generated by patternwise imaging of an underlayer disposed on a substrate and overcoated with a polymer containing acid labile functionality. In accordance with the present invention, the vertical up-diffusion can be the sole mechanism for imaging formation or the methods of the present invention can be used in conjunction with conventional imaging processes.
摘要翻译： 本发明提供了在正或负色调化学放大的光致抗蚀剂中形成图像的方法。 本发明的方法依赖于通过对设置在基底上的底层的图案成像产生的光酸的垂直向上扩散，并且用含有酸不稳定性功能的聚合物涂覆。 根据本发明，垂直向上扩散可以是用于成像成像的唯一机构，或者本发明的方法可以与传统的成像过程结合使用。
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