公开(公告)号：US20120082745A1

公开(公告)日：2012-04-05

申请号：US13229047

申请日：2011-09-09

申请人： Eui Sun Choi ,  Eun Soo Hwang ,  Young Tae Cho ,  Dong Min Kim ,  Jeong Gil Kim ,  Jong Woo Lee ,  Eun Ah Park

发明人： Eui Sun Choi ,  Eun Soo Hwang ,  Young Tae Cho ,  Dong Min Kim ,  Jeong Gil Kim ,  Jong Woo Lee ,  Eun Ah Park

IPC分类号： B29C59/02 ,  B29C33/40

CPC分类号： B29C33/3857 ,  B29C33/0016 ,  B29C33/428 ,  B29C2033/426 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  G03F7/0017

摘要： Disclosed herein is a patterning mold configured to form a micropattern on a substrate or glass. The disclosed patterning mold includes a transfer body with a patterning part formed at one end of the transfer body to transfer a nanoparticle material to one surface of the substrate. The patterning mold further includes a fixing member coupled to an exterior of the transfer body, to prevent or reduce deformation of the exterior of the transfer body.

摘要翻译： 本文公开了一种图案化模具，其被配置为在基板或玻璃上形成微图案。 所公开的图案形成模具包括转印体，其具有形成在转印体一端的图形部分，以将纳米颗粒材料转印到基底的一个表面。 图案形成模具还包括连接到转印体的外部的固定构件，以防止或减少转印体外部的变形。

公开(公告)号：US20160229165A1

公开(公告)日：2016-08-11

申请号：US14991483

申请日：2016-01-08

申请人： Eui-Sun CHOI ,  Nam-II KOO ,  Ji-Min LEE ,  Hyung-Kyu LEE ,  Min-Seok CHOI

发明人： Eui-Sun CHOI ,  Nam-II KOO ,  Ji-Min LEE ,  Hyung-Kyu LEE ,  Min-Seok CHOI

IPC分类号： B32B37/00 ,  B32B37/10 ,  B32B37/06

CPC分类号： G02B1/11

摘要： Example embodiments relate to a manufacturing device of an anti-reflecting structure and a method for manufacturing the anti-reflecting structure. The manufacturing device of an anti-reflecting structure includes a carrier film on which a stamp structure is formed, an unwinding unit which unwinds the carrier film, a substrate support unit which provides a target substrate to the carrier film, a pressing unit which applies pressure to the carrier film so that a resin provided in the stamp structure is provided to the target substrate, and a winding unit which winds the carrier film from which an anti-reflecting pattern is transferred to the target substrate, wherein the pressing unit includes a chamber which stores the target substrate, and a vent hole formed in the chamber, and air within the chamber is discharged through the vent hole to lower the air pressure in the chamber and apply pressure to the carrier film.

摘要翻译： 示例性实施例涉及防反射结构的制造装置和用于制造抗反射结构的方法。 防反射结构的制造装置包括形成印模结构的载体膜，展开载体膜的展开单元，向载体膜提供目标基板的基板支撑单元，施加压力的加压单元 向载体膜施加设置在印模结构体中的树脂到目标基板，以及缠绕单元，该卷绕单元将将抗反射图案转印到目标基板上的载体膜卷绕，其中按压单元包括室 其存储目标基板和形成在室中的通气孔，并且室内的空气通过通气孔排出，以降低室中的空气压力并向载体膜施加压力。

公开(公告)号：US08894406B2

公开(公告)日：2014-11-25

申请号：US13229047

申请日：2011-09-09

申请人： Eui Sun Choi ,  Eun Soo Hwang ,  Young Tae Cho ,  Dong Min Kim ,  Jeong Gil Kim ,  Jong Woo Lee ,  Eun Ah Park

发明人： Eui Sun Choi ,  Eun Soo Hwang ,  Young Tae Cho ,  Dong Min Kim ,  Jeong Gil Kim ,  Jong Woo Lee ,  Eun Ah Park

IPC分类号： B29C59/02 ,  B29C33/00 ,  G03F7/00 ,  B29C33/38 ,  B29C33/42

CPC分类号： B29C33/3857 ,  B29C33/0016 ,  B29C33/428 ,  B29C2033/426 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  G03F7/0017

摘要： Disclosed herein is a patterning mold configured to form a micropattern on a substrate or glass. The disclosed patterning mold includes a transfer body with a patterning part formed at one end of the transfer body to transfer a nanoparticle material to one surface of the substrate. The patterning mold further includes a fixing member coupled to an exterior of the transfer body, to prevent or reduce deformation of the exterior of the transfer body.

摘要翻译： 本文公开了一种图案化模具，其被配置为在基板或玻璃上形成微图案。 所公开的图案形成模具包括转印体，其具有形成在转印体一端的图形部分，以将纳米颗粒材料转印到基底的一个表面。 图案形成模具还包括连接到转印体的外部的固定构件，以防止或减少转印体外部的变形。

公开(公告)号：US20140252679A1

公开(公告)日：2014-09-11

申请号：US14197498

申请日：2014-03-05

申请人： Eun Soo HWANG ,  Eui Sun CHOI ,  Sung Hoon LEE

发明人： Eun Soo HWANG ,  Eui Sun CHOI ,  Sung Hoon LEE

IPC分类号： B29C59/04

CPC分类号： B29C59/046 ,  B29C59/026 ,  B29C2035/0827 ,  G03F7/0002

摘要： A large-scale imprint apparatus includes a roll-to-roll unit configured to wind or rewind a flexible substrate, a stage arranged adjacent to a winding path of the flexible substrate, the stage being configured to support a stamp master with a master pattern or to support a substrate, and a stamping pressing unit arranged adjacent to the stage, the stamping pressing unit being configured to press the flexible substrate against the stamp master or against the substrate.

摘要翻译： 大型压印装置包括卷绕单元，其构造成卷绕或倒回柔性基板，邻近柔性基板的卷绕路径布置的台，该台被配置为支撑具有主图案的印模主体， 支撑基板和邻近台架设置的冲压单元，所述冲压单元构造成将柔性基板压靠在压模母板上或抵靠基板上。

公开(公告)号：US10451772B2

公开(公告)日：2019-10-22

申请号：US14991483

申请日：2016-01-08

申请人： Eui-Sun Choi ,  Nam-Ii Koo ,  Ji-Min Lee ,  Hyung-Kyu Lee ,  Min-Seok Choi

发明人： Eui-Sun Choi ,  Nam-Ii Koo ,  Ji-Min Lee ,  Hyung-Kyu Lee ,  Min-Seok Choi

IPC分类号： B29C33/00 ,  B29C43/00 ,  B29C47/00 ,  B29C51/00 ,  B29C53/00 ,  B29C59/00 ,  G02B1/11

摘要： Example embodiments relate to a manufacturing device of an anti-reflecting structure and a method for manufacturing the anti-reflecting structure. The manufacturing device of an anti-reflecting structure includes a carrier film on which a stamp structure is formed, an unwinding unit which unwinds the carrier film, a substrate support unit which provides a target substrate to the carrier film, a pressing unit which applies pressure to the carrier film so that a resin provided in the stamp structure is provided to the target substrate, and a winding unit which winds the carrier film from which an anti-reflecting pattern is transferred to the target substrate, wherein the pressing unit includes a chamber which stores the target substrate, and a vent hole formed in the chamber, and air within the chamber is discharged through the vent hole to lower the air pressure in the chamber and apply pressure to the carrier film.

公开(公告)号：US20160370505A1

公开(公告)日：2016-12-22

申请号：US15073815

申请日：2016-03-18

申请人： Nam-il KOO ,  Min-seok CHOI ,  Eui-sun CHOI ,  Hyung-kyu LEE ,  Ji-min LEE

发明人： Nam-il KOO ,  Min-seok CHOI ,  Eui-sun CHOI ,  Hyung-kyu LEE ,  Ji-min LEE

IPC分类号： G02B1/118 ,  G02B1/14 ,  G02B1/111 ,  H01L27/146

CPC分类号： G02B1/118 ,  G02B1/14 ,  H01L27/14618 ,  H01L27/1462 ,  H01L27/14625 ,  H01L27/14685 ,  H01L2224/48091 ,  H01L2224/73265 ,  H01L2924/181 ,  H01L2924/1815 ,  H01L2924/00014 ,  H01L2924/00012

摘要： An anti-reflective film includes a transparent substrate, and a high hardness coating layer on at least one surface of the transparent substrate, the high hardness coating layer having a hardness of about 4H or higher and a moth-eye pattern.

摘要翻译： 抗反射膜包括透明基板和在透明基板的至少一个表面上的高硬度涂层，高硬度涂层具有约4H以上的硬度和蛾眼图案。

公开(公告)号：US20120160112A1

公开(公告)日：2012-06-28

申请号：US13333403

申请日：2011-12-21

申请人： Eun Soo Hwang ,  Jin Sung Kim ,  Young Jeong Kim ,  Jong Woo Lee ,  Young Tae Cho ,  Dong Min Kim ,  Tae Young Ra ,  Eui Sun Choi ,  Eun Ah Park

发明人： Eun Soo Hwang ,  Jin Sung Kim ,  Young Jeong Kim ,  Jong Woo Lee ,  Young Tae Cho ,  Dong Min Kim ,  Tae Young Ra ,  Eui Sun Choi ,  Eun Ah Park

IPC分类号： B44B5/00 ,  B44C1/24 ,  B41K1/38

CPC分类号： B41K3/04 ,  B41F17/001

摘要： According to example embodiments, a printing apparatus includes a wafer delivery unit configured to move and support a wafer, an optical microscope configured to inspect the wafer, a pattern transfer unit configured to display a position of a defect on the wafer detected using the optical microscope.

摘要翻译： 根据示例性实施例，打印设备包括被配置为移动和支撑晶片的晶片传送单元，被配置为检查晶片的光学显微镜，配置为使用光学显微镜检测到的在晶片上显示缺陷的位置的图案转印单元 。