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公开(公告)号:US20140065368A1
公开(公告)日:2014-03-06
申请号:US13596792
申请日:2012-08-28
IPC分类号: C23C14/35 , B32B33/00 , C23C16/44 , C23C14/28 , C23C4/12 , B05D3/02 , C23C14/30 , C23C4/04 , C23C4/06 , C23C4/10 , C23C14/14 , C23C16/06 , C23C16/40 , C23C16/34 , B05D5/02 , C30B19/12 , C30B25/06 , C30B25/02 , C30B23/06 , C30B19/00 , B32B9/04
CPC分类号: C23C30/00 , B32B33/00 , B32B2307/73 , C23C14/08 , Y10T428/24355 , Y10T428/24364 , Y10T428/25
摘要: This disclosure relates to methods that include depositing a first component and a second component to form a film including a plurality of nanostructures, and coating the nanostructures with a hydrophobic layer to render the film superhydrophobic. The first component and the second component can be immiscible and phase-separated during the depositing step. The first component and the second component can be independently selected from the group consisting of a metal oxide, a metal nitride, a metal oxynitride, a metal, and combinations thereof. The films can have a thickness greater than or equal to 5 nm; an average surface roughness (Ra) of from 90 to 120 nm, as measured on a 5 μm×5 μm area; a surface area of at least 20 m2/g; a contact angle with a drop of water of at least 120 degrees; and can maintain the contact angle when exposed to harsh conditions.
摘要翻译: 本公开涉及包括沉积第一组分和第二组分以形成包含多个纳米结构的膜的方法,以及用疏水层涂覆纳米结构以使膜超疏水。 在沉积步骤期间,第一组分和第二组分可以是不混溶的和相分离的。 第一组分和第二组分可以独立地选自金属氧化物,金属氮化物,金属氮氧化物,金属及其组合。 膜可以具有大于或等于5nm的厚度; 在5mum×5mum面积上测量的平均表面粗糙度(Ra)为90至120nm; 表面积至少为20m2 / g; 与一滴水的接触角至少为120度; 并且在暴露于恶劣条件下可以保持接触角。
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公开(公告)号:US09771656B2
公开(公告)日:2017-09-26
申请号:US13596792
申请日:2012-08-28
CPC分类号: C23C30/00 , B32B33/00 , B32B2307/73 , C23C14/08 , Y10T428/24355 , Y10T428/24364 , Y10T428/25
摘要: This disclosure relates to methods that include depositing a first component and a second component to form a film including a plurality of nanostructures, and coating the nanostructures with a hydrophobic layer to render the film superhydrophobic. The first component and the second component can be immiscible and phase-separated during the depositing step. The first component and the second component can be independently selected from the group consisting of a metal oxide, a metal nitride, a metal oxynitride, a metal, and combinations thereof. The films can have a thickness greater than or equal to 5 nm; an average surface roughness (Ra) of from 90 to 120 nm, as measured on a 5 μm×5 μm area; a surface area of at least 20 m2/g; a contact angle with a drop of water of at least 120 degrees; and can maintain the contact angle when exposed to harsh conditions.
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