Abstract:
In a source for the generation of large-area pulsed ion or electron beams from an anode discharge electrode which has openings receiving discharge electrodes forming a vacuum arc plasma source, the discharge is safely triggered by a load which determines the total current and which consists of a parallel circuit including an ohmic resistor and a capacitor wherein the load output is adapted to the internal resistance of the pulse voltage generator. With a dimensioning of the electrical components taking into consideration given limits, a homogeneous beam of charged particles is obtained wherein the particle composition can be all the same or a homogeneous mixture of different particles depending on the choice of electrode materials.