公开(公告)号：US20090246689A1

公开(公告)日：2009-10-01

申请号：US12482701

申请日：2009-06-11

Applicant: Yisong Yu ,  Brian J. Collister ,  Jonathan W. Goodin ,  Graham Darling ,  Jacqueline L. Ricafrente ,  Susan A. Wilklnson

Inventor： Yisong Yu ,  Brian J. Collister ,  Jonathan W. Goodin ,  Graham Darling ,  Jacqueline L. Ricafrente ,  Susan A. Wilklnson

IPC: G03F7/004 ,  G03F7/20

CPC classification number: B41C1/1008 ,  B41C1/1016 ,  B41C1/1041 ,  B41C2210/04 ,  B41C2210/08 ,  B41C2210/22 ,  B41C2210/24 ,  B41M5/366 ,  Y10S430/145

Abstract: A radiation-sensitive medium comprises hydrophilic polymer particles, the particles comprising a thermally softenable hydrophobic polymer, a hydrophilic polymer and a bonding compound capable of chemically bonding to the hydrophobic polymer and to the hydrophilic polymer. The radiation-sensitive medium further may comprise a substance capable of converting radiation into heat. The radiation-sensitive medium is aqueous-ineluable when coated and dried, and becomes hydrophobic under the action of heat. The polymer particles are made by polymerization of at least one hydrophobic monomer and at least one bonding compound in the presence of the hydrophilic polymer. The radiation-sensitive medium may be provided as a coatable composition to be applied to substrates to form a processless radiation-imageable lithographic printing precursor, which may further be provided with an aqueous eluable hydrophilic overcoat. The processless radiation-imageable lithographic printing precursor so created may be imaged using absorbed radiation that is imagewise converted to heat, resulting in areas of hydrophobic property, while unimaged areas retain their hydrophilic property. This allows the latent image so formed to be employed in creating a negative-working lithographic printing master. The negative-working lithographic printing master so created is irreversible, does not require a substrate of controlled hydrophilicity and provides great toughness in the exposed areas. The radiation-sensitive medium may be coated on-platesetter or on-press onto a suitable substrate, including the drum of the press. It may also be coated off-press on a suitable substrate to create a precoated processless radiation-imageable lithographic printing precursor.

Abstract translation: 辐射敏感介质包括亲水性聚合物颗粒，该颗粒包含可热软化的疏水性聚合物，亲水性聚合物和能够与疏水性聚合物和亲水性聚合物化学键合的键合化合物。 辐射敏感介质还可以包括能够将辐射转换成热量的物质。 辐射敏感介质在涂覆和干燥时是水溶性的，并且在加热作用下变得疏水。 聚合物颗粒通过至少一种疏水单体和至少一种键合化合物在亲水性聚合物的存在下聚合而制成。 辐射敏感介质可以作为可涂覆组合物提供以施加到基底上以形成无加工的可辐射成像的平版印刷前体，其可以进一步设置水性可洗脱的亲水外涂层。 可以使用被成像转换为热量的吸收的辐射成像如此产生的无处理的可放射成像的平版印刷前体，导致疏水性的区域，而未成像的区域保持其亲水性。 这样可以使得如此形成的潜像用于产生负性平版印刷母版。 这样产生的负性平版印刷印刷主体是不可逆的，不需要受控亲水性的基材，并且在曝光区域中提供很大的韧性。 辐射敏感介质可以在制版机上或印刷机上涂覆到合适的基材上，包括印刷机的滚筒。 它也可以在合适的基底上涂布，以产生预涂无处理的可辐射成像的平版印刷前体。

公开(公告)号：US06069209A

公开(公告)日：2000-05-30

申请号：US857651

申请日：1997-05-16

Applicant: Graham Darling ,  Lise Hubbard

Inventor： Graham Darling ,  Lise Hubbard

IPC: C02F1/62 ,  C08F8/34 ,  C08F212/36 ,  C22B3/44

CPC classification number: C22B7/006 ,  B01J20/3251 ,  B01J20/3255 ,  B01J45/00 ,  C08F112/14 ,  C08F112/36 ,  C08F8/30 ,  C08F8/34 ,  C22B3/24 ,  C02F1/683 ,  C02F2101/20 ,  C02F2103/10 ,  Y02P10/234

Abstract: Chelating resins for use in selectively binding heavy metals, having the structure ##STR1## where Ps represents a poly(divinylbenzene), and R represents an organic radical containing at least one N and/or S atoms but not a C--OH group, that is bound to the S atom. The preparation of these chelating resins is also disclosed.

Abstract translation: 用于选择性结合重金属的螯合树脂，其具有Ps表示聚（二乙烯基苯）的结构，R表示含有至少一个N和/或S原子而不是C-OH基团的有机基团，其结合 S原子。 还公开了这些螯合树脂的制备。

公开(公告)号：US20060292486A1

公开(公告)日：2006-12-28

申请号：US11181039

申请日：2005-07-13

Applicant: Yisong Yu ,  Brian Collister ,  Jonathan Goodin ,  Graham Darling ,  Jacqueline Ricafrente ,  Susan Wilkinson

Inventor： Yisong Yu ,  Brian Collister ,  Jonathan Goodin ,  Graham Darling ,  Jacqueline Ricafrente ,  Susan Wilkinson

IPC: G03C1/00

CPC classification number: B41C1/1008 ,  B41C1/1016 ,  B41C1/1041 ,  B41C2210/04 ,  B41C2210/08 ,  B41C2210/22 ,  B41C2210/24 ,  B41M5/366 ,  Y10S430/145

Abstract: A radiation-sensitive medium comprises hydrophilic polymer particles, the particles comprising a thermally softenable hydrophobic polymer, a hydrophilic polymer and a bonding compound capable of chemically bonding to the hydrophobic polymer and to the hydrophilic polymer. The radiation-sensitive medium further may comprise a substance capable of converting radiation into heat. The radiation-sensitive medium is aqueous-ineluable when coated and dried, and becomes hydrophobic under the action of heat. The polymer particles are made by polymerization of at least one hydrophobic monomer and at least one bonding compound in the presence of the hydrophilic polymer. The radiation-sensitive medium may be provided as a coatable composition to be applied to substrates to form a processless radiation-imageable lithographic printing precursor, which may further be provided with an aqueous eluable hydrophilic overcoat. The processless radiation-imageable lithographic printing precursor so created may be imaged using absorbed radiation that is imagewise converted to heat, resulting in areas of hydrophobic property, while unimaged areas retain their hydrophilic property. This allows the latent image so formed to be employed in creating a negative-working lithographic printing master. The negative-working lithographic printing master so created is irreversible, does not require a substrate of controlled hydrophilicity and provides great toughness in the exposed areas. The radiation-sensitive medium may be coated on-platesetter or on-press onto a suitable substrate, including the drum of the press. It may also be coated off-press on a suitable substrate to create a precoated processless radiation-imageable lithographic printing precursor.

公开(公告)号：US07579133B2

公开(公告)日：2009-08-25

申请号：US11181039

申请日：2005-07-13

Applicant: Yisong Yu ,  Brian J. Collister ,  Jonathan W. Goodin ,  Graham Darling ,  Jacqueline L. Ricafrente ,  Susan A. Wilkinson

Inventor： Yisong Yu ,  Brian J. Collister ,  Jonathan W. Goodin ,  Graham Darling ,  Jacqueline L. Ricafrente ,  Susan A. Wilkinson

IPC: G03F7/038 ,  G03F7/09 ,  G03F7/11 ,  G03C1/76

CPC classification number: B41C1/1008 ,  B41C1/1016 ,  B41C1/1041 ,  B41C2210/04 ,  B41C2210/08 ,  B41C2210/22 ,  B41C2210/24 ,  B41M5/366 ,  Y10S430/145

Abstract: A radiation-sensitive medium comprises hydrophilic polymer particles, the particles comprising a thermally softenable hydrophobic polymer, a hydrophilic polymer and a bonding compound capable of chemically bonding to the hydrophobic polymer and to the hydrophilic polymer. The radiation-sensitive medium further may comprise a substance capable of converting radiation into heat. The radiation-sensitive medium is aqueous-ineluable when coated and dried, and becomes hydrophobic under the action of heat. The polymer particles are made by polymerization of at least one hydrophobic monomer and at least one bonding compound in the presence of the hydrophilic polymer. The radiation-sensitive medium may be provided as a coatable composition to be applied to substrates to form a processless radiation-imageable lithographic printing precursor, which may further be provided with an aqueous eluable hydrophilic overcoat. The processless radiation-imageable lithographic printing precursor so created may be imaged using absorbed radiation that is imagewise converted to heat, resulting in areas of hydrophobic property, while unimaged areas retain their hydrophilic property. This allows the latent image so formed to be employed in creating a negative-working lithographic printing master. The negative-working lithographic printing master so created is irreversible, does not require a substrate of controlled hydrophilicity and provides great toughness in the exposed areas. The radiation-sensitive medium may be coated on-platesetter or on-press onto a suitable substrate, including the drum of the press. It may also be coated off-press on a suitable substrate to create a precoated processless radiation-imageable lithographic printing precursor.

Abstract translation: 辐射敏感介质包括亲水性聚合物颗粒，该颗粒包含可热软化的疏水性聚合物，亲水性聚合物和能够与疏水性聚合物和亲水性聚合物化学键合的键合化合物。 辐射敏感介质还可以包括能够将辐射转换成热量的物质。 辐射敏感介质在涂覆和干燥时是水溶性的，并且在加热作用下变得疏水。 聚合物颗粒通过至少一种疏水单体和至少一种键合化合物在亲水性聚合物的存在下聚合而制成。 辐射敏感介质可以作为可涂覆组合物提供以施加到基底上以形成无加工的可辐射成像的平版印刷前体，其可以进一步设置水性可洗脱的亲水外涂层。 可以使用被成像转换为热量的吸收的辐射成像如此产生的无处理的可放射成像的平版印刷前体，导致疏水性的区域，而未成像的区域保持其亲水性。 这样可以使得如此形成的潜像用于产生负性平版印刷母版。 这样产生的负性平版印刷印刷主体是不可逆的，不需要受控亲水性的基材，并且在曝光区域中提供很大的韧性。 辐射敏感介质可以在制版机上或印刷机上涂覆到合适的基材上，包括印刷机的滚筒。 它也可以在合适的基底上涂布，以产生预涂无处理的可辐射成像的平版印刷前体。

公开(公告)号：US20080070163A1

公开(公告)日：2008-03-20

申请号：US11854596

申请日：2007-09-13

Applicant: Yisong Yu ,  Brian Collister ,  Jonathan Goodin ,  Graham Darling ,  Jacqueline Ricafrente ,  Susan Wilkinson

Inventor： Yisong Yu ,  Brian Collister ,  Jonathan Goodin ,  Graham Darling ,  Jacqueline Ricafrente ,  Susan Wilkinson

IPC: G03F7/12

CPC classification number: B41C1/1008 ,  B41C1/1016 ,  B41C1/1041 ,  B41C2210/04 ,  B41C2210/08 ,  B41C2210/22 ,  B41C2210/24 ,  B41M5/366 ,  Y10S430/145

Abstract: A radiation-sensitive medium comprises hydrophilic polymer particles, the particles comprising a thermally softenable hydrophobic polymer, a hydrophilic polymer and a bonding compound capable of chemically bonding to the hydrophobic polymer and to the hydrophilic polymer. The radiation-sensitive medium further may comprise a substance capable of converting radiation into heat. The radiation-sensitive medium is aqueous-ineluable when coated and dried, and becomes hydrophobic under the action of heat. The polymer particles are made by polymerization of at least one hydrophobic monomer and at least one bonding compound in the presence of the hydrophilic polymer. The radiation-sensitive medium may be provided as a coatable composition to be applied to substrates to form a processless radiation-imageable lithographic printing precursor, which may further be provided with an aqueous eluable hydrophilic overcoat. The processless radiation-imageable lithographic printing precursor so created may be imaged using absorbed radiation that is imagewise converted to heat, resulting in areas of hydrophobic property, while unimaged areas retain their hydrophilic property. This allows the latent image so formed to be employed in creating a negative-working lithographic printing master. The negative-working lithographic printing master so created is irreversible, does not require a substrate of controlled hydrophilicity and provides great toughness in the exposed areas. The radiation-sensitive medium may be coated on-platesetter or on-press onto a suitable substrate, including the drum of the press. It may also be coated off-press on a suitable substrate to create a precoated processless radiation-imageable lithographic printing precursor.

Abstract translation: 辐射敏感介质包括亲水性聚合物颗粒，该颗粒包含可热软化的疏水性聚合物，亲水性聚合物和能够与疏水性聚合物和亲水性聚合物化学键合的键合化合物。 辐射敏感介质还可以包括能够将辐射转换成热量的物质。 辐射敏感介质在涂覆和干燥时是水溶性的，并且在加热作用下变得疏水。 聚合物颗粒通过至少一种疏水单体和至少一种键合化合物在亲水性聚合物的存在下聚合而制成。 辐射敏感介质可以作为可涂覆组合物提供以施加到基底上以形成无加工的可辐射成像的平版印刷前体，其可以进一步设置水性可洗脱的亲水外涂层。 可以使用被成像转换为热量的吸收的辐射成像如此产生的无处理的可放射成像的平版印刷前体，导致疏水性的区域，而未成像的区域保持其亲水性。 这样可以使得如此形成的潜像用于产生负性平版印刷母版。 这样产生的负性平版印刷印刷主体是不可逆的，不需要受控亲水性的基材，并且在曝光区域中提供很大的韧性。 辐射敏感介质可以在制版机上或印刷机上涂覆到合适的基材上，包括印刷机的滚筒。 它也可以在合适的基底上涂布，以产生预涂无处理的可辐射成像的平版印刷前体。

公开(公告)号：US07323288B2

公开(公告)日：2008-01-29

申请号：US10647913

申请日：2003-08-25

Applicant: Yisong Yu ,  Brian J. Collister ,  Jonathan W. Goodin ,  Graham Darling ,  Jacqueline L. Ricafrente

Inventor： Yisong Yu ,  Brian J. Collister ,  Jonathan W. Goodin ,  Graham Darling ,  Jacqueline L. Ricafrente

IPC: G03C1/77 ,  G03F7/038 ,  G03F7/09

CPC classification number: B41C1/1008 ,  B41C1/1016 ,  B41C1/1041 ,  B41C2210/04 ,  B41C2210/08 ,  B41C2210/22 ,  B41C2210/24 ,  B41M5/366 ,  Y10S430/145

Abstract: A radiation-sensitive medium comprises hydrophilic polymer particles, the particles comprising a thermally softenable hydrophobic polymer, a hydrophilic polymer and a bonding compound capable of chemically bonding to the hydrophobic polymer and to the hydrophilic polymer. Th radiation-sensitive medium further may comprise a substance capable of converting radiation into heat. The radiation-sensitive medium is aqueous-ineluable when coated and dried, and becomes hydrophobic under the action of heat. The polymer particles are made by polymerization of at least one hydrophobic monomer and at least one bonding compound in the presence of the hydrophilic polymer. The radiation-sensitive medium may be provided as a coatable composition to be applied to substrates to form a processless radiation-imageable lithographic printing precursor. The processless radiation-imageable lithographic printing precursor so created may be imaged using absorbed radiation that is imagewise converted to heat, resulting in areas of hydrophobic property, while unimaged areas retain their hydrophilic property. This allows the latent image so formed to be employed in creating a negative-working lithographic printing master. The negative-working lithographic printing master so created is irreversible, does not require a substrate of controlled hydrophilicity and provides great toughness in the exposed areas. The radiation-sensitive medium may be coated on-platesetter or on-press onto a suitable substrate, including the drum of the press. It may also be coated off-press on a suitable substrate to create a precoated processless radiation-imageable lithographic printing precursor.

Abstract translation: 辐射敏感介质包括亲水性聚合物颗粒，该颗粒包含可热软化的疏水性聚合物，亲水性聚合物和能够与疏水性聚合物和亲水性聚合物化学键合的键合化合物。 辐射敏感介质还可以包括能够将辐射转换成热量的物质。 辐射敏感介质在涂覆和干燥时是水溶性的，并且在加热作用下变得疏水。 聚合物颗粒通过至少一种疏水单体和至少一种键合化合物在亲水性聚合物的存在下聚合而制成。 辐射敏感介质可以作为可涂覆组合物提供以施加到基底以形成无加工的可辐射成像的平版印刷前体。 可以使用被成像转换为热量的吸收的辐射成像如此产生的无处理的可放射成像的平版印刷前体，导致疏水性的区域，而未成像的区域保持其亲水性。 这样可以使得如此形成的潜像用于产生负性平版印刷母版。 这样产生的负性平版印刷印刷主体是不可逆的，不需要受控亲水性的基材，并且在曝光区域中提供很大的韧性。 辐射敏感介质可以在制版机上或印刷机上涂覆到合适的基材上，包括印刷机的滚筒。 它也可以在合适的基底上涂布，以产生预涂无处理的可辐射成像的平版印刷前体。