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    Non-pattern wafer inspection device
    1.
    发明授权
    Non-pattern wafer inspection device 有权
    非图案晶圆检查装置

    公开(公告)号：US08898028B2

    公开(公告)日：2014-11-25

    申请号：US12977710

    申请日：2010-12-23

    申请人： Byeong-Cheol Kim ,  Ho-Hyung Jung ,  Dong-Keun Shin

    发明人： Byeong-Cheol Kim ,  Ho-Hyung Jung ,  Dong-Keun Shin

    IPC分类号： G01N37/00 ,  G01N21/95

    CPC分类号： G01N21/9501 ,  G01N21/9503

    摘要： A device to inspect a non-pattern wafer includes a light source to emit light that reflected from a wafer. A judgment unit converts the detected light into a quantitative measured value to determine whether the wafer is faulty. The wafer comprises a first region and a second region. The detection unit sequentially detects lights reflected from the first and second regions of the wafer, and a judgment unit converts the lights reflected from the first and second regions of the wafer into first and second quantitative measured values, respectively. The second region of the wafer is determined to be faulty by comparing the second measured value with a first reference value, wherein the first reference value is calculated using an average value between the first and second measured values, and a characteristic value that indicates distribution of the first and second measured values.

    摘要翻译： 用于检查非图案晶片的装置包括发射从晶片反射的光的光源。 判断单元将检测到的光转换成定量测量值以确定晶片是否有故障。 晶片包括第一区域和第二区域。 检测单元顺序地检测从晶片的第一和第二区域反射的光，并且判断单元将从晶片的第一和第二区域反射的光分别转换为第一和第二定量测量值。 通过将第二测量值与第一参考值进行比较来确定晶片的第二区域是错误的，其中使用第一和第二测量值之间的平均值来计算第一参考值，以及表示第一参考值的特征值， 第一和第二测量值。

    Filter and display device having the same
    2.
    发明授权
    Filter and display device having the same 失效
    具有相同的过滤器和显示装置

    公开(公告)号：US08143771B2

    公开(公告)日：2012-03-27

    申请号：US12481711

    申请日：2009-06-10

    申请人： Dong Keun Shin ,  Dae Chul Park ,  Dong Hyun Park ,  Sang Yoon Oh ,  Moon Jin Choi ,  Hwa Yeon Lee

    发明人： Dong Keun Shin ,  Dae Chul Park ,  Dong Hyun Park ,  Sang Yoon Oh ,  Moon Jin Choi ,  Hwa Yeon Lee

    IPC分类号： H01J5/16

    CPC分类号： G02B5/22

    摘要： A filter for a display device includes a base substrate, a shielding film formed based on a single transparent base layer, and an adhesive layer adhering the shielding film onto the base substrate. The shielding film which realizes diverse shielding functions in a single sheet is adhered onto the base substrate through a single process, which serves to improve productivity, reduce manufacturing cost, restrain the occurrence of Haze and improve visibility.

    摘要翻译： 用于显示装置的滤光器包括基底，基于单个透明基底层形成的屏蔽膜和将屏蔽膜粘附到基底上的粘合剂层。 通过单一工艺将单个片材中实现不同屏蔽功能的屏蔽膜粘附到基底基底上，其用于提高生产率，降低制造成本，抑制雾度的发生并提高可见度。

    FILTER AND DISPLAY DEVICE HAVING THE SAME
    4.
    发明申请
    FILTER AND DISPLAY DEVICE HAVING THE SAME 失效
    具有相同功能的过滤器和显示装置

    公开(公告)号：US20090310212A1

    公开(公告)日：2009-12-17

    申请号：US12481711

    申请日：2009-06-10

    申请人： Dong Keun SHIN ,  Dae Chul PARK ,  Dong Hyun PARK ,  Sang Yoon OH ,  Moon Jin CHOI ,  Hwa Yeon LEE

    发明人： Dong Keun SHIN ,  Dae Chul PARK ,  Dong Hyun PARK ,  Sang Yoon OH ,  Moon Jin CHOI ,  Hwa Yeon LEE

    IPC分类号： G02B5/20 ,  H05K9/00

    CPC分类号： G02B5/22

    摘要： A filter for a display device includes a base substrate, a shielding film formed based on a single transparent base layer, and an adhesive layer adhering the shielding film onto the base substrate. The shielding film which realizes diverse shielding functions in a single sheet is adhered onto the base substrate through a single process, which serves to improve productivity, reduce manufacturing cost, restrain the occurrence of Haze and improve visibility.

    摘要翻译： 用于显示装置的滤光器包括基底，基于单个透明基底层形成的屏蔽膜和将屏蔽膜粘附到基底上的粘合剂层。 通过单一工艺将单个片材中实现不同屏蔽功能的屏蔽膜粘附到基底基底上，其用于提高生产率，降低制造成本，抑制雾度的发生并提高可见度。

    SYSTEM FOR MEASURING THE WRINKLE ON WEB IN R2R PROCESS
    5.
    发明申请
    SYSTEM FOR MEASURING THE WRINKLE ON WEB IN R2R PROCESS 审中-公开
    用于在R2R过程中测量网页上的皱纹的系统

    公开(公告)号：US20100117010A1

    公开(公告)日：2010-05-13

    申请号：US12596469

    申请日：2008-06-20

    申请人： Sung Lim Ko ,  Dong Keun Shin ,  Hoang Minh To ,  Kee Hyun Shin

    发明人： Sung Lim Ko ,  Dong Keun Shin ,  Hoang Minh To ,  Kee Hyun Shin

    IPC分类号： G01N21/86

    CPC分类号： G01B11/2522 ,  G01N21/8851 ,  G01N21/89

    摘要： The present invention relates to a system for measuring wrinkles on a web in an R2R process. The system includes a laser generation device (100) for projecting a laser beam, emitted in a linear shape, onto a surface of a web (200), which is stopped or moving. A camera (300) captures a band of light, formed when the laser beam generated by the laser generation device (100) is projected onto the surface of the web (200), and transmitting image data of the captured light band. A measurement device (400) calculates coordinates of an arbitrary location on the web (200) on a basis of the image data transmitted from the camera (300), processes an image of the light band on a basis of the calculated coordinates, and displays the processed image. Accordingly, the results of reliable wrinkle measurement are provided for a web in an R2R process.

    摘要翻译： 本发明涉及一种用于在R2R工艺中测量卷材上的褶皱的系统。 该系统包括激光产生装置（100），用于将以线性形式发射的激光束投射到停止或移动的幅材（200）的表面上。 相机（300）捕获当由激光产生装置（100）产生的激光束投射到卷筒纸（200）的表面上时形成的光束，并且传送捕获的光带的图像数据。 测量装置（400）基于从相机（300）发送的图像数据计算卷筒纸（200）上的任意位置的坐标，基于所计算的坐标处理光带的图像，并且显示 处理后的图像。 因此，在R2R工艺中为纤维网提供可靠的皱纹测量的结果。

    OPTICAL FILTER AND DISPLAY DEVICE HAVING THE SAME
    7.
    发明申请
    OPTICAL FILTER AND DISPLAY DEVICE HAVING THE SAME 审中-公开
    具有该光学滤波器和显示装置的光学滤波器

    公开(公告)号：US20090201587A1

    公开(公告)日：2009-08-13

    申请号：US12368560

    申请日：2009-02-10

    申请人： Hong Ik Kim ,  Dong Keun Shin ,  Dong Hyun Park ,  Dae Chul Park ,  Shin Wook Kim

    发明人： Hong Ik Kim ,  Dong Keun Shin ,  Dong Hyun Park ,  Dae Chul Park ,  Shin Wook Kim

    IPC分类号： G02B1/11

    CPC分类号： G02B5/22 ,  G02B5/005

    摘要： An optical filter for a display device placed in front of a display panel 1000 of the display device includes a first layer 310 which is formed at a first area A1 and has a first light blocking ratio. The amount of light transmitted through the first area A1 is smaller than the amount of light transmitted through an adjacent area to the first area A1 such that the first area A1 becomes distinguished to form a dark mark or the adjacent area becomes distinguished to form a bright mark. The optical filter further includes a second layer 320 which is formed at a second area A2 and has a second light blocking ratio lower than the first light blocking ratio. The amount of light transmitted through the first area A1 is smaller than the amount of light transmitted through the second area A2 such that the first area A1 becomes distinguished to form the dark mark or the second area becomes distinguished to form a bright mark. The second layer 320 can be a coating layer which is printed with a material with the second light blocking ratio or a film containing a material with the second light blocking ratio. The second light blocking ratio can be 70˜99%. The first layer 310 can be a coating layer of a black ceramic material or a film containing a black ceramic material. A display device includes the display panel 1000 displaying an image; and the optical filter.

    摘要翻译： 放置在显示装置的显示面板1000的前面的显示装置的滤光器包括形成在第一区域A1处并具有第一遮光率的第一层310。 通过第一区域A1透射的光量比通过与第一区域A1相邻的区域透射的光量小，使得第一区域A1被区分为形成暗标记，或者相邻区域变得明亮 标记。 滤光器还包括第二层320，其形成在第二区域A2处，并且具有低于第一遮光率的第二遮光率。 通过第一区域A1透射的光量比通过第二区域A2透射的光量小，使得第一区域A1被区分以形成黑色标记，或者第二区域被区分以形成亮点。 第二层320可以是用第二遮光率的材料印刷的涂层或含有第二遮光率的材料的膜。 第二个遮光率可以是70〜99％。 第一层310可以是黑色陶瓷材料的涂层或含有黑色陶瓷材料的膜。 显示装置包括显示图像的显示面板1000; 和滤光片。

    NON-PATTERN WAFER INSPECTION DEVICE
    8.
    发明申请
    NON-PATTERN WAFER INSPECTION DEVICE 有权
    非图案波形检测装置

    公开(公告)号：US20110161014A1

    公开(公告)日：2011-06-30

    申请号：US12977710

    申请日：2010-12-23

    申请人： Byeong-Cheol KIM ,  Ho-Hyung Jung ,  Dong-keun Shin

    发明人： Byeong-Cheol KIM ,  Ho-Hyung Jung ,  Dong-keun Shin

    IPC分类号： G01N21/88 ,  G06F19/00

    CPC分类号： G01N21/9501 ,  G01N21/9503

    摘要： A device to inspect a non-pattern wafer includes a light source to emit light that reflected from a wafer. A judgment unit converts the detected light into a quantitative measured value to determine whether the wafer is faulty. The wafer comprises a first region and a second region. The detection unit sequentially detects lights reflected from the first and second regions of the wafer, and a judgment unit converts the lights reflected from the first and second regions of the wafer into first and second quantitative measured values, respectively. The second region of the wafer is determined to be faulty by comparing the second measured value with a first reference value, wherein the first reference value is calculated using an average value between the first and second measured values, and a characteristic value that indicates distribution of the first and second measured values.

    摘要翻译： 用于检查非图案晶片的装置包括发射从晶片反射的光的光源。 判断单元将检测到的光转换成定量测量值以确定晶片是否有故障。 晶片包括第一区域和第二区域。 检测单元顺序地检测从晶片的第一和第二区域反射的光，并且判断单元将从晶片的第一和第二区域反射的光分别转换为第一和第二定量测量值。 通过将第二测量值与第一参考值进行比较来确定晶片的第二区域是错误的，其中使用第一和第二测量值之间的平均值来计算第一参考值，以及表示第一参考值的特征值， 第一和第二测量值。

    OPTICAL MEMBER AND OPTICAL FILTER FOR DISPLAY DEVICE HAVING THE SAME
    9.
    发明申请
    OPTICAL MEMBER AND OPTICAL FILTER FOR DISPLAY DEVICE HAVING THE SAME 审中-公开
    具有该显示装置的光学部件和光学过滤器

    公开(公告)号：US20100177416A1

    公开(公告)日：2010-07-15

    申请号：US12640313

    申请日：2009-12-17

    申请人： Sung Nim Jo ,  Ji Yoon Yeom ,  Dong Keun Shin

    发明人： Sung Nim Jo ,  Ji Yoon Yeom ,  Dong Keun Shin

    IPC分类号： G02B5/22

    CPC分类号： H01J11/10 ,  G02B1/11 ,  G02B5/208 ,  G02B5/223 ,  H01J11/44 ,  H01J2211/444 ,  H01J2211/446

    摘要： An optical member of an optical filter provided for a display device includes a colorant which can selectively absorb light with a predetermined wavelength. The optical member satisfies a following expression: 0≦ΔE*=√{square root over (Δa*2+Δb*2)}

    摘要翻译： 为显示装置提供的滤光器的光学构件包括可选择性地吸收预定波长的光的着色剂。 光学构件满足以下表达式：0＆nlE;＆Dgr; E * =√{平方根超过（＆Dgr; a * 2 +＆Dgr; b * 2）} <5，其中＆Dgr; E *表示反射颜色和透射 颜色在D65标准光源下。 a *和b *对应于满足以下表达式的无色色：-2.0＆nlE; a *＆nlE; 2.0和-2.0＆nlE; b *＆nlE; 2.0。 为显示装置提供的滤光器的光学构件包括可选择性地吸收预定波长的光的着色剂。 着色剂可以是非荧光着色剂。 着色剂包括调色剂和氖切割着色剂。 用于显示装置的滤光器包括该光学构件。