摘要:
A complementary metal-oxide semiconductor (CMOS) image sensor includes a photodiode, a gate pattern of a transfer transistor contacting one side of the photodiode, a gate pattern of a drive transistor disposed to have a predetermined spacing distance from the gate pattern of the transfer transistor, and a floating diffusion node disposed between the gate pattern of the transfer transistor and the gate pattern of the drive transistor.
摘要:
Disclosed are a pixel, a pixel array, an image sensor including the pixel array and a method for operating the image sensor. The pixel includes a photo-electro conversion unit; a first capacitor for storing a first quantity of charges of the photo-electro conversion unit; a second capacitor for storing a second quantity of charges of the photo-electro conversion unit; and an output unit to output the first and second quantities of the charges.
摘要:
Disclosed are a pixel, a pixel array, an image sensor including the pixel array and a method for operating the image sensor. The pixel includes a photo-electro conversion unit; a capacitor for storing charges converted by the photo-electro conversion unit; an output switching device for outputting an electric potential of the capacitor; and a removal unit for removing a part of the charges converted by the photo-electro conversion unit.
摘要:
A plasma display device is provided. The plasma display device includes a plasma display panel (PDP) having an upper substrate, a lower substrate, a plurality of scan electrodes and a plurality of sustain electrodes formed on the upper substrate, and a plurality of address electrodes formed on the lower substrate; and a driver applying driving signals to the plurality of electrodes, wherein a reset discharge occurs in a part of discharge cells. The plasma display device can contribute to the reduction of dark-area luminance and the improvement of dark-room contrast ratio.
摘要:
Disclosed are a pixel, a pixel array, an image sensor including the pixel array and a method for operating the image sensor. The pixel includes a photo-electro conversion unit; a first capacitor for storing a first quantity of charges of the photo-electro conversion unit; a second capacitor for storing a second quantity of charges of the photo-electro conversion unit; and an output unit to output the first and second quantities of the charges.
摘要:
Metal-polymer hybrid nanomaterials are provided. The hybrid nanomaterials comprise nanotubes or nanowires and metal layers formed on the inner or outer surfaces of the nanotubes or the outer surfaces of the nanowires. The nanotubes or nanowires include a light-emitting π-conjugated polymer and the metal layers are composed of a metal whose surface plasmon energy level is close to the energy band gap of the nanotubes or nanowires. Further provided are a method for preparing the hybrid nanomaterials, a method for controlling the optical properties of the hybrid nanomaterials, and an optoelectronic device using the hybrid nanomaterials. Energy transfer and electron transfer based on surface plasmon resonance increases the number of excitons in the conduction band of the nanotubes or nanowires including the light- emitting polymer, resulting in a remarkable increase in the luminescence intensity of the metal-polymer hybrid nanomaterials. The metal-polymer hybrid nanomaterials are easy to prepare and inexpensive while possessing inherent electrical and optical properties of carbon nanotubes. In addition, the electrical and optical properties of the metal-polymer hybrid nanomaterials can be easily controlled. Based on these advantages, the metal-polymer hybrid nanomaterials can be applied to a variety of optoelectronic devices, including light-emitting diodes, solar cells and photosensors.
摘要:
According to one embodiment of the present invention, a portion of a light-emitting polymer material or a conductive polymer material can be irradiated with a focused electron beam, so that the physical properties of that portion can be modified. For this purpose, one embodiment of the present invention comprises an apparatus for modifying the physical properties of a nanostructure using a focused electron beam, the apparatus comprising: a nanostructure; a focused electron beam-irradiating unit that serves to irradiate a nanoscale electron beam such that it is focused on the nanostructure; and a focused electron beam-controlling unit that serves to control the irradiation position of the nanoscale electron beam so as to modify the physical property of a portion of the nanostructure.
摘要:
According to one embodiment of the present invention, a portion of a light-emitting polymer material or a conductive polymer material can be irradiated with a focused electron beam, so that the physical properties of that portion can be modified. For this purpose, one embodiment of the present invention comprises an apparatus for modifying the physical properties of a nanostructure using a focused electron beam, the apparatus comprising: a nanostructure; a focused electron beam-irradiating unit that serves to irradiate a nanoscale electron beam such that it is focused on the nanostructure; and a focused electron beam-controlling unit that serves to control the irradiation position of the nanoscale electron beam so as to modify the physical property of a portion of the nanostructure.
摘要:
A complementary metal-oxide semiconductor (CMOS) image sensor includes a photodiode, a gate pattern of a transfer transistor contacting one side of the photodiode, a gate pattern of a drive transistor disposed to have a predetermined spacing distance from the gate pattern of the transfer transistor, and a floating diffusion node disposed between the gate pattern of the transfer transistor and the gate pattern of the drive transistor.
摘要:
A complementary metal-oxide semiconductor (CMOS) image sensor includes a photodiode, a gate pattern of a transfer transistor contacting one side of the photodiode, a gate pattern of a drive transistor disposed to have a predetermined spacing distance from the gate pattern of the transfer transistor, and a floating diffusion node disposed between the gate pattern of the transfer transistor and the gate pattern of the drive transistor.