摘要:
Systems and methods for growing hexagonal crystal structure piezoelectric material with a c-axis that is tilted (e.g., 25 to 50 degrees) relative to normal of a face of a substrate are provided. A deposition system includes a linear sputtering apparatus, a translatable multi-aperture collimator, and a translatable substrate table arranged to hold multiple substrates, with the substrate table and/or the collimator being electrically biased to a nonzero potential. An enclosure includes first and second deposition stations each including a linear sputtering apparatus, a collimator, and a deposition aperture.
摘要:
Systems and methods for growing hexagonal crystal structure piezoelectric material with a c-axis that is tilted (e.g., 25 to 50 degrees) relative to normal of a face of a substrate are provided. A deposition system includes a linear sputtering apparatus, a translatable multi-aperture collimator, and a translatable substrate table arranged to hold multiple substrates, with the substrate table and/or the collimator being electrically biased to a nonzero potential. An enclosure includes first and second deposition stations each including a linear sputtering apparatus, a collimator, and a deposition aperture.
摘要:
An article includes a substrate that is substantially opaque to visible light and a coating disposed on the substrate. The coating includes a coating material having an inherent index of refraction, wherein the coating has an effective index of refraction that is less than the inherent index of refraction, and wherein the effective index of refraction is less than 1.8.
摘要:
A liquid crystal device includes a liquid crystal layer, and an inorganic oriented film between the liquid crystal layer and an electrode, in which the inorganic oriented film has a first inorganic oriented film that has a first prismatic structure including silicon oxide, and a second inorganic oriented film that is formed so as to cover at least a portion of the first prismatic structure, and includes nitrogen.
摘要:
EC film stacks and different layers within the EC film stacks are disclosed. Methods of manufacturing these layers are also disclosed. In one embodiment, an EC layer comprises nanostructured EC layer. These layers may be manufactured by various methods, including, including, but not limited to glancing, angle deposition, oblique angle deposition, electrophoresis, electrolyte deposition, and atomic layer deposition. The nanostructured EC layers have a high specific surface area, improved response times, and higher color efficiency.
摘要:
Disclosed herein describes an SERS sensing substrate comprising upright metal nanostructures made by using oblique angle deposition (OAD) collocating with self-rotation substrate, wherein said upright nanostructures include individual upright nanopillars and metal/dielectric multilayered upright nanopillar stacks. The SERS sensing substrate exhibits higher and enhanced adsorption spectra for unpolarized incident rays in the visible and infrared wavelength regimes.
摘要:
The present invention relates to hard coating layer and a method for forming the hard coating layer. A method for forming hard coating layer which comprises: washing a substrate; installing the washed substrate in a vacuum equipment, and vacuating the chamber of the vacuum equipment; cleaning the substrate; forming oblique coating layer on the substrate; and forming vertical coating layer, vertically to the substrate, on the oblique coating layer by applying bias-voltage after forming oblique coating layer is provided. According to present invention, hardness of coating layer may be enhanced by forming a oblique coating layer and vertical coating layer on a substrate.
摘要:
A coated part is exposed to a gas flow. The gas flow has a characteristic gas flow direction distribution over a surface of the coated part. The coated part has a substrate having a substrate surface and a coating over the substrate surface. The coating comprises at least one coating layer. A first such layer is columnar and has a column boundary direction distribution. The column boundary direction distribution is selected for partial local alignment with the gas flow direction distribution.
摘要:
A method of forming thin-film structure by oblique-angle deposition is provided. The method includes the steps of: evaporating target source in a chamber by an electron beam evaporation system, and introducing process gas into the chamber and adjusting tilt angle of the evaporation substrate and controlling temperature in the chamber during evaporation to form thin-film on a evaporation substrate by oblique-angle deposition, and then annealing the evaporation substrate to form a thin-film having porous nanorod microstructure.
摘要:
A nanostructure includes a plurality of metal nanoblades positioned with one edge on a substrate. Each of the plurality of metal nanoblades has a large surface area to mass ratio and a width smaller than a length. A method of storing hydrogen includes coating a plurality of magnesium nanoblades with a hydrogen storage catalyst and storing hydrogen by chemically forming magnesium hydride with the plurality of magnesium nanoblades.