公开(公告)号：US20130206584A1

公开(公告)日：2013-08-15

申请号：US13702387

申请日：2011-05-23

Applicant: Karl-Heinz Dulle ,  Frank Funck ,  Dirk Hoormann ,  Stefan Oelmann ,  Peter Woltering ,  Carsten Schmitt ,  Philipp Hofmann ,  Ulf-Steffen Baeumer

Inventor： Karl-Heinz Dulle ,  Frank Funck ,  Dirk Hoormann ,  Stefan Oelmann ,  Peter Woltering ,  Carsten Schmitt ,  Philipp Hofmann ,  Ulf-Steffen Baeumer

IPC: C23C14/22

CPC classification number: C23C14/22 ,  B01J21/063 ,  B01J23/462 ,  B01J23/468 ,  B01J37/14 ,  B01J37/341 ,  B01J37/347 ,  C23C14/0021 ,  C23C14/024 ,  C23C14/08 ,  C23C14/083 ,  C23C14/16 ,  C23C14/325 ,  C25B11/0478

Abstract: A method for coating a substrate on one or more sides having catalytically active material producible by material deposition under vacuum in a vacuum chamber, using the following steps: loading a substrate in the chamber evacuating the chamber, cleaning the substrate by introducing a gaseous reducing agent, removing the gaseous reducing agent, applying an intermediate layer by means of vacuum arc evaporation, wherein a substrate comprising the same or similar material is introduced into the vacuum chamber, controlling the chamber temperature, coating by vacuum arc evaporation, a metal taken from the group ruthenium, iridium, titanium and mixtures thereof while oxygen is supplied, in a last step the coated substrate is removed from the chamber, wherein at least 99% of the substrate coating is free of constituents originally contained in the substrate itself, and at least 99% of the coating applied on the intermediate layer is kept free of non-oxidized metals.

Abstract translation: 一种用于在一个或多个侧面上涂覆具有催化活性物质的基材的方法，其通过在真空室中在真空下沉积，使用以下步骤：将所述基板装载在所述室中，抽空所述室，通过引入气态还原剂 ，去除气态还原剂，通过真空电弧蒸发施加中间层，其中将包含相同或类似材料的基材引入真空室中，通过真空电弧蒸发来控制室温度，涂层，从 组合钌，铱，钛和其混合物，同时供应氧气，在最后步骤中，将涂覆的基材从室中移出，其中至少99％的基材涂层不含原材料本身包含的组分，并且至少 施加在中间层上的涂层的99％保持没有未氧化的金属。

公开(公告)号：US10030300B2

公开(公告)日：2018-07-24

申请号：US13702387

申请日：2011-05-23

Applicant: Karl-Heinz Dulle ,  Frank Funck ,  Dirk Hoormann ,  Stefan Oelmann ,  Peter Woltering ,  Carsten Schmitt ,  Philipp Hofmann ,  Ulf-Steffen Baeumer

Inventor： Karl-Heinz Dulle ,  Frank Funck ,  Dirk Hoormann ,  Stefan Oelmann ,  Peter Woltering ,  Carsten Schmitt ,  Philipp Hofmann ,  Ulf-Steffen Baeumer

IPC: C23C14/00 ,  C23C14/32 ,  C23C14/22 ,  B01J21/06 ,  B01J23/46 ,  B01J37/14 ,  B01J37/34 ,  C23C14/02 ,  C23C14/08 ,  C23C14/16 ,  C25B11/04

CPC classification number: C23C14/22 ,  B01J21/063 ,  B01J23/462 ,  B01J23/468 ,  B01J37/14 ,  B01J37/341 ,  B01J37/347 ,  C23C14/0021 ,  C23C14/024 ,  C23C14/08 ,  C23C14/083 ,  C23C14/16 ,  C23C14/325 ,  C25B11/0478

Abstract: A method for coating a substrate on one or more sides having catalytically active material producible by material deposition under vacuum in a vacuum chamber, using the following steps: loading a substrate in the chamber evacuating the chamber, cleaning the substrate by introducing a gaseous reducing agent, removing the gaseous reducing agent, applying an intermediate layer by means of vacuum arc evaporation, wherein a substrate comprising the same or similar material is introduced into the vacuum chamber, controlling the chamber temperature, coating by vacuum arc evaporation, a metal taken from the group ruthenium, iridium, titanium and mixtures thereof while oxygen is supplied, in a last step the coated substrate is removed from the chamber, wherein at least 99% of the substrate coating is free of constituents originally contained in the substrate itself, and at least 99% of the coating applied on the intermediate layer is kept free of non-oxidized metals.

公开(公告)号：US20100092692A1

公开(公告)日：2010-04-15

申请号：US12312999

申请日：2007-11-15

Applicant: Karl-Heinz Dulle ,  Ulf-Steffen Baeumer ,  Randolf Kiefer ,  Peter Woltering ,  Dirk Hoormann ,  Stefan Oelmann ,  Joachim-H. Hoedtke ,  Oliver Kayser

Inventor： Karl-Heinz Dulle ,  Ulf-Steffen Baeumer ,  Randolf Kiefer ,  Peter Woltering ,  Dirk Hoormann ,  Stefan Oelmann ,  Joachim-H. Hoedtke ,  Oliver Kayser

IPC: C23C16/50 ,  C23C16/00 ,  C23C14/34

CPC classification number: C23C14/024 ,  C23C14/566

Abstract: The invention relates to a method for coating one or more sides of substrates with catalytically active material, comprising material deposition under vacuum in a vacuum chamber, wherein the following steps are performed: (a) loading the vacuum chamber with at least one substrate, (b) closing and evacuating the vacuum chamber, (c) cleaning the substrate by introducing a gaseous reducing agent into the vacuum chamber, (d) increasing the size of the substrate surface by depositing a vaporous component on the substrate surface, (e) coating by a coating process taken from the group of plasma coating processes, physical gas deposition, sputtering processes or the like, wherein one or more metals and/or alkaline and/or earth alkaline metals or their oxides are applied to the surface of the substrate. This method may be used, for example, for coating electrodes which are used in the chlor-alkali electrolysis.

Abstract translation: 本发明涉及一种用催化活性材料涂覆一层或多层衬底的方法，包括在真空室中真空沉积材料，其中执行以下步骤：（a）用至少一个衬底装载真空室， （b）关闭并排空真空室，（c）通过将气态还原剂引入真空室来清洁基板;（d）通过在基板表面上沉积气态成分来增加基板表面的尺寸，（e）涂层 通过从等离子体涂覆工艺，物理气体沉积，溅射工艺等组中获得的涂覆工艺，其中将一种或多种金属和/或碱土金属和/或碱土金属或其氧化物施加到基材的表面。 该方法可以用于例如用于氯碱电解中的涂覆电极。