Elements having erosion resistance
    2.
    发明授权
    Elements having erosion resistance 失效
    元素具有抗侵蚀性

    公开(公告)号:US06789498B2

    公开(公告)日:2004-09-14

    申请号:US10085670

    申请日:2002-02-27

    IPC分类号: C23C600

    摘要: A component of a plasma reactor chamber for processing a semiconductor workpiece, the component being a monolithic ceramic piece formed from a mixture of yttrium aluminum perovskite (YAP) and yttrium aluminum garnet (YAG) formed from a mixture of yttria and alumina powders, the ratio the powders in said mixture being within a range between one ratio at which at least nearly pure yttrium aluminum perovskite is formed and another ratio at which at least nearly pure yttrium aluminum garnet is formed.

    摘要翻译: 用于处理半导体工件的等离子体反应器室的组件,该组件是由由氧化钇和氧化铝粉末的混合物形成的由钇铝钙钛矿(YAP)和钇铝石榴石(YAG)的混合物形成的整体陶瓷件, 所述混合物中的粉末在形成至少几乎纯的钇铝钙钛矿的一个比例和形成至少几乎纯的钇铝石榴石的另一比例之间的范围内。

    Chemical mechanical polishing endpoinat detection
    4.
    发明授权
    Chemical mechanical polishing endpoinat detection 有权
    化学机械抛光endpoinat检测

    公开(公告)号:US06709314B2

    公开(公告)日:2004-03-23

    申请号:US10005658

    申请日:2001-11-07

    IPC分类号: B24B4900

    CPC分类号: B24B37/013 B24B49/10

    摘要: Endpoint of a chemical mechanical polishing process is detected by monitoring acoustical emissions produced by contact between a polishing pad and a wafer. The acoustic information is resolved into a frequency spectrum utilizing techniques such as fast Fourier transformation. Characteristic changes in frequency spectra of the acoustic emissions reveal transition in polishing between different material layers. CMP endpoint indicated by a change in the acoustic frequency spectrum is validated by correlation with other sensed properties, including but not limited to time-based changes in amplitude of acoustic emissions, frictional coefficient, capacitance, and/or resistance. CMP endpoint revealed by a change in acoustic frequency spectrum can also be validated by comparison with characteristic frequency spectra obtained at endpoints or polishing transitions of prior operational runs.

    摘要翻译: 通过监测由抛光垫和晶片之间的接触产生的声发射来检测化学机械抛光工艺的端点。 利用诸如快速傅里叶变换的技术将声信息解析成频谱。 声发射频谱的特征变化显示不同材料层之间的抛光过渡。 由声频谱变化指示的CMP端点通过与其他感测特性的相关性来验证,包括但不限于声发射幅度,摩擦系数,电容和/或电阻的基于时间的变化。 通过声频频谱变化揭示的CMP终点也可以通过与在先前操作运行的端点或抛光转换处获得的特征频谱进行比较来验证。

    SYSTEM AND METHODS FOR PARTICULATE FILTER
    5.
    发明申请
    SYSTEM AND METHODS FOR PARTICULATE FILTER 审中-公开
    颗粒过滤系统和方法

    公开(公告)号:US20100154370A1

    公开(公告)日:2010-06-24

    申请号:US12341112

    申请日:2008-12-22

    IPC分类号: B01D39/14

    摘要: Various examples of system and methods for particulate filters include a particulate filter comprising a housing having a flow axis between an input header and an output header, and a plurality of filter segments arranged in a stacked array, the stacked array disposed within the housing and lying in a plane normal to the flow axis, the stacked array including a first filter segment having a first average flow characteristic per unit area and a second filter segment having a second average flow characteristic per unit area, the first average flow characteristic per unit area different from the second average flow characteristic per unit area, each particular filter segment of the plurality of filter segments having a segment flow axis substantially in parallel alignment with the flow axis.

    摘要翻译: 用于微粒过滤器的系统和方法的各种实例包括:颗粒过滤器,其包括壳体,其具有在输入头部和输出头部之间的流动轴线,以及多个排列成堆叠阵列的过滤器部件,所述堆叠阵列设置在壳体内并且位于 在垂直于流动轴的平面中,堆叠阵列包括具有每单位面积的第一平均流量特性的第一滤波器段和具有每单位面积的第二平均流量特性的第二滤波器段,每单位面积的第一平均流量特性不同 从每单位面积的第二平均流动特性来看,多个过滤器段的每个特定过滤段具有基本上与流动轴线平行对准的段流轴线。