DEPOSITION PROCESS
    2.
    发明申请
    DEPOSITION PROCESS 审中-公开
    沉积过程

    公开(公告)号:US20110287178A1

    公开(公告)日:2011-11-24

    申请号:US12452150

    申请日:2008-07-04

    IPC分类号: B05D5/06

    摘要: Anti reflective silica coatings are deposited on the glass ribbon produced during a float glass or a rolled glass production process using a flame pyrolysis deposition process which is preferably a combustion chemical vapour deposition process. The temperature of the ribbon is greater than 200° C. The process may be carried out in the gap between the float bath or rollers and the annealing lehr. The durability of the coating may be increased by sintering. The equipment preferably comprises an extraction unit positioned adjacent to each burner head. In a further embodiment additional oxygen is introduced to the vapour deposition process in order produce a coating having a lower effective refractive index.

    摘要翻译: 防反射二氧化硅涂层沉积在使用火焰热解沉积工艺(最好是燃烧化学气相沉积工艺)的浮法玻璃或轧制玻璃生产过程中产生的玻璃带上。 带的温度大于200℃。该过程可以在浮浴或辊之间的间隙和退火炉中进行。 通过烧结可以提高涂层的耐久性。 该设备优选地包括与每个燃烧器头相邻设置的提取单元。 在另外的实施方案中,将额外的氧气引入到气相沉积工艺中,以便产生具有较低有效折射率的涂层。