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    Wafer processing apparatus having a tunable electrical resistivity
    1.
    发明授权
    Wafer processing apparatus having a tunable electrical resistivity 有权
    具有可调电阻率的晶片处理装置

    公开(公告)号：US07929269B2

    公开(公告)日：2011-04-19

    申请号：US12204079

    申请日：2008-09-04

    申请人： David Michael Rusinko, Jr. ,  Marc Schaepkens ,  Wanxue Zeng

    发明人： David Michael Rusinko, Jr. ,  Marc Schaepkens ,  Wanxue Zeng

    IPC分类号： H01T23/00

    CPC分类号： H01L21/683 ,  H01L21/6831 ,  H01L21/6833

    摘要： An article with an etch resistant coating is disclosed. The article is a heating element, wafer carrier, or electrostatic chuck. The article has a base substrate made of a ceramic or other material, and further has one or more electrodes for resistance heating or electromagnetic chucking or both. The eth resistant coating has a plurality of regions made from materials having different electrical volume resistivities, such that the overall coating has a bulk resistivity that can be tailored by varying the relative size of each region.

    摘要翻译： 公开了具有耐蚀刻涂层的物品。 该物品是加热元件，晶片载体或静电卡盘。 该制品具有由陶瓷或其他材料制成的基底，并且还具有用于电阻加热或电磁夹持的两个或更多个电极。 耐腐蚀涂层具有由具有不同电体积电阻率的材料制成的多个区域，使得整个涂层具有可以通过改变每个区域的相对尺寸来调整的体电阻率。

    Container for evaporation of metal and method to manufacture thereof
    2.
    发明授权
    Container for evaporation of metal and method to manufacture thereof 失效
    金属蒸发用容器及其制造方法

    公开(公告)号：US07494616B2

    公开(公告)日：2009-02-24

    申请号：US11266796

    申请日：2005-11-04

    申请人： David Michael Rusinko, Jr. ,  Ajit Sane ,  Gary Zayas

    发明人： David Michael Rusinko, Jr. ,  Ajit Sane ,  Gary Zayas

    IPC分类号： B01D7/00

    CPC分类号： C23C14/243 ,  F27D5/0068

    摘要： A refractory container for evaporating metals, having improved useful life and corrosion resistance properties, the evaporation surface of the container having a plurality of grooves formed at the bottom surface. The grooves have either a depth of at least 1.2 mm, a width of at least 1.75 mm, or an interval spacing of at least 2.2 mm between adjacent grooves (or centers of adjacent grooves), and combinations thereof.

    摘要翻译： 一种用于蒸发金属的耐火容器，具有改善的使用寿命和耐腐蚀性能，容器的蒸发表面具有形成在底表面的多个凹槽。 凹槽在相邻凹槽（或相邻凹槽的中心）之间具有至少1.2mm的深度，至少1.75mm的宽度或至少2.2mm的间隔间隔，以及它们的组合。

    WAFER PROCESSING APPARATUS HAVING A TUNABLE ELECTRICAL RESISTIVITY
    3.
    发明申请
    WAFER PROCESSING APPARATUS HAVING A TUNABLE ELECTRICAL RESISTIVITY 有权
    具有可调节电阻率的加工装置

    公开(公告)号：US20100053841A1

    公开(公告)日：2010-03-04

    申请号：US12204079

    申请日：2008-09-04

    申请人： David Michael Rusinko, JR. ,  Marc Schaepkens ,  Wanxue Zeng

    发明人： David Michael Rusinko, JR. ,  Marc Schaepkens ,  Wanxue Zeng

    IPC分类号： H01L21/683

    CPC分类号： H01L21/683 ,  H01L21/6831 ,  H01L21/6833

    摘要： An article with an etch resistant coating is disclosed. The article is a heating element, wafer carrier, or electrostatic chuck. The article has a base substrate made of a ceramic or other material, and further has one or more electrodes for resistance heating or electromagnetic chucking or both. The eth resistant coating has a plurality of regions made from materials having different electrical volume resistivities, such that the overall coating has a bulk resistivity that can be tailored by varying the relative size of each region.

    摘要翻译： 公开了具有耐蚀刻涂层的物品。 该物品是加热元件，晶片载体或静电卡盘。 该制品具有由陶瓷或其他材料制成的基底，并且还具有用于电阻加热或电磁夹持的两个或更多个电极。 耐腐蚀涂层具有由具有不同电体积电阻率的材料制成的多个区域，使得整个涂层具有可以通过改变每个区域的相对尺寸来调整的体电阻率。