公开(公告)号：US20050032000A1

公开(公告)日：2005-02-10

申请号：US10940696

申请日：2004-09-14

Applicant: Jonathan Goodin

Inventor： Jonathan Goodin

IPC: B41C1/055 ,  G03C5/00

CPC classification number: B41C1/055 ,  Y10S430/146

Abstract: A gravure printing element is fabricated using a negative-working thermally-imageable coating that is exposed using commercially available diode lasers, the coating being insensitive to ultraviolet light, daylight or visible light, and developable using aqueous media. A gravure etch mask is formed on a printing precursor by applying a coating of thermally-imageable material, curing the coating, imagewise illuminating the cured coating with a laser and removing with a developer the areas of the coating that were not illuminated. The masked precursor is then chemically etched to produce a gravure printing element.

公开(公告)号：US20080070163A1

公开(公告)日：2008-03-20

申请号：US11854596

申请日：2007-09-13

Applicant: Yisong Yu ,  Brian Collister ,  Jonathan Goodin ,  Graham Darling ,  Jacqueline Ricafrente ,  Susan Wilkinson

Inventor： Yisong Yu ,  Brian Collister ,  Jonathan Goodin ,  Graham Darling ,  Jacqueline Ricafrente ,  Susan Wilkinson

IPC: G03F7/12

CPC classification number: B41C1/1008 ,  B41C1/1016 ,  B41C1/1041 ,  B41C2210/04 ,  B41C2210/08 ,  B41C2210/22 ,  B41C2210/24 ,  B41M5/366 ,  Y10S430/145

Abstract: A radiation-sensitive medium comprises hydrophilic polymer particles, the particles comprising a thermally softenable hydrophobic polymer, a hydrophilic polymer and a bonding compound capable of chemically bonding to the hydrophobic polymer and to the hydrophilic polymer. The radiation-sensitive medium further may comprise a substance capable of converting radiation into heat. The radiation-sensitive medium is aqueous-ineluable when coated and dried, and becomes hydrophobic under the action of heat. The polymer particles are made by polymerization of at least one hydrophobic monomer and at least one bonding compound in the presence of the hydrophilic polymer. The radiation-sensitive medium may be provided as a coatable composition to be applied to substrates to form a processless radiation-imageable lithographic printing precursor, which may further be provided with an aqueous eluable hydrophilic overcoat. The processless radiation-imageable lithographic printing precursor so created may be imaged using absorbed radiation that is imagewise converted to heat, resulting in areas of hydrophobic property, while unimaged areas retain their hydrophilic property. This allows the latent image so formed to be employed in creating a negative-working lithographic printing master. The negative-working lithographic printing master so created is irreversible, does not require a substrate of controlled hydrophilicity and provides great toughness in the exposed areas. The radiation-sensitive medium may be coated on-platesetter or on-press onto a suitable substrate, including the drum of the press. It may also be coated off-press on a suitable substrate to create a precoated processless radiation-imageable lithographic printing precursor.

Abstract translation: 辐射敏感介质包括亲水性聚合物颗粒，该颗粒包含可热软化的疏水性聚合物，亲水性聚合物和能够与疏水性聚合物和亲水性聚合物化学键合的键合化合物。 辐射敏感介质还可以包括能够将辐射转换成热量的物质。 辐射敏感介质在涂覆和干燥时是水溶性的，并且在加热作用下变得疏水。 聚合物颗粒通过至少一种疏水单体和至少一种键合化合物在亲水性聚合物的存在下聚合而制成。 辐射敏感介质可以作为可涂覆组合物提供以施加到基底上以形成无加工的可辐射成像的平版印刷前体，其可以进一步设置水性可洗脱的亲水外涂层。 可以使用被成像转换为热量的吸收的辐射成像如此产生的无处理的可放射成像的平版印刷前体，导致疏水性的区域，而未成像的区域保持其亲水性。 这样可以使得如此形成的潜像用于产生负性平版印刷母版。 这样产生的负性平版印刷印刷主体是不可逆的，不需要受控亲水性的基材，并且在曝光区域中提供很大的韧性。 辐射敏感介质可以在制版机上或印刷机上涂覆到合适的基材上，包括印刷机的滚筒。 它也可以在合适的基底上涂布，以产生预涂无处理的可辐射成像的平版印刷前体。

公开(公告)号：US07723013B2

公开(公告)日：2010-05-25

申请号：US12008308

申请日：2008-01-09

Applicant: Jonathan Goodin

Inventor： Jonathan Goodin

IPC: G03C1/00

CPC classification number: B41C1/1008 ,  B41C2210/04 ,  B41C2210/06 ,  B41C2210/20 ,  B41C2210/22 ,  B41C2210/24

Abstract: A negative-acting photolithographic printing plate precursor has a unique negative-acting photosensitive composition on a surface. The photosensitive composition contains an acetal polymer, an infrared absorbing dye or pigment, a crosslinking agent for the acetal resin and a photosensitive chemical acid progenitor, and the acetal polymer has within its backbone a structure comprising a particular polymeric moiety derived from a polyvinyl alcohol backbone.

Abstract translation: 负面作用的光刻印刷版前体在表面上具有独特的负性光敏组合物。 光敏组合物包含缩醛聚合物，红外吸收染料或颜料，用于缩醛树脂的交联剂和光敏化学酸性祖细胞，缩醛聚合物在其主链内具有包含衍生自聚乙烯醇骨架的特定聚合物部分的结构 。

公开(公告)号：US20080171288A1

公开(公告)日：2008-07-17

申请号：US12008308

申请日：2008-01-09

Applicant: Jonathan Goodin

Inventor： Jonathan Goodin

IPC: G03F7/004 ,  G03F7/12

CPC classification number: B41C1/1008 ,  B41C2210/04 ,  B41C2210/06 ,  B41C2210/20 ,  B41C2210/22 ,  B41C2210/24

Abstract: A negative-acting photolithographic printing plate precursor has a unique negative-acting photosensitive composition on a surface. The photosensitive composition contains an acetal polymer, an infrared absorbing dye or pigment, a crosslinking agent for the acetal resin and a photosensitive chemical acid progenitor, and the acetal polymer has within its backbone a structure comprising a particular polymeric moiety derived from a polyvinyl alcohol backbone.

Abstract translation: 负面作用的光刻印刷版前体在表面上具有独特的负性光敏组合物。 光敏组合物包含缩醛聚合物，红外吸收染料或颜料，用于缩醛树脂的交联剂和光敏化学酸性祖细胞，缩醛聚合物在其主链内具有包含衍生自聚乙烯醇骨架的特定聚合物部分的结构 。

公开(公告)号：US20050003296A1

公开(公告)日：2005-01-06

申请号：US10800133

申请日：2004-03-12

Applicant: Livia Memetea ,  Juana Jaramillo ,  Nicholas Bradford ,  Jonathan Goodin ,  Cheng Yang ,  Moshe Levanon

Inventor： Livia Memetea ,  Juana Jaramillo ,  Nicholas Bradford ,  Jonathan Goodin ,  Cheng Yang ,  Moshe Levanon

IPC: G03C1/76

CPC classification number: B41C1/1008 ,  B41C2210/02 ,  B41C2210/06 ,  B41C2210/22 ,  B41C2210/24 ,  B41M5/368

Abstract: A positive-working radiation-sensitive composition for use with a radiation source comprises one or more polivinyl acetal polymers capable of being dissolved in an alkaline aqueous solution and a development-enhancing compound. The sensitivity of a radiation-sensitive coating based on the composition of this invention is increased without compromising the handling characteristics. Radiation-sensitive elements based on the composition of the invention have good development latitude. A positive-working lithographic printing precursor is based on the radiation-sensitive composition coated on a hydrophilic surface. The precursor is developable using an alkaline aqueous solution, and may be used with a radiation source in lithographic applications, such as conventional imaging systems, computer-to-plate systems or other direct imaging applications. The precursor is stable in its state before exposure and has an excellent handling property.

Abstract translation: 用于辐射源的正性辐射敏感组合物包含一种或多种能够溶解在碱性水溶液和显影增强化合物中的聚乙烯基缩醛聚合物。 基于本发明组合物的辐射敏感性涂层的灵敏度增加而不损害处理特性。 基于本发明组合的辐射敏感元件具有良好的开发自由度。 正性平版印刷前体基于涂覆在亲水表面上的辐射敏感组合物。 该前体可使用碱性水溶液显影，并且可以与光刻应用中的辐射源一起使用，例如常规成像系统，计算机对板系统或其它直接成像应用。 前体在其暴露前的状态下是稳定的，并且具有优异的处理性能。

公开(公告)号：US20060292486A1

公开(公告)日：2006-12-28

申请号：US11181039

申请日：2005-07-13

Applicant: Yisong Yu ,  Brian Collister ,  Jonathan Goodin ,  Graham Darling ,  Jacqueline Ricafrente ,  Susan Wilkinson

Inventor： Yisong Yu ,  Brian Collister ,  Jonathan Goodin ,  Graham Darling ,  Jacqueline Ricafrente ,  Susan Wilkinson

IPC: G03C1/00

CPC classification number: B41C1/1008 ,  B41C1/1016 ,  B41C1/1041 ,  B41C2210/04 ,  B41C2210/08 ,  B41C2210/22 ,  B41C2210/24 ,  B41M5/366 ,  Y10S430/145

Abstract: A radiation-sensitive medium comprises hydrophilic polymer particles, the particles comprising a thermally softenable hydrophobic polymer, a hydrophilic polymer and a bonding compound capable of chemically bonding to the hydrophobic polymer and to the hydrophilic polymer. The radiation-sensitive medium further may comprise a substance capable of converting radiation into heat. The radiation-sensitive medium is aqueous-ineluable when coated and dried, and becomes hydrophobic under the action of heat. The polymer particles are made by polymerization of at least one hydrophobic monomer and at least one bonding compound in the presence of the hydrophilic polymer. The radiation-sensitive medium may be provided as a coatable composition to be applied to substrates to form a processless radiation-imageable lithographic printing precursor, which may further be provided with an aqueous eluable hydrophilic overcoat. The processless radiation-imageable lithographic printing precursor so created may be imaged using absorbed radiation that is imagewise converted to heat, resulting in areas of hydrophobic property, while unimaged areas retain their hydrophilic property. This allows the latent image so formed to be employed in creating a negative-working lithographic printing master. The negative-working lithographic printing master so created is irreversible, does not require a substrate of controlled hydrophilicity and provides great toughness in the exposed areas. The radiation-sensitive medium may be coated on-platesetter or on-press onto a suitable substrate, including the drum of the press. It may also be coated off-press on a suitable substrate to create a precoated processless radiation-imageable lithographic printing precursor.

公开(公告)号：US20050287468A1

公开(公告)日：2005-12-29

申请号：US11157204

申请日：2005-06-20

Applicant: Jonathan Goodin

Inventor： Jonathan Goodin

IPC: B41C1/10 ,  B41M5/36 ,  G03C1/492

CPC classification number: G03F7/0392 ,  B41C1/1008 ,  B41C2210/02 ,  B41C2210/06 ,  B41C2210/20 ,  B41C2210/22 ,  B41C2210/24 ,  B41M5/368 ,  C08K5/235 ,  G03F7/0233 ,  C08L29/14

Abstract: A positive-working radiation-sensitive composition for use with a radiation source comprises one or more polymers capable of being eluted in an alkaline aqueous solution and a development-enhancing compound. The invention provides a positive-working photosensitive composition of good sensitivity for use with one or both of ultra-violet radiation and an infrared laser radiation source. The composition is stable in its state before exposure and has an excellent handling property. The sensitivity of a radiation-sensitive coating based on the composition of this invention is increased without compromising the handling characteristics. Radiation-sensitive elements based on the composition of the invention have good development latitude. A positive-working lithographic printing precursor is based on the radiation-sensitive composition coated on a hydrophilic surface. The precursor is developable using an alkaline aqueous solution, and may be used with a radiation source in lithographic applications, such as conventional imaging systems, computer-to-plate systems or other direct imaging applications. The precursor is stable in its state before exposure and has an excellent handling property.

Abstract translation: 用于辐射源的正性辐射敏感组合物包含一种或多种能够在碱性水溶液和显影增强化合物中洗脱的聚合物。 本发明提供了用于紫外线辐射和红外激光辐射源中的一种或两种的良好灵敏度的正性感光组合物。 组合物在曝光前状态稳定，处理性能优异。 基于本发明组合物的辐射敏感性涂层的灵敏度增加而不损害处理特性。 基于本发明组合的辐射敏感元件具有良好的开发自由度。 正性平版印刷前体基于涂覆在亲水表面上的辐射敏感组合物。 该前体可使用碱性水溶液显影，并且可以与光刻应用中的辐射源一起使用，例如常规成像系统，计算机对板系统或其它直接成像应用。 前体在其暴露前的状态下是稳定的，并且具有优异的处理性能。