Method for fabricating multi-layer optical films
    2.
    再颁专利
    Method for fabricating multi-layer optical films 失效
    制造多层光学薄膜的方法

    公开(公告)号:USRE32849E

    公开(公告)日:1989-01-31

    申请号:US751218

    申请日:1985-07-02

    IPC分类号: C23C14/46 G02B5/28

    CPC分类号: C23C14/46 G02B5/285

    摘要: A method for fabricating multiple layer interference optical films by ion beam sputtering, said films being used for mirrors in a ring laser apparatus. An ion beam strikes a target material obliquely, dislodging molecules of the target so that they can be deposited on a surface serving as a base for a multiple layer interference coating. The thickness of the coating is monitored so that the proper thickness of a given layer can be optimized to obtain the type of reflectance desired for a given light wave length. The surface to be coated is rotated during the deposition of the layer of target material. A stack of layers of alternating indices of refraction comprises the optical interference film. The coating process occurs inside of a vacuum chamber where the partial pressures of the gases are carefully controlled to insure the proper ion beam intensity and optimum stoichiometry of the deposited optical films. Prior to beginning the deposition of optical films, the ceramic substrate comprising the mirror base is bombarded by the ion beam at an oblique angle to remove surface anomalies and clean it.

    Using a polaron interaction zone as an interface to integrate a plasmon layer and a semiconductor detector
    3.
    发明授权
    Using a polaron interaction zone as an interface to integrate a plasmon layer and a semiconductor detector 有权
    使用极化子相互作用区域作为整合等离子体层和半导体检测器的界面

    公开(公告)号:US07495230B2

    公开(公告)日:2009-02-24

    申请号:US11205781

    申请日:2005-08-16

    IPC分类号: G01K1/08

    摘要: An integrated plasmon detector includes a top layer of material adapted to generate a plasmon when excited by a beam of light incident onto a surface of the top layer, an interface layer joined to the top layer opposite from the surface of the top layer and adapted to slow polarons emitted by the plasmon to thermal electrons, and a collector layer joined to the interface layer opposite from the top layer and adapted to collect the thermal electrons from the interface layer.

    摘要翻译: 集成等离子体激元检测器包括适于在入射到顶层的表面上的光束激发时产生等离子体激元的顶层材料,与顶层表面相对的顶层连接的界面层, 由等离子体激发器发射的快速极化子到热电子,以及与顶层相对的界面层连接并适于从界面层收集热电子的集电极层。

    Method for fabricating multi-layer optical films
    4.
    发明授权
    Method for fabricating multi-layer optical films 失效
    制备多层光学膜的方法

    公开(公告)号:US4142958A

    公开(公告)日:1979-03-06

    申请号:US896133

    申请日:1978-04-13

    CPC分类号: C23C14/46 H01J37/3053

    摘要: A method for fabricating multiple layer interference optical films by ion beam sputtering, said films being used for mirrors in a ring laser apparatus. An ion beam strikes a target material obliquely, dislodging molecules of the target so that they can be deposited on a surface serving as a base for a multiple layer interference coating. The thickness of the coating is monitored so that the proper thickness of a given layer can be optimized to obtain the type of reflectance desired for a given light wave length. The surface to be coated is rotated during the deposition of the layer of target material. A stack of layers of alternating indices of refraction comprises the optical interference film. The coating process occurs inside of a vacuum chamber where the partial pressures of the gases are carefully controlled to insure the proper ion beam intensity and optimum stoichiometry of the deposited optical films. Prior to beginning the deposition of optical films, the ceramic substrate comprising the mirror base is bombarded by the ion beam at an oblique angle to remove surface anomalies and clean it.

    Method and apparatus for ion beam sputter deposition of thin films
    5.
    发明授权
    Method and apparatus for ion beam sputter deposition of thin films 失效
    离子束溅射沉积薄膜的方法和装置

    公开(公告)号:US06190511B1

    公开(公告)日:2001-02-20

    申请号:US09020195

    申请日:1998-02-06

    申请人: David T. Wei

    发明人: David T. Wei

    IPC分类号: C23C1434

    摘要: A technique for ion beam sputter deposition of optical coatings. The technique includes the following features (i) an assist chemical emitted towards the sputter target to oppose the tendency of film growth on the target; (ii) a discriminate baffle to capture ions or assist chemicals reflected from the target; (iii) a screen chemical to protect the coating area from the assist chemical; (iv) compartmentalized of the coating chamber to reduce crossing effects between the different chemicals (D.W.) (C.L.); (v) a compartmentalized assist ion beam to modify the coating and to reduce microstructure, defects and impurities in the coating (D.W.) (C.L.); and (vi) to combine the above features or multiply use one of the above features to further advantage or to increase throughput.

    摘要翻译: 一种用于离子束溅射沉积光学涂层的技术。 该技术包括以下特征(i)朝向溅射靶发射的辅助化学物质以抵抗靶上的膜生长趋势; (ii)捕捉离子或辅助从目标反射的化学物质的鉴别挡板; (iii)屏蔽化学品以保护涂层区域免于辅助化学品; (iv)分隔涂层室以减少不同化学物质(C.W.)(C.L.)之间的交叉效应; (v)分隔的辅助离子束来改变涂层并减少涂层(D.W.)(C.L.)中的微观结构,缺陷和杂质; 和(vi)组合上述特征或乘以上述特征之一进一步利用或增加产量。