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公开(公告)号：US5726568A
公开(公告)日：1998-03-10
申请号：US482395
申请日：1995-06-07
申请人： William Dale Carbaugh, Jr. , Mark Joseph LaPlante , David Clifford Long , Karl Friedrich Stroms , Christopher David Setzer
发明人： William Dale Carbaugh, Jr. , Mark Joseph LaPlante , David Clifford Long , Karl Friedrich Stroms , Christopher David Setzer
CPC分类号： B26D5/086 , B26D5/08 , B26F1/02 , B26F2210/08 , H05K1/0306 , H05K3/0044 , Y10T83/0481 , Y10T83/8765
摘要： Dimpling of a workpiece by rebounding of a magnetic repulsion punch mechanism, when operated at high punching rates, is avoided by application of a damping pulse at a point at or subsequent to a mid-point of a return stroke of the punch from the workpiece and preferably within the last 10% of the return stroke. This damping pulse is preferably a fraction of the pulse width and of approximately the same amplitude as a driving pulse applying kinetic energy to the punch for causing punching of the workpiece. At high punching rates the kinetic energy of the return portion of a punching stroke is substantially determined by elastic rebounding of the punch from a guide bushing. The removal of kinetic energy during the return portion of the stroke allows the return of the punch to a position close to a rest position during a very short interval with small overshoot under control of mechanical damping. Since dynamic damping may be substituted for much of the mechanical damping in the punching arrangement, high quality punching may be accomplished at much increased punching rates. A preferred form of monitoring punch position employs RF reflected inductance and may be used to form a time expanded image of punch movement.
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公开(公告)号：US06931712B2
公开(公告)日：2005-08-23
申请号：US10757199
申请日：2004-01-14
申请人： David Clifford Long , Harsaran S. Bhatia , Harvey Charles Hamel , Edward R. Pillai , Christopher David Setzer , Benjamin Paul Tongue
发明人： David Clifford Long , Harsaran S. Bhatia , Harvey Charles Hamel , Edward R. Pillai , Christopher David Setzer , Benjamin Paul Tongue
CPC分类号： H01F41/041 , H01F17/0013 , H01F17/0033 , H05K1/165 , H05K3/4611 , Y10T29/4902 , Y10T29/49117 , Y10T29/49126 , Y10T29/4913 , Y10T29/49155
摘要： A dielectric substrate having an embedded inductor wherein each turn of the inductor traverses several layers such that the top and bottom of each turn of the inductor are parallel to each other but are in different layers and the sides of each turn of the inductor traverse at least one layer to connect the top and bottom of the inductor.
摘要翻译： 具有嵌入式电感器的电介质基片，其中电感器的每一匝穿过几层，使得电感器的每匝的顶部和底部彼此平行，但是处于不同的层中，并且电感器的每匝的侧面至少穿过至少 一层连接电感器的顶部和底部。
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公开(公告)号：US5905352A
公开(公告)日：1999-05-18
申请号：US948074
申请日：1997-10-09
申请人： William Dale Carbaugh, Jr. , Mark Joseph LaPlante , David Clifford Long , Karl Friedrich Stroms , Christopher David Setzer
发明人： William Dale Carbaugh, Jr. , Mark Joseph LaPlante , David Clifford Long , Karl Friedrich Stroms , Christopher David Setzer
CPC分类号： B26D5/086 , B26D5/08 , B26F1/02 , B26F2210/08 , H05K1/0306 , H05K3/0044 , Y10T83/0481 , Y10T83/8765
摘要： Dimpling of a workpiece by rebounding of a magnetic repulsion punch mechanism, when operated at high punching rates, is avoided by application of a damping pulse at a point at or subsequent to a mid-point of a return stroke of the punch from the workpiece and preferably within the last 10% of the return stroke. This damping pulse is preferably a fraction of the pulse width and of approximately the same amplitude as a driving pulse applying kinetic energy to the punch for causing punching of the workpiece. At high punching rates the kinetic energy of the return portion of a punching stroke is substantially determined by elastic rebounding of the punch from a guide bushing. The removal of kinetic energy during the return portion of the stroke allows the return of the punch to a position close to a rest position during a very short interval with small overshoot under control of mechanical damping. Since dynamic damping may be substituted for much of the mechanical damping in the punching arrangement, high quality punching may be accomplished at much increased punching rates. A preferred form of monitoring punch position employs RF reflected inductance and may be used to form a time expanded image of punch movement.
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公开(公告)号：US06975199B2
公开(公告)日：2005-12-13
申请号：US10016090
申请日：2001-12-13
申请人： David Clifford Long , Harsaran S. Bhatia , Harvey Charles Hamel , Edward R. Pillai , Christopher David Setzer , Benjamin Paul Tongue
发明人： David Clifford Long , Harsaran S. Bhatia , Harvey Charles Hamel , Edward R. Pillai , Christopher David Setzer , Benjamin Paul Tongue
CPC分类号： H01F17/0033 , H01F5/003 , H01F17/0013 , H01L27/08
摘要： A dielectric substrate having an embedded inductor wherein each turn of the inductor traverses several layers such that the top and bottom of each turn of the inductor are parallel to each other but are in different layers and the sides of each turn of the inductor traverse at least one layer to connect the top and bottom of the inductor.
摘要翻译： 一种具有嵌入式电感器的电介质基片，其中电感器的每一匝穿过若干层，使得电感器的每匝的顶部和底部彼此平行，但是处于不同的层中，并且电感器的每一匝的侧面至少穿过至少 一层连接电感器的顶部和底部。
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