公开(公告)号：US08953855B2

公开(公告)日：2015-02-10

申请号：US12393321

申请日：2009-02-26

Applicant: Hitoshi Namai ,  Osamu Komuro ,  Satoru Yamaguchi ,  Fumihiro Sasajima

Inventor： Hitoshi Namai ,  Osamu Komuro ,  Satoru Yamaguchi ,  Fumihiro Sasajima

IPC: G06K9/00 ,  G06K9/46 ,  G06T7/00

CPC classification number: G06K9/4609 ,  G06T7/13

Abstract: An object of the present invention is to provide an edge detection technique and equipment which are capable of stably detecting an edge by suppressing the influence of noise even in the case where the image is obtained by charged particle radiation equipment, such as a scanning electron microscope and has a low S/N ratio. More specifically, the present invention is to propose a technique and equipment which are configured to determine a peak position (edge) on the basis of the following two edge extraction techniques. That is, the present invention is to propose a technique and equipment wherein at least two peaks are formed by using, as edge detection techniques, for example, one peak detection technique having a relatively high sensitivity and the other peak detection technique which is relatively less susceptible to the influence of noise than the one peak detection technique, and wherein a position where the peaks coincide with each other is determined as a true peak position (edge position).

Abstract translation: 本发明的目的是提供一种能够通过抑制噪声的影响来稳定地检测边缘的边缘检测技术和设备，即使在通过诸如扫描电子显微镜的带电粒子辐射设备获得图像的情况下 并具有较低的S / N比。 更具体地，本发明是提出一种被配置为基于以下两个边缘提取技术来确定峰值位置（边缘）的技术和设备。 也就是说，本发明提出一种技术和设备，其中通过使用作为边缘检测技术的至少两个峰形成例如具有相对较高灵敏度的一个峰值检测技术和相对较少的另一个峰值检测技术 容易受到噪声的影响而不是一个峰值检测技术，并且其中峰值彼此重合的位置被确定为真正的峰值位置（边缘位置）。

公开(公告)号：US20120138796A1

公开(公告)日：2012-06-07

申请号：US13390415

申请日：2010-08-23

Applicant: Fumihiro Sasajima ,  Katsumi Setoguchi

Inventor： Fumihiro Sasajima ,  Katsumi Setoguchi

IPC: H01J37/26

CPC classification number: H01J37/28 ,  H01J37/222 ,  H01J2237/216 ,  H01J2237/24578 ,  H01J2237/2803 ,  H01J2237/2817

Abstract: Provided is a signal processing method for a charged particle beam, and a signal processing device, wherein the amount of beam radiation per unit area is restricted, while maintaining the magnifications in the X and Y directions constant. Proposed, in order to achieve the above-mentioned purpose, is a signal processing method and a signal processing device wherein a plurality of images taken at different places are added up, and an image is formed. Proposed as a specific example is a signal processing method and a signal processing device that obtains a repeating pattern formed on a sample and having the same shape or similar shapes, by moving the field of view, and that forms an image (or a signal waveform) by adding up the obtained signal, and conducts measurements using this image.

Abstract translation: 提供了一种用于带电粒子束的信号处理方法，以及信号处理装置，其中每单位面积的光束辐射量被限制，同时保持X和Y方向上的放大倍数恒定。 为了实现上述目的，提出了一种信号处理方法和信号处理装置，其中在不同位置拍摄的多个图像相加，并且形成图像。 作为具体示例的信号处理方法和信号处理装置，通过移动视场来获得形成在样本上并具有相同形状或类似形状的重复图案，并且形成图像（或信号波形 ），并使用该图像进行测量。

公开(公告)号：US07381951B2

公开(公告)日：2008-06-03

申请号：US11209759

申请日：2005-08-24

Applicant: Takashi Doi ,  Noriaki Arai ,  Hidetoshi Morokuma ,  Katsumi Setoguchi ,  Fumihiro Sasajima ,  Maki Tanaka ,  Atsushi Miyamoto

Inventor： Takashi Doi ,  Noriaki Arai ,  Hidetoshi Morokuma ,  Katsumi Setoguchi ,  Fumihiro Sasajima ,  Maki Tanaka ,  Atsushi Miyamoto

IPC: G21K7/00

CPC classification number: G21K1/08 ,  G01N2223/07 ,  G01N2223/32 ,  H01J37/1478 ,  H01J37/153 ,  H01J37/21 ,  H01J37/28 ,  H01J2237/1536 ,  H01J2237/216

Abstract: A charged particle beam adjustment apparatus for tilting an electron beam by a tilt deflector is disclosed. The tilt angle adjustment of the electron beam and the distortion adjustment for correcting the image distortion generated when the electron beam is tilted are conducted on a specified. sample such as a pyramidal sample. The images before and after the tilting are acquired and processed to determine the tilt angle value and the distortion amount. The tilt angle adjustment and the adjustment for correction of the distortion are automated in accordance with a predetermined processing flow.

Abstract translation: 公开了一种用于使倾斜偏转器倾斜电子束的带电粒子束调节装置。 在电子束倾斜时产生的图像失真的电子束的倾斜角调整和变形调整进行规定。 样品如金字塔形样品。 获取并处理倾斜之前和之后的图像以确定倾斜角度值和失真量。 根据预定的处理流程，自动地进行倾斜角调整和矫正矫正。

公开(公告)号：US20050211897A1

公开(公告)日：2005-09-29

申请号：US11066219

申请日：2005-02-28

Applicant: Fumihiro Sasajima ,  Yoshihiro Kimura ,  Osamu Komuro

Inventor： Fumihiro Sasajima ,  Yoshihiro Kimura ,  Osamu Komuro

IPC: G01B15/00 ,  G01N23/00 ,  G01N23/225 ,  G21K7/00 ,  H01J37/28

CPC classification number: H01J37/222 ,  G01N23/225 ,  G03F7/70625 ,  H01J37/28 ,  H01J2237/24578 ,  H01J2237/2814

Abstract: A pattern measuring method calculates an average pattern shape from a plurality of the same patterns appearing within an image captured using an electron microscope, and compares pattern information at each measuring position with average pattern information to determine roughness.

Abstract translation: 图案测量方法从使用电子显微镜拍摄的图像中出现的多个相同图案计算平均图案形状，并且将每个测量位置处的图案信息与平均图案信息进行比较以确定粗糙度。

公开(公告)号：US08478078B2

公开(公告)日：2013-07-02

申请号：US13122731

申请日：2009-10-02

Applicant: Kei Sakai ,  Fumihiro Sasajima

Inventor： Kei Sakai ,  Fumihiro Sasajima

IPC: G06K9/32

CPC classification number: H01J37/222 ,  G06T7/001 ,  G06T2207/10061 ,  G06T2207/30148 ,  H01J37/28 ,  H01J2237/2817 ,  H01J2237/2826

Abstract: Provided is a method for determining the magnification of a pattern searching template of a scanning electron microscope. The determining method comprises: acquiring a first image initially at a first magnification; then acquiring a second image which contains a pattern image displayed on the first image at a second magnification lower than the first magnification; making the size of the first image coincident with the size of a third image which cut out a portion of the second image; thereafter determining the correlation value between the first image and the third image; and setting the second magnification as the magnification of a pattern searching template, in the case where the correlation value is equal to or higher than a predetermined value. As a result, a condition for acquiring a search area can be properly set, when pattern recognition is performed by means of the template.

Abstract translation: 提供了一种用于确定扫描电子显微镜的图案搜索模板的放大率的方法。 所述确定方法包括：以第一放大率开始获取第一图像; 然后以低于第一倍率的第二倍率获取包含显示在第一图像上的图案图像的第二图像; 使第一图像的大小与切出第二图像的一部分的第三图像的大小一致; 然后确定第一图像和第三图像之间的相关值; 并且在相关值等于或高于预定值的情况下，将第二放大倍率设置为模式搜索模板的放大率。 结果，当通过模板执行模式识别时，可以适当地设置用于获取搜索区域的条件。

公开(公告)号：US08305435B2

公开(公告)日：2012-11-06

申请号：US12053287

申请日：2008-03-21

Applicant: Yoshimichi Sato ,  Mitsuji Ikeda ,  Fumihiro Sasajima

Inventor： Yoshimichi Sato ,  Mitsuji Ikeda ,  Fumihiro Sasajima

IPC: H04N7/18 ,  H04N9/47 ,  G01N23/00 ,  G21K7/00 ,  G06K9/62

CPC classification number: G06T7/74 ,  G06T7/73 ,  G06T2207/30148

Abstract: The present invention achieves the process of easily registering a template which is prepared for a size change in pattern matching for specifying a measurement point, and high-speed pattern matching by which adequate position accuracy can be obtained in measurement. The present invention includes means for automatically calculating the size and position of a positioning template different from a measurement point itself when the measurement point is designated, to display a template having the calculated size and position. The present invention further includes means for performing pattern matching by using all or some of a plurality of divided templates and extracting templates having a similar positional relationship to the original positional relationship.

Abstract translation: 本发明实现了为了指定测量点而进行模式匹配中的尺寸变化准备的模板的容易登记以及在测量中可以获得足够的位置精度的高速模式匹配的处理。 本发明包括当指定测量点时自动计算与测量点本身不同的定位模板的尺寸和位置的装置，以显示具有计算的尺寸和位置的模板。 本发明还包括通过使用多个划分的模板中的全部或一些来提取与原始位置关系具有相似位置关系的模板来执行模式匹配的装置。

公开(公告)号：US20100314541A1

公开(公告)日：2010-12-16

申请号：US12848278

申请日：2010-08-02

Applicant: Fumihiro SASAJIMA ,  Osamu KOMURO ,  Fumio MIZUNO

Inventor： Fumihiro SASAJIMA ,  Osamu KOMURO ,  Fumio MIZUNO

IPC: G01N23/225

CPC classification number: G03F7/70608 ,  G01N23/225 ,  G06T7/0004 ,  H01J37/265 ,  H01J37/28 ,  H01J2237/221 ,  H01J2237/24592 ,  H01J2237/2487

Abstract: The edges of the reticle are detected with respect to the microstructured patterns exposed by the stepper, and the shapes of the microstructured patterns at the surface and at the bottom of the photoresist are detected. The microstructured patterns are evaluated by calculating, and displaying on the screen, the dislocation vector that represents the relationship in position between the detected patterns on the surface and at the bottom of the photoresist. Furthermore, dislocation vectors between the microstructured patterns at multiple positions in a single-chip or single-shot area or on one wafer are likewise calculated, then the sizes and distribution status of the dislocation vectors at each such position are categorized as characteristic quantities, and the corresponding tendencies are analyzed. Thus, stepper or wafer abnormality is detected.

Abstract translation: 相对于由步进器暴露的微结构化图案检测掩模版的边缘，并且检测光致抗蚀剂表面和底部处的微结构图案的形状。 通过在屏幕上计算和显示代表光刻胶表面和底部上检测到的图案之间的位置关系的位错矢量来评估微结构化图案。 此外，同样计算单芯片或单次照射区域或一个晶片上的多个位置处的微结构化图案之间的位错矢量，则将每个这样的位置处的位错矢量的尺寸和分布状态分类为特征量，并且 分析相应的趋势。 因此，检测到步进器或晶片异常。

公开(公告)号：US20100181478A1

公开(公告)日：2010-07-22

申请号：US12749271

申请日：2010-03-29

Applicant: Hidetoshi Morokuma ,  Noriaki Arai ,  Takashi Doi ,  Fumihiro Sasajima ,  Yoshihiro Kimura

Inventor： Hidetoshi Morokuma ,  Noriaki Arai ,  Takashi Doi ,  Fumihiro Sasajima ,  Yoshihiro Kimura

IPC: H01J37/28 ,  H01J37/10 ,  H01J37/147

CPC classification number: H01J37/21 ,  H01J37/153 ,  H01J2237/216 ,  H01J2237/221

Abstract: In an apparatus for obtaining an image by irradiating a charged particle beam on a specimen, a condition of the beam conditioned differently from vertical incidence as in the case of the beam being tilted is required to be adjusted. To this end, the apparatus has a controller for automatically controlling a stigmator, an objective lens and a deflector such that astigmatism is corrected, focus is adjusted and view filed shift is corrected. The controller has a selector for inhibiting at least one of the astigmatism correction, focus adjustment and FOV shift correction from being executed.

Abstract translation: 在用于通过将带电粒子束照射在样本上来获得图像的装置中，需要调整如在光束倾斜的情况下不同于垂直入射而调节的光束的条件。 为此，该装置具有用于自动控制瞄光器，物镜和偏转器的控制器，从而校正像散，调整焦点并校正视野移动。 控制器具有用于禁止执行散光校正，聚焦调整和FOV偏移校正中的至少一个的选择器。

公开(公告)号：US20090295914A1

公开(公告)日：2009-12-03

申请号：US12053287

申请日：2008-03-21

Applicant: Yoshimichi SATO ,  Mitsuji IKEDA ,  Fumihiro SASAJIMA

Inventor： Yoshimichi SATO ,  Mitsuji IKEDA ,  Fumihiro SASAJIMA

IPC: H04N7/18 ,  G06K9/00

CPC classification number: G06T7/74 ,  G06T7/73 ,  G06T2207/30148

Abstract: The present invention achieves the process of easily registering a template which is prepared for a size change in pattern matching for specifying a measurement point, and high-speed pattern matching by which adequate position accuracy can be obtained in measurement. The present invention includes means for automatically calculating the size and position of a positioning template different from a measurement point itself when the measurement point is designated, to display a template having the calculated size and position. The present invention further includes means for performing pattern matching by using all or some of a plurality of divided templates and extracting templates having a similar positional relationship to the original positional relationship.

Abstract translation: 本发明实现了为了指定测量点而进行模式匹配中的尺寸变化准备的模板的容易登记以及在测量中可以获得足够的位置精度的高速模式匹配的处理。 本发明包括当指定测量点时自动计算与测量点本身不同的定位模板的尺寸和位置的装置，以显示具有计算的尺寸和位置的模板。 本发明还包括通过使用多个划分的模板中的全部或一些来提取与原始位置关系具有相似位置关系的模板来执行模式匹配的装置。

公开(公告)号：US20080099676A1

公开(公告)日：2008-05-01

申请号：US11976968

申请日：2007-10-30

Applicant: Fumihiro Sasajima ,  Saori Kato

Inventor： Fumihiro Sasajima ,  Saori Kato

IPC: G01N23/00

CPC classification number: G06T7/001 ,  G06T2207/10061 ,  G06T2207/30148 ,  H01J2237/2817

Abstract: A scanning electron microscope capable of performing alone the critical dimension measurement and the defect inspection is provided. The scanning electron microscope has a reference image storage unit for storing a reference image transcribing a reference pattern, an inspected image pick-up unit for picking up, on the basis of the reference image, an inspected image transcribing an inspection pattern which pattern-matches with the reference pattern, a critical dimension measuring unit for measuring critical dimensions of the inspection pattern by using the inspected image, and a defect inspection unit for performing an inspection of a defect inside or outside the inspection pattern by comparing the reference image with the inspected image.

Abstract translation: 提供能够单独执行临界尺寸测量和缺陷检查的扫描电子显微镜。 该扫描电子显微镜具有参考图像存储单元，用于存储转录参考图案的参考图像，检测图像拾取单元，用于基于参考图像拾取图像匹配的检查图案的检查图像 使用参考图案，通过使用检查图像来测量检查图案的临界尺寸的临界尺寸测量单元和用于通过将参考图像与被检查图像进行比较来执行检查图案内部或外部的缺陷检查的缺陷检查单元 图片。