Device and method for the evaporative deposition of a coating material
    1.
    发明申请
    Device and method for the evaporative deposition of a coating material 有权
    用于蒸镀沉积涂料的装置和方法

    公开(公告)号:US20060051495A1

    公开(公告)日:2006-03-09

    申请号:US10533776

    申请日:2003-10-15

    申请人: Helmut Kinder

    发明人: Helmut Kinder

    IPC分类号: C23C16/00

    摘要: According to a first aspect, the present invention relates to a device for depositing a high temperature superconductor onto a substrate in vacuum comprising a refilling device for containing a stock of high temperature superconductor material, an evaporation device, that evaporates the high temperature superconductor material within an evaporation zone by means of an energy transferring medium, and a conveyor that transports the high temperature superconductor material continuously from the refilling device to the evaporation zone in such a way that the high temperature superconductor material delivered into the evaporation zone is evaporated essentially without residues. According to a further aspect, the present invention relates to a method to evaporate a high temperature superconductor coating onto a substrate in vacuum, comprising the steps of continuous delivery of granular high temperature superconductor material into an evaporation zone and the operation of a beam of an energy transferring medium, so that the delivered granulate is evaporated in the evaporation zone essentially without residues.

    摘要翻译: 根据第一方面,本发明涉及一种用于在真空中将高温超导体沉积到衬底上的装置,包括用于容纳高温超导体材料原料的再填充装置,蒸发装置,其将所述高温超导体材料蒸发 通过能量转移介质的蒸发区,以及输送机,其将高温超导体材料从再填充装置连续地输送到蒸发区,使得输送到蒸发区中的高温超导体材料基本上没有残留蒸发 。 根据另一方面,本发明涉及一种在真空中将高温超导体涂层蒸发到基底上的方法,包括以下步骤:将粒状高温超导体材料连续输送到蒸发区域中,并且操作一束 能量转移介质,使得输送的颗粒在蒸发区中基本上没有残留物蒸发。

    Laminates having a buffer layer and cover layer
    2.
    发明授权
    Laminates having a buffer layer and cover layer 有权
    具有缓冲层和覆盖层的层压体

    公开(公告)号:US06638598B2

    公开(公告)日:2003-10-28

    申请号:US09790554

    申请日:2001-02-23

    IPC分类号: B32B310

    摘要: A laminate includes an amorphous or polycrystalline substrate; a textured buffer layer arranged on the substrate and having a columnar structure wherein a low index crystal axis is inclined with respect to the substrate normal and a surface of columnar crystallites is inclined with respect to the low index crystal axis; at least one cover layer arranged on the buffer layer and having a closed surface; and an oriented thin layer.

    摘要翻译: 层压体包括非晶或多晶衬底; 布置在基板上的具有柱状结构的纹理缓冲层,其中低折射率晶轴相对于基板法线倾斜,并且柱状微晶表面相对于低折射率晶轴倾斜; 布置在所述缓冲层上并具有封闭表面的至少一个覆盖层; 和取向薄层。

    Device and method for the evaporative deposition of a coating material
    3.
    发明授权
    Device and method for the evaporative deposition of a coating material 有权
    用于蒸镀沉积涂料的装置和方法

    公开(公告)号:US07727335B2

    公开(公告)日:2010-06-01

    申请号:US10533776

    申请日:2003-10-15

    申请人: Helmut Kinder

    发明人: Helmut Kinder

    IPC分类号: C23C16/00

    摘要: According to a first aspect, the present invention relates to a device for depositing a high temperature superconductor onto a substrate in vacuum comprising a refilling device for containing a stock of high temperature superconductor material, an evaporation device, that evaporates the high temperature superconductor material within an evaporation zone by means of an energy transferring medium, and a conveyor that transports the high temperature superconductor material continuously from the refilling device to the evaporation zone in such a way that the high temperature superconductor material delivered into the evaporation zone is evaporated essentially without residues. According to a further aspect, the present invention relates to a method to evaporate a high temperature superconductor coating onto a substrate in vacuum, comprising the steps of continuous delivery of granular high temperature superconductor material into an evaporation zone and the operation of a beam of an energy transferring medium, so that the delivered granulate is evaporated in the evaporation zone essentially without residues.

    摘要翻译: 根据第一方面,本发明涉及一种用于在真空中将高温超导体沉积到衬底上的装置,包括用于容纳高温超导体材料原料的再填充装置,蒸发装置,其将所述高温超导体材料蒸发 通过能量转移介质的蒸发区,以及输送机,其将高温超导体材料从再填充装置连续地输送到蒸发区,使得输送到蒸发区中的高温超导体材料基本上没有残留蒸发 。 根据另一方面,本发明涉及一种在真空中将高温超导体涂层蒸发到基底上的方法,包括以下步骤:将粒状高温超导体材料连续输送到蒸发区域中,并且操作一束 能量转移介质,使得输送的颗粒在蒸发区中基本上没有残留物蒸发。

    Resistive current limiter
    4.
    发明授权
    Resistive current limiter 失效
    电阻限流器

    公开(公告)号:US07760067B2

    公开(公告)日:2010-07-20

    申请号:US11396920

    申请日:2006-04-04

    IPC分类号: H01C7/00

    CPC分类号: H01L39/16

    摘要: According to a first aspect the present invention relates to a fault current limiter formed by a conductor tape (11, 41, 51, 61, 71) coated with a high temperature superconductor and having at least one mounting element (12, 42, 52, 62, 72) which is essentially holding the conductor tape solely on one or more edge regions in such a way that the principal surfaces of the tape cannot get in touch with the mounting element.According to a second aspect the present invention relates to a fault current limiter formed by a conductor tape coated with a high temperature superconductor and comprising at least one mounting element (23, 24) which is contacting the conductor tape on one or on both major surfaces in an electrically conducting manner such that the conductor tape (21) in its normal conducting state is electrically shunted by the mounting element (23) in the contact region.

    摘要翻译: 根据第一方面,本发明涉及由涂覆有高温超导体的导体带(11,41,51,61,71)形成的故障限流器,并且具有至少一个安装元件(12,42,52, 62,72),其基本上将导体带保持在一个或多个边缘区域上,使得带的主表面不能与安装元件接触。 根据第二方面,本发明涉及由涂覆有高温超导体的导体带形成的故障限流器,并且包括至少一个安装元件(23,24),该安装元件在两个主表面上的一个或两个主表面上接触导体带 以导电方式使得处于其正常导通状态的导体带(21)由接触区域中的安装元件(23)电分流。

    Device for producing oxidic thin films
    5.
    发明授权
    Device for producing oxidic thin films 有权
    用于生产氧化薄膜的装置

    公开(公告)号:US06294025B1

    公开(公告)日:2001-09-25

    申请号:US09091982

    申请日:1998-12-07

    申请人: Helmut Kinder

    发明人: Helmut Kinder

    IPC分类号: B05B500

    摘要: The invention relates to an apparatus for the production of thin oxide coatings, having a vacuum chamber wherein an oxygen chamber with an opening and a rotary substrate holder overlapping the latter are disposed. For the rotary arrangement of the substrate holder a rotary mounting is provided, which engages a circumferential portion of the substrate holder.

    摘要翻译: 本发明涉及一种用于生产薄氧化物涂层的设备,其具有真空室,其中设置有具有开口的氧室和与之相重叠的旋转衬底保持器。 对于衬底保持器的旋转布置,提供旋转安装件,其接合衬底保持器的圆周部分。

    Device and method for producing a multilayered material
    6.
    发明授权
    Device and method for producing a multilayered material 有权
    用于生产多层材料的装置和方法

    公开(公告)号:US06265353B1

    公开(公告)日:2001-07-24

    申请号:US09117878

    申请日:1999-04-12

    IPC分类号: B05D512

    摘要: In a method for producing laminate, a buffer layer is applied to a substrate, with the buffer layer material being evaporated from the buffer layer material dispensing devices at an angle &agr;1≠0 at the normal to the substrate surface onto the latter, before an oriented thin layer is evaporated. According to the invention, provision is made such that (a) following evaporation of the buffer layer and prior to the evaporation of the oriented thin layer, at least one cover layer is evaporated under deposition conditions that vary from those under which the buffer layer was applied, especially at a different pressure, different temperature, different rate, and/or different angle &agr;2≠&agr;1, especially &agr;2

    摘要翻译: 在制造层压体的方法中,将缓冲层施加到基板上,缓冲层材料从缓冲层材料分配装置以与基板表面垂直的α1<0°的角度蒸发到其上,在 取向的薄层蒸发。 根据本发明,提供以下步骤:(a)缓冲层的蒸发之后,在取向薄层蒸发之前,至少一层覆盖层在与缓冲层为 特别是在不同的压力,不同的温度,不同的速率和/或不同的角度α2α1,特别是与衬底表面法线的α2α,优选α2≈0°的情况下,和/或在缓冲层上蒸发 使得缓冲层具有双轴纹理和/或刻面的方式。

    Resistive current limiter
    7.
    发明申请
    Resistive current limiter 失效
    电阻限流器

    公开(公告)号:US20070205857A1

    公开(公告)日:2007-09-06

    申请号:US11396920

    申请日:2006-04-04

    IPC分类号: H01C7/00

    CPC分类号: H01L39/16

    摘要: According to a first aspect the present invention relates to a fault current limiter formed by a conductor tape (11, 41, 51, 61,71) coated with a high temperature superconductor and having at least one mounting element (12, 42, 52, 62, 72) which is essentially holding the conductor tape solely on one or more edge regions in such a way that the principal surfaces of the tape cannot get in touch with the mounting element. According to a second aspect the present invention relates to a fault current limiter formed by a conductor tape coated with a high temperature superconductor and comprising at least one mounting element (23, 24) which is contacting the conductor tape on one or on both major surfaces in an electrically conducting manner such that the conductor tape (21) in its normal conducting state is electrically shunted by the mounting element (23) in the contact region.

    摘要翻译: 根据第一方面,本发明涉及由涂覆有高温超导体的导体带(11,41,51,61,71)形成的故障限流器,并且具有至少一个安装元件(12,42,52, 62,72),其基本上将导体带保持在一个或多个边缘区域上,使得带的主表面不能与安装元件接触。 根据第二方面,本发明涉及由涂覆有高温超导体的导体带形成的故障限流器,并且包括至少一个安装元件(23,24),该安装元件在两个主表面上的一个或两个主表面上接触导体带 以导电方式使得处于其正常导通状态的导体带(21)由接触区域中的安装元件(23)电分流。

    Superconducting switching element and method
    8.
    发明授权
    Superconducting switching element and method 失效
    超导开关元件及方法

    公开(公告)号:US06894406B2

    公开(公告)日:2005-05-17

    申请号:US09854422

    申请日:2001-05-11

    申请人: Helmut Kinder

    发明人: Helmut Kinder

    摘要: The invention relates to a switching element for modifying the electric resistance with at least one high temperature superconductor (1) and means (3) for irradiating electromagnetic high frequency onto the at least one high temperature superconductor (1). The invention further relates to a method for switching a high temperature superconductor (1) comprising the steps of providing a high temperature superconductor (1) in the superconducting state and irradiating an electromagnetic high frequency until the high temperature superconductor (1) changes over into a normally conducting state.

    摘要翻译: 本发明涉及一种用至少一个高温超导体(1)改变电阻的开关元件和用于将电磁高频照射到至少一个高温超导体(1)上的装置(3)。 本发明还涉及一种用于切换高温超导体(1)的方法,包括以下步骤:在超导状态下提供高温超导体(1)并照射电磁高频直到高温超导体(1)转变为 正常状态。