公开(公告)号：US07521171B2

公开(公告)日：2009-04-21

申请号：US11369431

申请日：2006-03-07

申请人： Hijiri Aoki ,  Takahito Mita

发明人： Hijiri Aoki ,  Takahito Mita

IPC分类号： G03F7/039 ,  C08F2/38

CPC分类号： G03F7/0392 ,  G03F7/0397

摘要： The positive photosensitive resin of the present invention has an acid-labile protecting group and the structure represented by the following general formula (1): (wherein X1 and X2 may be the sake or different and each independently a straight or branched chain hydrocarbon group, having 1 to 30 carbon atoms, an alicyclic hydrocarbon group or a heterocyclic group, which may substituted with straight or branched chain hydrocarbon of 1 to 6 carbon atoms or —O— hydrocarbon; Y1 and Y2 may be the same or different and are each independently a hydrogen atom, a straight or branched chain hydrocarbon group having 1 to 6 carbon atoms, a sulfur-containing hydrocarbon group, or an aromatic hydrocarbon group which may have a substituent; and two Zs may be the same or different and each independently an oxygen atom or a sulfur atom).

摘要翻译： 本发明的正型感光性树脂具有酸不稳定保护基和由以下通式（1）表示的结构：（其中X1和X2可以是不同的且各自独立地为直链或支链烃基， 具有1至30个碳原子的脂环族烃基或杂环基，其可以被1至6个碳原子的直链或支链烃取代或-O-烃; Y1和Y2可以相同或不同，并且各自独立地 氢原子，具有1〜6个碳原子的直链或支链烃基，含硫烃基或可具有取代基的芳族烃基;两个Z可以相同或不同，并且各自独立地为氧 原子或硫原子）。

公开(公告)号：US20060204888A1

公开(公告)日：2006-09-14

申请号：US11369431

申请日：2006-03-07

申请人： Hijiri Aoki ,  Takahito Mita

发明人： Hijiri Aoki ,  Takahito Mita

IPC分类号： G03C1/76

CPC分类号： G03F7/0392 ,  G03F7/0397

摘要： The present invention provides a positive photosensitive resin and a resist composition containing the positive photosensitive resin, both of which are used for fine pattern formation in semiconductor production and are preferably used in a semiconductor lithography of higher-than-before sensitivity. The positive photosensitive resin of the present invention is a positive photosensitive resin having an acid-labile protecting group which is dissociatable by the action of an acid to allow the resin to have higher solubility in an alkaline developing solution, which resin having, in the high-molecular main chain, a structure represented by the following general formula (1): (wherein X1 and X2 may be the same or different and are each independently a straight chain or branched chain hydrocarbon group having 1 to 30 carbon atoms, an alicyclic hydrocarbon group, an aromatic hydrocarbon group or a heterocyclic group, and these groups may be substituted with straight chain or branched chain hydrocarbon of 1 to 6 carbon atoms or —O-hydrocarbon; Y1 and Y2 may be the same or different and are each independently a hydrogen atom, a straight chain or branched chain hydrocarbon group having 1 to 6 carbon atoms, a sulfur-containing hydrocarbon group, or an aromatic hydrocarbon group which may have a substituent; and two Zs may be the same or different and are each independently an oxygen atom or a sulfur atom).

摘要翻译： 本发明提供一种正型感光性树脂和含有正型感光性树脂的抗蚀剂组合物，二者均用于半导体制造中的精细图案形成，优选用于高于前述感光度的半导体光刻法中。 本发明的正型感光性树脂是具有酸不稳定保护基的正性感光性树脂，其可通过酸的作用离解，使树脂在碱性显影液中具有较高的溶解度，该树脂具有高的 - 分子主链，由以下通式（1）表示的结构：（其中X 1和X 2可以相同或不同，并且各自独立地为直链 具有1至30个碳原子的链或支链烃基，脂环族烃基，芳族烃基或杂环基，这些基团可以被具有1至6个碳原子的直链或支链烃基或-O- 烃; Y 1和Y 2可以相同或不同，各自独立地为氢原子，具有1-6个碳原子的直链或支链烃基， 含硫烃基，或 可以具有取代基的芳族烃基; 两个Z可以相同或不同，各自独立地为氧原子或硫原子）。

公开(公告)号：US20100286351A1

公开(公告)日：2010-11-11

申请号：US12667785

申请日：2008-06-19

申请人： Norihiro Yoshida ,  Hijiri Aoki ,  Takahito Mita ,  Ami Yamaguchi ,  Kazuhiko Haba ,  Goro Sawada

发明人： Norihiro Yoshida ,  Hijiri Aoki ,  Takahito Mita ,  Ami Yamaguchi ,  Kazuhiko Haba ,  Goro Sawada

IPC分类号： C08F4/32 ,  C08F12/24

CPC分类号： C08F297/00 ,  C08F212/14 ,  C08F216/14

摘要： To provide a novel ABA-type triblock copolymer of vinyl ether series, comprising polyvinyl ether and an oxystyrene-series unit, and a process of producing the ABA-type copolymer at a series of steps. The invention relates to a novel ABA-type triblock copolymer comprising Segment A comprising an oxystyrene-series repeat unit (a) and Segment B comprising a vinyl ether-series repeat unit (b), in which the Segment A and the Segment B are bonded together with a single bond, and to a simple process of producing the same. The triblock copolymer can be produced at a series of steps in a simple manner, comprising living cationic polymerization of a vinyl ether-series monomer such as ethyl vinyl ether in the presence of a bifunctional initiator and a Lewis acid, and subsequently adding an oxystyrene-series monomer such as p-hydroxystyrene for living cationic polymerization.

摘要翻译： 提供一种乙烯基醚系列的新型ABA型三嵌段共聚物，包括聚乙烯基醚和氧苯乙烯系单体，以及一系列步骤制备该ABA型共聚物的方法。 本发明涉及一种新型的ABA型三嵌段共聚物，其包括含有氧化苯乙烯系列重复单元（a）的段A和包含乙烯基醚系列重复单元（b）的段B，其中段A和段B键合 连同一个单一的债券，以及一个简单的生产过程。 三嵌段共聚物可以以简单的方式在一系列步骤中制备，包括在双功能引发剂和路易斯酸的存在下乙烯基醚系单体如乙基乙烯基醚的阳离子聚合，随后加入氧苯乙烯 - 用于活性阳离子聚合的对羟基苯乙烯等系列单体。

公开(公告)号：US08492483B2

公开(公告)日：2013-07-23

申请号：US12667785

申请日：2008-06-19

申请人： Norihiro Yoshida ,  Hijiri Aoki ,  Takahito Mita ,  Ami Yamaguchi ,  Kazuhiko Haba ,  Goro Sawada

发明人： Norihiro Yoshida ,  Hijiri Aoki ,  Takahito Mita ,  Ami Yamaguchi ,  Kazuhiko Haba ,  Goro Sawada

IPC分类号： C08F4/32 ,  C08F12/24

CPC分类号： C08F297/00 ,  C08F212/14 ,  C08F216/14

摘要： To provide a novel ABA-type triblock copolymer of vinyl ether series, comprising polyvinyl ether and an oxystyrene-series unit, and a process of producing the ABA-type copolymer at a series of steps. The invention relates to a novel ABA-type triblock copolymer comprising Segment A comprising an oxystyrene-series repeat unit (a) and Segment B comprising a vinyl ether-series repeat unit (b), in which the Segment A and the Segment B are bonded together with a single bond, and to a simple process of producing the same. The triblock copolymer can be produced at a series of steps in a simple manner, comprising living cationic polymerization of a vinyl ether-series monomer such as ethyl vinyl ether in the presence of a bifunctional initiator and a Lewis acid, and subsequently adding an oxystyrene-series monomer such as p-hydroxystyrene for living cationic polymerization.

摘要翻译： 提供一种乙烯基醚系列的新型ABA型三嵌段共聚物，包括聚乙烯基醚和氧苯乙烯系单体，以及一系列步骤制备该ABA型共聚物的方法。 本发明涉及一种新型的ABA型三嵌段共聚物，其包括含有氧化苯乙烯系列重复单元（a）的段A和包含乙烯基醚系列重复单元（b）的段B，其中段A和段B键合 连同一个单一的债券，以及一个简单的生产过程。 三嵌段共聚物可以以简单的方式在一系列步骤中制备，包括在双功能引发剂和路易斯酸的存在下乙烯基醚系单体如乙基乙烯基醚的阳离子聚合，随后加入氧苯乙烯 - 用于活性阳离子聚合的对羟基苯乙烯等系列单体。