公开(公告)号：US07933026B2

公开(公告)日：2011-04-26

申请号：US12486830

申请日：2009-06-18

申请人： Jon Opsal ,  Ilya Grodnensky ,  Heath Pois

发明人： Jon Opsal ,  Ilya Grodnensky ,  Heath Pois

IPC分类号： G01B11/14 ,  G01N21/00

CPC分类号： G01B11/0641

摘要： An optical metrology method is disclosed for evaluating the uniformity of characteristics within a semiconductor region having repeating features such a memory die. The method includes obtaining measurements with a probe laser beam having a spot size on the order of micron. These measurements are compared to calibration information obtained from calibration measurements. The calibration information is derived by measuring calibration samples with the probe laser beam and at least one other technology having added information content. In the preferred embodiment, the other technology includes at least one of spectroscopic reflectometry or spectroscopic ellipsometry.

公开(公告)号：US20110205554A1

公开(公告)日：2011-08-25

申请号：US13073850

申请日：2011-03-28

申请人： Jon OPSAL ,  Ilya Grodnensky ,  Heath Pois

发明人： Jon OPSAL ,  Ilya Grodnensky ,  Heath Pois

IPC分类号： G01B11/14

CPC分类号： G01B11/0641

摘要： An optical metrology method is disclosed for evaluating the uniformity of characteristics within a semiconductor region having repeating features such a memory die. The method includes obtaining measurements with a probe laser beam having a spot size on the order of micron. These measurements are compared to calibration information obtained from calibration measurements. The calibration information is derived by measuring calibration samples with the probe laser beam and at least one other technology having added information content. In the preferred embodiment, the other technology includes at least one of spectroscopic reflectometry or spectroscopic ellipsometry.

摘要翻译： 公开了一种光学测量方法，用于评估具有重复特征的半导体区域内的特性的均匀性，例如存储管芯。 该方法包括用具有微米数量级的光斑尺寸的探针激光束获得测量值。 将这些测量与从校准测量获得的校准信息进行比较。 校准信息是通过用探头激光束测量校准样品和至少一种具有添加信息内容的其他技术得出的。 在优选实施例中，其它技术包括光谱反射测量或光谱椭偏仪中的至少一种。

公开(公告)号：US07567351B2

公开(公告)日：2009-07-28

申请号：US11657359

申请日：2007-01-24

申请人： Jon Opsal ,  Ilya Grodnensky ,  Heath Pois

发明人： Jon Opsal ,  Ilya Grodnensky ,  Heath Pois

IPC分类号： G01B11/14 ,  G01N21/00

CPC分类号： G01B11/0641

摘要： An optical metrology method is disclosed for evaluating the uniformity of characteristics within a semiconductor region having repeating features such a memory die. The method includes obtaining measurements with a probe laser beam having a spot size on the order of micron. These measurements are compared to calibration information obtained from calibration measurements. The calibration information is derived by measuring calibration samples with the probe laser beam and at least one other technology having added information content. In the preferred embodiment, the other technology includes at least one of spectroscopic reflectometry or spectroscopic ellipsometry.

摘要翻译： 公开了一种光学测量方法，用于评估具有重复特征的半导体区域内的特性的均匀性，例如存储管芯。 该方法包括用具有微米数量级的光斑尺寸的探针激光束获得测量值。 将这些测量与从校准测量获得的校准信息进行比较。 校准信息是通过用探头激光束测量校准样品和至少一种具有添加信息内容的其他技术得出的。 在优选实施例中，其它技术包括光谱反射测量或光谱椭偏仪中的至少一种。

公开(公告)号：US07478019B2

公开(公告)日：2009-01-13

申请号：US11043196

申请日：2005-01-26

申请人： Shahin Zangooie ,  Youxian Wen ,  Heath Pois ,  Jon Opsal

发明人： Shahin Zangooie ,  Youxian Wen ,  Heath Pois ,  Jon Opsal

IPC分类号： G06F17/10

CPC分类号： G01B11/0625 ,  G05B13/024 ,  G05B15/02

摘要： Measurement data sets for optical metrology systems can be processed in parallel using Multiple Tool and Structure Analysis (MTSA). In an MTSA procedure, at least one parameter that is common to the data sets can be coupled as a global parameter. Setting this parameter as global allows a regression on each data set to contain fewer fitting parameters, making the process is less complex, requiring less processing capacity, and providing more accurate results. MTSA can analyze multiple structures measured on a single tool, or a single structure measured on separate tools. For a multiple tool recipe, a minimized regression solution can be applied back to each tool to determine whether the recipe is optimized. If the recipe does not provide accurate results for each tool, search parameters and/or spaces can be modified in an iterative manner until an optimized solution is obtained that provides acceptable solutions on each tool.

摘要翻译： 光学测量系统的测量数据集可以使用多工具和结构分析（MTSA）并行处理。 在MTSA过程中，数据集共有的至少一个参数可以作为全局参数进行耦合。 将此参数设置为全局允许每个数据集的回归包含较少的拟合参数，使得该过程不太复杂，需要较少的处理能力，并提供更准确的结果。 MTSA可以分析在单个工具上测量的多个结构，或分析在单独工具上测量的单个结构。 对于多重工具配方，可以将最小化回归解决方案应用回每个工具以确定配方是否被优化。 如果配方不能为每个工具提供准确的结果，则可以以迭代的方式修改搜索参数和/或空格，直到获得优化的解决方案，为每个工具提供可接受的解决方案。

公开(公告)号：US20060167651A1

公开(公告)日：2006-07-27

申请号：US11043196

申请日：2005-01-26

申请人： Shahin Zangooie ,  Youxian Wen ,  Heath Pois ,  Jon Opsal

发明人： Shahin Zangooie ,  Youxian Wen ,  Heath Pois ,  Jon Opsal

IPC分类号： G06F17/18

CPC分类号： G01B11/0625 ,  G05B13/024 ,  G05B15/02

摘要： Measurement data sets for optical metrology systems can be processed in parallel using Multiple Tool and Structure Analysis (MTSA). In an MTSA procedure, at least one parameter that is common to the data sets can be coupled as a global parameter. Setting this parameter as global allows a regression on each data set to contain fewer fitting parameters, making the process is less complex, requiring less processing capacity, and providing more accurate results. MTSA can analyze multiple structures measured on a single tool, or a single structure measured on separate tools. For a multiple tool recipe, a minimized regression solution can be applied back to each tool to determine whether the recipe is optimized. If the recipe does not provide accurate results for each tool, search parameters and/or spaces can be modified in an iterative manner until an optimized solution is obtained that provides acceptable solutions on each tool.

公开(公告)号：US08049903B2

公开(公告)日：2011-11-01

申请号：US13073850

申请日：2011-03-28

申请人： Jon Opsal ,  Ilya Grodnensky ,  Heath Pois

发明人： Jon Opsal ,  Ilya Grodnensky ,  Heath Pois

IPC分类号： G01B11/14 ,  G01N21/00

CPC分类号： G01B11/0641

摘要： An optical metrology method is disclosed for evaluating the uniformity of characteristics within a semiconductor region having repeating features such a memory die. The method includes obtaining measurements with a probe laser beam having a spot size on the order of micron. These measurements are compared to calibration information obtained from calibration measurements. The calibration information is derived by measuring calibration samples with the probe laser beam and at least one other technology having added information content. In the preferred embodiment, the other technology includes at least one of spectroscopic reflectometry or spectroscopic ellipsometry.

摘要翻译： 公开了一种光学测量方法，用于评估具有重复特征的半导体区域内的特性的均匀性，例如存储管芯。 该方法包括用具有微米数量级的光斑尺寸的探针激光束获得测量值。 将这些测量与从校准测量获得的校准信息进行比较。 校准信息是通过用探头激光束测量校准样品和至少一种具有添加信息内容的其他技术得出的。 在优选实施例中，其它技术包括光谱反射测量或光谱椭偏仪中的至少一种。

公开(公告)号：US20090259605A1

公开(公告)日：2009-10-15

申请号：US12486830

申请日：2009-06-18

申请人： Jon Opsal ,  Ilya Grodnensky ,  Heath Pois

发明人： Jon Opsal ,  Ilya Grodnensky ,  Heath Pois

IPC分类号： G06N3/02

CPC分类号： G01B11/0641

摘要： An optical metrology method is disclosed for evaluating the uniformity of characteristics within a semiconductor region having repeating features such a memory die. The method includes obtaining measurements with a probe laser beam having a spot size on the order of micron. These measurements are compared to calibration information obtained from calibration measurements. The calibration information is derived by measuring calibration samples with the probe laser beam and at least one other technology having added information content. In the preferred embodiment, the other technology includes at least one of spectroscopic reflectometry or spectroscopic ellipsometry.

摘要翻译： 公开了一种光学测量方法，用于评估具有重复特征的半导体区域内的特性的均匀性，例如存储管芯。 该方法包括用具有微米数量级的光斑尺寸的探针激光束获得测量值。 将这些测量与从校准测量获得的校准信息进行比较。 校准信息是通过用探头激光束测量校准样品和至少一种具有添加信息内容的其他技术得出的。 在优选实施例中，其它技术包括光谱反射测量或光谱椭偏仪中的至少一种。

公开(公告)号：US20070201017A1

公开(公告)日：2007-08-30

申请号：US11657359

申请日：2007-01-24

申请人： Jon Opsal ,  Ilya Grodnensky ,  Heath Pois

发明人： Jon Opsal ,  Ilya Grodnensky ,  Heath Pois

IPC分类号： G01N21/88 ,  G01J4/00 ,  G01N21/55

CPC分类号： G01B11/0641

摘要： An optical metrology method is disclosed for evaluating the uniformity of characteristics within a semiconductor region having repeating features such a memory die. The method includes obtaining measurements with a probe laser beam having a spot size on the order of micron. These measurements are compared to calibration information obtained from calibration measurements. The calibration information is derived by measuring calibration samples with the probe laser beam and at least one other technology having added information content. In the preferred embodiment, the other technology includes at least one of spectroscopic reflectometry or spectroscopic ellipsometry.

摘要翻译： 公开了一种光学测量方法，用于评估具有重复特征的半导体区域内的特性的均匀性，例如存储管芯。 该方法包括用具有微米数量级的光斑尺寸的探针激光束获得测量值。 将这些测量与从校准测量获得的校准信息进行比较。 通过使用探针激光束测量校准样品和至少一种具有添加信息内容的其他技术来得到校准信息。 在优选实施例中，其它技术包括光谱反射测量或光谱椭偏仪中的至少一种。