Gated nanorod field emitter structures and associated methods of fabrication
    3.
    发明授权
    Gated nanorod field emitter structures and associated methods of fabrication 有权
    门极纳米棒场发射极结构及相关制造方法

    公开(公告)号:US07411341B2

    公开(公告)日:2008-08-12

    申请号:US11835691

    申请日:2007-08-08

    IPC分类号: H01J1/30 H01J1/02

    CPC分类号: H01J1/304 H01J9/025

    摘要: The present invention relates to gated nanorod field emission devices, wherein such devices have relatively small emitter tip-to-gate distances, thereby providing a relatively high emitter tip density and low turn on voltage. Such methods employ a combination of traditional device processing techniques (lithography, etching, etc.) with electrochemical deposition of nanorods. These methods are relatively simple, cost-effective, and efficient; and they provide field emission devices that are suitable for use in x-ray imaging applications, lighting applications, flat panel field emission display (FED) applications, etc.

    摘要翻译: 本发明涉及门控纳米棒场发射器件,其中这种器件具有相对较小的发射极尖对栅极距离,从而提供相对高的发射极尖端密度和低导通电压。 这种方法采用传统的器件处理技术(光刻,蚀刻等)与纳米棒的电化学沉积的组合。 这些方法相对简单,成本效益高,效率高; 并且它们提供适用于X射线成像应用,照明应用,平板场发射显示(FED)应用等的场致发射器件。

    Gated nanorod field emitter structures and associated methods of fabrication
    5.
    发明授权
    Gated nanorod field emitter structures and associated methods of fabrication 有权
    门极纳米棒场发射极结构及相关制造方法

    公开(公告)号:US07279085B2

    公开(公告)日:2007-10-09

    申请号:US11185007

    申请日:2005-07-19

    IPC分类号: C25D5/02

    CPC分类号: H01J1/304 H01J9/025

    摘要: The present invention relates to gated nanorod field emission devices, wherein such devices have relatively small emitter tip-to-gate distances, thereby providing a relatively high emitter tip density and low turn on voltage. Such methods employ a combination of traditional device processing techniques (lithography, etching, etc.) with electrochemical deposition of nanorods. These methods are relatively simple, cost-effective, and efficient; and they provide field emission devices that are suitable for use in x-ray imaging applications, lighting applications, flat panel field emission display (FED) applications, etc.

    摘要翻译: 本发明涉及门控纳米棒场发射器件,其中这种器件具有相对较小的发射极尖对栅极距离,从而提供相对高的发射极尖端密度和低导通电压。 这种方法采用传统的器件处理技术(光刻,蚀刻等)与纳米棒的电化学沉积的组合。 这些方法相对简单,成本效益高,效率高; 并且它们提供适用于X射线成像应用,照明应用,平板场发射显示(FED)应用等的场致发射器件。