公开(公告)号：US4172021A

公开(公告)日：1979-10-23

申请号：US951215

申请日：1978-10-13

申请人： Gary W. Gladish

发明人： Gary W. Gladish

IPC分类号： C23C14/34 ,  C23C15/00

CPC分类号： C23C14/228 ,  C23C14/34

摘要： Method and device (10) for suppressing sputtering glow in a gas to be transported across a voltage drop region (X-Y) under conditions where the gas would otherwise tend to support a glow discharge. The device includes an insulating member, such as a plastic tube (70), having a passage for transporting the gas across the voltage drop, the passage being packed with a porous insulating material, such as fiberglass strands (71), arranged so as to suppress glow discharge in the gas. Preferably, the insulating material is arranged so that there is very little pressure drop across the insulating member. In specific embodiments, the suppression device is used in a gas feed line (11) for supplying a sputtering gas, such as argon or a mixture of argon and nitrogen, or argon and oxygen, to a negatively charged cathode cell (12) of a sputtering machine (13), at very low absolute pressure.

摘要翻译： 用于在气体否则将倾向于支持辉光放电的条件下，抑制待跨越电压降区域（X-Y）输送的气体中的溅射辉光的方法和装置（10）。 该装置包括绝缘构件，例如塑料管（70），其具有用于将气体输送通过电压降的通道，该通道被诸如玻璃纤维束（71）的多孔绝缘材料填充，该多孔绝缘材料布置成 抑制气体中的辉光放电。 优选地，绝缘材料被布置成使得绝缘构件上的压降几乎非常小。 在具体实施例中，抑制装置用于气体供给管线（11），用于将溅射气体（例如氩气或氩气和氮气或氩气和氧气的混合物）供应到负电荷的阴极单元（12） 溅射机（13），绝对压力非常低。

公开(公告)号：US06803298B2

公开(公告)日：2004-10-12

申请号：US10455119

申请日：2003-06-04

申请人： Roman J. Hamerski ,  Gary W. Gladish

发明人： Roman J. Hamerski ,  Gary W. Gladish

IPC分类号： H01L2122

CPC分类号： H01L29/66136 ,  H01L21/02521 ,  H01L21/02532 ,  H01L21/02576 ,  H01L21/02579 ,  H01L21/0262 ,  H01L29/861 ,  Y10S257/927

摘要： A high voltage electrical device (20), having a substrate layer (22), base layer (24) and top layer (26), provides high voltage properties in excess of 1000V. Slicing a wafer (28) from an ingot (30) created in by monocrystalline growth forms the substrate layer (22), and this high quality crystal is used as the high resistivity layer in the device (20). The base layer (24) is a highly doped, low resistivity, epitaxial layer deposited on the lower surface (32) of the substrate layer (22) at a fast rate greater than approximately 2 microns/minute. The top layer (26) is a diffusion layer diffused into an upper surface (34) of the substrate layer (22). To control stress in the wafer (28), the epitaxial base is doped with germanium.

摘要翻译： 具有基底层（22），基底层（24）和顶层（26）的高压电气装置（20）提供超过1000V的高电压特性。 从通过单晶生长形成的锭（30）切片晶片（28）形成基板层（22），该高质量晶体用作器件（20）中的高电阻率层。 基极层（24）是以大于约2微米/分钟的快速速率沉积在衬底层（22）的下表面（32）上的高度掺杂的低电阻率外延层。 顶层（26）是扩散到衬底层（22）的上表面（34）中的扩散层。 为了控制晶片（28）中的应力，外延基底掺杂有锗。

公开(公告)号：US4514130A

公开(公告)日：1985-04-30

申请号：US447376

申请日：1982-12-06

申请人： Gary W. Gladish

发明人： Gary W. Gladish

IPC分类号： H01L21/67 ,  B65G25/00 ,  B65G65/02

CPC分类号： H01L21/67 ,  Y10S414/138

摘要： An improved elevator mechanism for transferring ceramic substrates between a magazine and a stepwise indexable rotatable cage in a sputtering chamber includes one or more of the following: (a) a substrate carrying tray having a round pick-up rod engageable by an elevator hook for lifting and lowering the tray into and out of the chamber, (b) a tab on the hook having formed therein a groove for receiving such pick-up rod, (c) a retaining tab on the hook for preventing separation between it and the tray in the event such rod becomes unseated in such groove, (d) an inclined plane for transferring the tray from the hook to the cage to initiate travel of the cage-held tray in the chamber as the cage progressively indexes, and (e) a lifting roller for transferring the tray at the end of such travel back to the hook.

摘要翻译： 一种改进的电梯机构，用于在溅射室中的盒和可转位转台之间转移陶瓷衬底包括以下一个或多个：（a）具有可由电梯挂钩接合的圆形拾取杆的衬底托盘，用于提升 并且将托盘放入和离开室，（b）钩上的突片，其上形成有用于接收该拾取杆的凹槽，（c）钩上的保持突片，用于防止其与托盘之间的分离 这种杆在这种凹槽中变得松脱，（d）一个倾斜平面，用于将托盘从钩子传递到保持架，以随着保持架逐渐变形而开启笼中托盘托盘移动，以及（e）提升 滚轮，用于在托盘结束时将托盘转移回钩。

公开(公告)号：US4513855A

公开(公告)日：1985-04-30

申请号：US447347

申请日：1982-12-06

申请人： Ivan M. Fletcher ,  Gary W. Gladish

发明人： Ivan M. Fletcher ,  Gary W. Gladish

IPC分类号： H01L21/67 ,  B65G25/00 ,  B65G65/02

CPC分类号： H01L21/67

摘要： The development is an improved elevator hook forming part of an elevator for transferring ceramic substrates in a tray between a magazine and a stepwise indexable rotatable cage in a sputtering chamber. The improved hook has a vertical shank, a vertical arm disposed on one side of the shank and pivotally coupled thereto, a laterally salient horizontal elevator member disposed at the lower end of the arm for supporting the tab of such a tray, a horizontal retainer member laterally and vertically opposite the elevator member and transversely offset therefrom, and a spring urging the elevator member towards the retainer member. The gap is normally small enough to prevent a tray tab dislodged from the elevator member from falling through the gap. The tray tab is placed on the elevator member by causing the gap to open up, under force from a tray lug pressed against the members at one end of the gap, to a width sufficient to permit the lug to pass laterally through the gap to its other end at which the tray tab is deposited on the elevator member. Other features are that the gap at its entrance end has a flared entrance, and that the tray tab is rounded and is seated on the elevator member in a groove of such configuration that there is developed a horizontal force component tending to retain the tab in the groove.

摘要翻译： 该发展是形成电梯的一部分的改进的电梯挂钩，用于将金属陶瓷基板传送到料仓和溅射室中的可分段转动的可转动保持架之间的托盘中。 改进的钩具有垂直柄，垂直臂设置在柄的一侧并枢转地连接到其上，横向凸起的水平升降构件设置在臂的下端，用于支撑这种托盘的突出部，水平保持构件 横向和垂直地与电梯构件相对并且横向偏移，以及弹簧将电梯构件推向保持构件。 间隙通常足够小以防止从电梯构件移开的托盘突出部通过间隙落下。 托盘突片通过使间隙在从间隙的一端处压靠在构件上的托盘凸耳的力作用下被放置在足以允许凸耳横向穿过该间隙的宽度的位置上升到其上 托盘突片沉积在电梯构件上的另一端。 其他特征是其入口端的间隙具有扩口入口，并且托盘突出部是圆形的并且在这种构造的凹槽中就座在电梯构件上，从而形成倾向于将突出部保持在其中的水平力部件 槽。