Non-linear quantization and similarity matching methods for retrieving video sequence having a set of image frames
    1.
    发明申请
    Non-linear quantization and similarity matching methods for retrieving video sequence having a set of image frames 失效
    用于检索具有一组图像帧的视频序列的非线性量化和相似度匹配方法

    公开(公告)号:US20060013481A1

    公开(公告)日:2006-01-19

    申请号:US10533385

    申请日:2003-01-16

    CPC classification number: G06F17/30259 G06F17/30781 G06K9/00711 G06K9/4647

    Abstract: A method for constructing a database having digital video data information representing a plurality of video sequence is disclosed. The method includes the steps of: a) partitioning each image frame of each video sequence into L number of sub images; b) generating L number of edge histograms for each image frame; c) normalizing the edge histogram bins to thereby generate M number of normalized edge histogram bins; d) calculating M representative edge histogram bins in order to generate L number of representative edge histograms based on the normalized edge histogram bins; and e) non-linearly quantizing the representative edge histogram bins to generate M number of quantization index values for the each representative edge histogram, to be stored in the database.

    Abstract translation: 公开了一种用于构建具有表示多个视频序列的数字视频数据信息的数据库的方法。 该方法包括以下步骤:a)将每个视频序列的每个图像帧分成L个子图像; b)为每个图像帧生成L个边缘直方图; c)归一化边缘直方图箱,从而生成M个标准化边缘直方图箱; d)计算M个代表边缘直方图箱,以便基于标准化的边缘直方图桶生成L个代表性边缘直方图; 以及e)非线性量化所述代表性边缘直方图区段以产生要存储在所述数据库中的每个代表性边缘直方图的M个量化索引值。

    Method for generating a block-based image histogram
    2.
    发明申请
    Method for generating a block-based image histogram 失效
    用于生成基于块的图像直方图的方法

    公开(公告)号:US20060147112A1

    公开(公告)日:2006-07-06

    申请号:US11350626

    申请日:2006-02-08

    CPC classification number: G06K9/4647 G06K9/4642

    Abstract: A method for generating a block-based image histogram from data compressed by JPEG, MPEG-1, and MPEG-2, or uncompressed image data employing block-based linear quantization to generate histograms that include color, brightness, and edge components. The edge histogram, in particular, includes the global edge features, semi-global edge features, and local edge features. The global edge histogram is based on image blocks of the entire image space. The local edge histogram is based on a group of edge blocks. The semi-global edge histogram is based on the horizontally and the vertically grouped image blocks. A method for generating block-based image histogram with color information and brightness information of image data in accordance with an embodiment of the present invention extracts feature information of an image in terms of the block and updates global histogram bins on the basis of the feature information. The method for generating block-based image histogram with color information and brightness information of image data minimizes quantization error by employing linear weight and updates values of histogram bins. The error that occurs at a boundary between bins of the histograms and the linear weight depends on the distance between the histogram bins.

    Abstract translation: 一种用于由通过JPEG,MPEG-1和MPEG-2压缩的数据产生基于块的图像直方图的方法,或者使用基于块的线性量化的未压缩图像数据来生成包括颜色,亮度和边缘分量的直方图。 边缘直方图尤其包括全局边缘特征,半全局边缘特征和局部边缘特征。 全局边缘直方图基于整个图像空间的图像块。 局部边缘直方图基于一组边缘块。 半全局边缘直方图基于水平和垂直分组的图像块。 根据本发明的实施例的用于生成具有颜色信息和图像数据的亮度信息的基于块的图像直方图的方法基于块提取图像的特征信息,并且基于特征信息来更新全局直方图箱 。 利用彩色信息和图像数据的亮度信息生成基于块的图像直方图的方法通过采用线性权重和直方图区块的更新值来最小化量化误差。 在直方图的边界和线性权重之间的边界处发生的误差取决于柱状图区间之间的距离。

    Method for manufacturing ferroelectric thin-film capacitor
    3.
    发明授权
    Method for manufacturing ferroelectric thin-film capacitor 失效
    铁电薄膜电容器的制造方法

    公开(公告)号:US5658820A

    公开(公告)日:1997-08-19

    申请号:US616491

    申请日:1996-03-19

    Applicant: Chee-won Chung

    Inventor: Chee-won Chung

    CPC classification number: H01L28/55

    Abstract: A method for manufacturing ferroelectric thin-film which is used as a memory cell for an FRAM includes the steps of: (a) forming a lower electrode, a ferroelectric thin-film and an upper Pt electrode on a substrate in sequence; (b) forming a photoresist on the upper Pt electrode; (c) patterning the photoresist in a predetermined pattern; and (d) etching the substrate, the step (d) including the steps of installing a holder to which a predetermined DC self bias voltage is generated in a chamber of a plasma etching apparatus around which an RF coil is wound, of injecting Ar, chloric and fluoric gases of a predetermined composition ratio into the chamber, of applying a RF power of a predetermined frequency and power to the RF coil to generate an inductively coupled plasma in the chamber, and of etching down the substrate from the upper Pt electrode to the ferroelectric thin-film to a predetermined depth by the plasma of the Ar, chloric and fluoric gases using the photoresist as a mask. As a result, the etching rate of a ferroelectric thin-film and electrode is sharply increased, and particularly, the etching selectivity of the ferroelectric thin-film and electrode with respect to the photoresist is improved, so that the photoresist can be used as a mask.

    Abstract translation: 用作FRAM的存储单元的铁电薄膜的制造方法包括以下步骤:(a)依次在基板上形成下电极,铁电薄膜和上Pt电极; (b)在上Pt电极上形成光致抗蚀剂; (c)以预定图案形成所述光致抗蚀剂; (d)蚀刻基板,步骤(d)包括以下步骤:在其上缠绕有RF线圈的等离子体蚀刻装置的腔室中安装产生预定的DC自偏压的保持器,注入Ar, 将具有预定组成比的氯和氟气体输送到室中,将预定频率和功率的RF功率施加到RF线圈,以在腔室中产生电感耦合等离子体,并将衬底从上Pt电极蚀刻到 通过使用光致抗蚀剂作为掩模的Ar,氯和氟气体的等离子体将铁电薄膜设置到预定深度。 结果,铁电薄膜和电极的蚀刻速率急剧增加,特别是提高了铁电薄膜和电极相对于光致抗蚀剂的蚀刻选择性,使得光致抗蚀剂可以用作 面具。

    Method for dry-etching a platinum thin film
    4.
    发明授权
    Method for dry-etching a platinum thin film 失效
    干法蚀刻铂薄膜的方法

    公开(公告)号:US5976394A

    公开(公告)日:1999-11-02

    申请号:US842828

    申请日:1997-04-17

    Applicant: Chee-won Chung

    Inventor: Chee-won Chung

    CPC classification number: H01L21/32136

    Abstract: A method for dry etching a metallic thin film (i.e., platinum thin film) is disclosed whereby a clean metallic thin film can be formed by restraining redeposition of the metal. The etching gas includes a mixed gas including Cl.sub.2 and SiCl.sub.4 whereby a plasma of the mixed gas generates reactive species to react with the metallic thin film and form volatile residua that can be desorbed from the etched surface.

    Abstract translation: 公开了一种用于干蚀刻金属薄膜(即铂薄膜)的方法,由此可以通过抑制金属的再沉积来形成清洁的金属薄膜。 蚀刻气体包括包含Cl 2和SiCl 4的混合气体,由此混合气体的等离子体产生反应性物质以与金属薄膜反应并形成可从蚀刻表面解吸的挥发性残余物。

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