CMOS image sensor
    1.
    发明授权
    CMOS image sensor 有权
    CMOS图像传感器

    公开(公告)号:US08093636B2

    公开(公告)日:2012-01-10

    申请号:US12633435

    申请日:2009-12-08

    申请人: Dong-Hyuk Park

    发明人: Dong-Hyuk Park

    IPC分类号: H01L27/146

    摘要: A complementary metal-oxide semiconductor (CMOS) image sensor includes a photodiode, a gate pattern of a transfer transistor contacting one side of the photodiode, a gate pattern of a drive transistor disposed to have a predetermined spacing distance from the gate pattern of the transfer transistor, and a floating diffusion node disposed between the gate pattern of the transfer transistor and the gate pattern of the drive transistor.

    摘要翻译: 互补金属氧化物半导体(CMOS)图像传感器包括光电二极管,与光电二极管的一侧接触的转移晶体管的栅极图案,驱动晶体管的栅极图案,被设置成与转印的栅极图案具有预定的间隔距离 晶体管,以及设置在传输晶体管的栅极图案与驱动晶体管的栅极图案之间的浮动扩散节点。

    PLASMA DISPLAY DEVICE
    4.
    发明申请
    PLASMA DISPLAY DEVICE 失效
    等离子体显示设备

    公开(公告)号:US20100066768A1

    公开(公告)日:2010-03-18

    申请号:US12560762

    申请日:2009-09-16

    IPC分类号: G09G5/10

    摘要: A plasma display device is provided. The plasma display device includes a plasma display panel (PDP) having an upper substrate, a lower substrate, a plurality of scan electrodes and a plurality of sustain electrodes formed on the upper substrate, and a plurality of address electrodes formed on the lower substrate; and a driver applying driving signals to the plurality of electrodes, wherein a reset discharge occurs in a part of discharge cells. The plasma display device can contribute to the reduction of dark-area luminance and the improvement of dark-room contrast ratio.

    摘要翻译: 提供等离子体显示装置。 等离子体显示装置包括具有上基板,下基板,多个扫描电极和形成在上基板上的多个维持电极的等离子体显示面板(PDP)和形成在下基板上的多个寻址电极。 以及向多个电极施加驱动信号的驱动器,其中在放电单元的一部分中发生复位放电。 等离子体显示装置可以有助于暗区亮度的降低和暗室对比度的提高。

    METAL-POLYMER HYBRID NANOMATERIALS, METHOD FOR PREPARING THE SAME METHOD FOR CONTROLLING OPTICAL PROPERTY OF THE SAME OPTOELECTRONIC DEVICE USING THE SAME
    6.
    发明申请
    METAL-POLYMER HYBRID NANOMATERIALS, METHOD FOR PREPARING THE SAME METHOD FOR CONTROLLING OPTICAL PROPERTY OF THE SAME OPTOELECTRONIC DEVICE USING THE SAME 审中-公开
    金属聚合物混合纳米材料,用于制备相同方法的方法,用于控制使用其的相同光电装置的光学性质

    公开(公告)号:US20100075145A1

    公开(公告)日:2010-03-25

    申请号:US12312264

    申请日:2008-09-16

    IPC分类号: C09K11/02 C25D5/56 C25D21/12

    摘要: Metal-polymer hybrid nanomaterials are provided. The hybrid nanomaterials comprise nanotubes or nanowires and metal layers formed on the inner or outer surfaces of the nanotubes or the outer surfaces of the nanowires. The nanotubes or nanowires include a light-emitting π-conjugated polymer and the metal layers are composed of a metal whose surface plasmon energy level is close to the energy band gap of the nanotubes or nanowires. Further provided are a method for preparing the hybrid nanomaterials, a method for controlling the optical properties of the hybrid nanomaterials, and an optoelectronic device using the hybrid nanomaterials. Energy transfer and electron transfer based on surface plasmon resonance increases the number of excitons in the conduction band of the nanotubes or nanowires including the light- emitting polymer, resulting in a remarkable increase in the luminescence intensity of the metal-polymer hybrid nanomaterials. The metal-polymer hybrid nanomaterials are easy to prepare and inexpensive while possessing inherent electrical and optical properties of carbon nanotubes. In addition, the electrical and optical properties of the metal-polymer hybrid nanomaterials can be easily controlled. Based on these advantages, the metal-polymer hybrid nanomaterials can be applied to a variety of optoelectronic devices, including light-emitting diodes, solar cells and photosensors.

    摘要翻译: 提供金属 - 聚合物混合纳米材料。 混合纳米材料包括形成在纳米管的内表面或外表面上的纳米管或纳米线和金属层,或纳米线的外表面。 纳米管或纳米线包括发光和共轭聚合物,并且金属层由其表面等离子体激发能级接近于纳米管或纳米线的能带隙的金属组成。 还提供了制备混合纳米材料的方法,用于控制混合纳米材料的光学性质的方法以及使用混合纳米材料的光电子器件。 基于表面等离子体共振的能量转移和电子转移增加了包括发光聚合物在内的纳米管或纳米线的导带中的激子的数量,导致金属 - 聚合物混合纳米材料的发光强度显着增加。 金属 - 聚合物混合纳米材料易于制备和便宜,同时具有碳纳米管的固有电学和光学性质。 此外,可以容易地控制金属 - 聚合物混合纳米材料的电学和光学性质。 基于这些优点,金属 - 聚合物混合纳米材料可以应用于各种光电子器件,包括发光二极管,太阳能电池和光电传感器。

    Apparatus and method for modifying physical properties of nanostructure using focused electron beam, and nano-barcode and serial-junction nanowire fabricated thereby
    7.
    发明授权
    Apparatus and method for modifying physical properties of nanostructure using focused electron beam, and nano-barcode and serial-junction nanowire fabricated thereby 有权
    使用聚焦电子束改变纳米结构的物理性能的装置和方法,以及由此制造的纳米条形码和串联结纳米线

    公开(公告)号:US08541480B2

    公开(公告)日:2013-09-24

    申请号:US13104444

    申请日:2011-05-10

    IPC分类号: H05B6/68 C08G61/04

    摘要: According to one embodiment of the present invention, a portion of a light-emitting polymer material or a conductive polymer material can be irradiated with a focused electron beam, so that the physical properties of that portion can be modified. For this purpose, one embodiment of the present invention comprises an apparatus for modifying the physical properties of a nanostructure using a focused electron beam, the apparatus comprising: a nanostructure; a focused electron beam-irradiating unit that serves to irradiate a nanoscale electron beam such that it is focused on the nanostructure; and a focused electron beam-controlling unit that serves to control the irradiation position of the nanoscale electron beam so as to modify the physical property of a portion of the nanostructure.

    摘要翻译: 根据本发明的一个实施例,可以用聚焦电子束照射发光聚合物材料或导电聚合物材料的一部分,从而可以改变该部分的物理性质。 为此目的,本发明的一个实施方案包括用于使用聚焦电子束修饰纳米结构的物理性质的装置,该装置包括:纳米结构; 聚焦电子束照射单元,其用于照射纳米级电子束,使得其聚焦在纳米结构上; 以及聚焦电子束控制单元,其用于控制​​纳米级电子束的照射位置,以便改变纳米结构的一部分的物理性质。

    CMOS IMAGE SENSOR
    9.
    发明申请
    CMOS IMAGE SENSOR 有权
    CMOS图像传感器

    公开(公告)号:US20100127315A1

    公开(公告)日:2010-05-27

    申请号:US12633435

    申请日:2009-12-08

    申请人: Dong-Hyuk Park

    发明人: Dong-Hyuk Park

    IPC分类号: H01L27/146 H01L31/18

    摘要: A complementary metal-oxide semiconductor (CMOS) image sensor includes a photodiode, a gate pattern of a transfer transistor contacting one side of the photodiode, a gate pattern of a drive transistor disposed to have a predetermined spacing distance from the gate pattern of the transfer transistor, and a floating diffusion node disposed between the gate pattern of the transfer transistor and the gate pattern of the drive transistor.

    摘要翻译: 互补金属氧化物半导体(CMOS)图像传感器包括光电二极管,与光电二极管的一侧接触的转移晶体管的栅极图案,驱动晶体管的栅极图案,被设置成与转印的栅极图案具有预定的间隔距离 晶体管,以及设置在传输晶体管的栅极图案与驱动晶体管的栅极图案之间的浮动扩散节点。

    CMOS image sensor
    10.
    发明申请
    CMOS image sensor 失效
    CMOS图像传感器

    公开(公告)号:US20070090423A1

    公开(公告)日:2007-04-26

    申请号:US11584554

    申请日:2006-10-23

    申请人: Dong-Hyuk Park

    发明人: Dong-Hyuk Park

    IPC分类号: H01L31/113 H01L21/00

    摘要: A complementary metal-oxide semiconductor (CMOS) image sensor includes a photodiode, a gate pattern of a transfer transistor contacting one side of the photodiode, a gate pattern of a drive transistor disposed to have a predetermined spacing distance from the gate pattern of the transfer transistor, and a floating diffusion node disposed between the gate pattern of the transfer transistor and the gate pattern of the drive transistor.

    摘要翻译: 互补金属氧化物半导体(CMOS)图像传感器包括光电二极管,与光电二极管的一侧接触的转移晶体管的栅极图案,驱动晶体管的栅极图案,被设置成与转印的栅极图案具有预定的间隔距离 晶体管,以及设置在传输晶体管的栅极图案与驱动晶体管的栅极图案之间的浮动扩散节点。