公开(公告)号：US20130113810A1

公开(公告)日：2013-05-09

申请号：US13289935

申请日：2011-11-04

申请人： Chok Wah Ho ,  Fan Zhong

发明人： Chok Wah Ho ,  Fan Zhong

IPC分类号： G06F13/00 ,  H01L31/18 ,  H05K3/10 ,  H01L31/0232

CPC分类号： B81B3/0051 ,  B81B2201/042 ,  G02B26/001 ,  Y10T29/49155

摘要： Systems, methods and apparatus are provided for electromechanical systems devices having a sidewall spacer along at least one sidewall of a conductive line. An electromechanical systems device can include a sidewall spacer along at least one sidewall of a conductive line under a movable layer. The sidewall spacer can be sloped such that the sidewall spacer has a decreasing width away from a substrate under the movable layer. The conductive line can be configured to route an electrical signal to the electromechanical systems device. In some implementations, a black mask structure of an electromechanical systems device can include the conductive line.

摘要翻译： 为具有沿导电线的至少一个侧壁的侧壁间隔物的机电系统装置提供了系统，方法和装置。 机电系统装置可以包括沿可移动层下方的导电线的至少一个侧壁的侧壁间隔物。 侧壁间隔物可以是倾斜的，使得侧壁间隔物在可移动层下面的基底具有减小的宽度。 导线可被配置成将电信号路由到机电系统装置。 在一些实施方案中，机电系统装置的黑色掩模结构可以包括导电线。