-
公开(公告)号:US07141221B2
公开(公告)日:2006-11-28
申请号:US09855673
申请日:2001-05-16
申请人: Kazuyoshi Irie , Toshihiro Mori , Hisao Yokoyama , Takayuki Tomiyama , Toshihide Takano , Shin Tamata , Shuichi Kanno
发明人: Kazuyoshi Irie , Toshihiro Mori , Hisao Yokoyama , Takayuki Tomiyama , Toshihide Takano , Shin Tamata , Shuichi Kanno
IPC分类号: B01D53/34
CPC分类号: B01J4/002 , B01D53/8659 , B01D53/8662 , B01J8/0221 , B01J8/025 , B01J8/0278 , B01J8/0285 , B01J19/26 , B01J2208/00061 , B01J2208/00203 , B01J2208/00362 , B01J2208/00407 , B01J2208/00415 , B01J2208/00495 , B01J2208/0053 , B01J2208/00814 , B01J2208/0084 , B01J2208/00884 , B01J2219/00006 , Y02C20/30
摘要: An exhaust gas containing a perfluoride component (PFC) and SiF4 is conducted into a silicon remover and brought into contact with water. A reaction water supplied from a water supplying piping and air supplied from an air supplying piping are mixed with the exhaust gas exhausted from the silicon remover. The exhaust gas containing water, air, and CF4 is heated at 700° C. by a heater. The exhaust gas containing PFC is conducted to a catalyst layer filled with an alumina group catalyst. The PFC is decomposed to HF and CO2 at a high temperature exhausted from the catalyst layer is cooled in a cooling apparatus. Subsequently, the exhaust gas is conducted to an acidic gas removing apparatus to remove HF. In this way, the silicon component is removed from the exhaust gas before introducing the exhaust gas into the catalyst layer. Therefore, the surface of the catalyst can be utilized effectively, and the decomposition reaction of the perfluoride compound can be improved.
摘要翻译: 将含有全氟化物组分(PFC)和SiF 4 N的废气导入硅去除剂中并与水接触。 从供水管道供应的反应水和从供气管道供应的空气与从硅去除器排出的废气混合。 含有水,空气和CF 4 N的废气通过加热器在700℃下加热。 含有PFC的废气被传导到填充有氧化铝基催化剂的催化剂层。 在从催化剂层排出的高温下,将PFC分解成HF,在冷却装置中冷却CO 2。 随后,将废气导入酸性气体去除装置中去除HF。 以这种方式,在将废气引入催化剂层之前,从排气中除去硅组分。 因此,可有效利用催化剂的表面,可以提高全氟化合物的分解反应。
-
公开(公告)号:US5977427A
公开(公告)日:1999-11-02
申请号:US658646
申请日:1996-06-05
申请人: Shin Tamata , Satoru Ohashi , Toshihide Takano , Hisao Yokoyama , Toshihiro Mori
发明人: Shin Tamata , Satoru Ohashi , Toshihide Takano , Hisao Yokoyama , Toshihiro Mori
IPC分类号: B01D53/14 , A62D101/22 , B01D53/86 , B01D53/70
CPC分类号: A62D3/38 , A62D3/20 , A62D3/35 , A62D3/37 , B01D53/8662 , A62D2101/22 , A62D2203/04 , A62D2203/10 , Y02C20/30
摘要: A process is provided for the destruction of organohalogen compounds, such as methyl chloride, chloroform, carbon tetrachloride, etc., by mixing the organohalogen compounds with a heated carrier gas, such as nitrogen, argon or air, and either steam or water to form a mixture; supplying the mixture to a catalyst, such as titanium oxide/tungsten oxide, to decompose the organohalogen compounds into halogens and hydrogen halides, such as chlorine, hydrochloric acid, fluorine and hydrofluoric acid; conducting the halogen and hydrogen halide contaminated gas through a bent path, created by a baffle that prevents the entry of mist or droplets into the catalyst chamber, into a cooling section where the halogen and hydrogen halide contaminated gas is sprayed with water to cool the gas to a temperature low enough to prevent the formation of dioxines. An alkaline agent, such as sodium hydroxide, can be added to the cooling water to neutralize the halides and hydrogen halides.
摘要翻译: 通过将有机卤素化合物与加热的载气如氮气,氩气或空气以及蒸汽或水混合形成有机卤素化合物如氯甲烷,氯仿,四氯化碳等的方法,形成 混合物; 将混合物供给到氧化钛/氧化钨等催化剂中,将有机卤素化合物分解为卤素,卤化氢,如氯,盐酸,氟,氢氟酸; 通过弯曲路径导通卤素和卤化氢污染气体,该弯曲路径由防止雾或液滴进入催化剂室的挡板形成冷却段,在该冷却段中卤素和卤化氢污染的气体用水喷洒以冷却气体 达到足够低的温度以防止形成二恶英。 可以向冷却水中加入碱性试剂如氢氧化钠以中和卤化物和卤化氢。
-
公开(公告)号:US08231851B2
公开(公告)日:2012-07-31
申请号:US10244010
申请日:2002-09-16
申请人: Kazuyoshi Irie , Toshihiro Mori , Hisao Yokoyama , Takayuki Tomiyama , Toshihide Takano , Shin Tamata , Shuichi Kanno
发明人: Kazuyoshi Irie , Toshihiro Mori , Hisao Yokoyama , Takayuki Tomiyama , Toshihide Takano , Shin Tamata , Shuichi Kanno
CPC分类号: B01D53/8659 , B01D53/8662 , Y02C20/30
摘要: An exhaust gas containing a perfluoride compound (PFC) and SiF4 is conducted into a silicon remover and brought into contact with water. A reaction water supplied from a water supplying piping and air supplied from an air supplying piping are mixed with the exhaust gas exhausted from the silicon remover. The exhaust gas containing water, air, and CF4 is heated at 700° C. by a heater. The exhaust gas containing PFC is conducted to a catalyst layer filled with an alumina group catalyst. The PFC is decomposed to HF and CO2 by the catalyst. The exhaust gas containing HF and CO2 at a high temperature exhausted from the catalyst layer is cooled in a cooling apparatus. Subsequently, the exhaust gas is conducted to an acidic gas removing apparatus to remove HF. In this way, the silicon component is removed from the exhaust gas before introducing the exhaust gas into the catalyst layer. Therefore, the surface of the catalyst can be utilized effectively, and the decomposition reaction of the perfluoride compound can be improved.
摘要翻译: 将含有全氟化合物(PFC)和SiF 4的废气导入硅去除剂中并与水接触。 从供水管道供应的反应水和从供气管道供应的空气与从硅去除器排出的废气混合。 含有水,空气和CF4的废气通过加热器在700℃加热。 含有PFC的废气被传导到填充有氧化铝基催化剂的催化剂层。 PFC通过催化剂分解成HF和CO2。 在从催化剂层排出的高温下含有HF和CO 2的废气在冷却装置中被冷却。 随后,将废气导入酸性气体去除装置中去除HF。 以这种方式,在将废气引入催化剂层之前,从排气中除去硅组分。 因此,可有效利用催化剂的表面,可以提高全氟化合物的分解反应。
-
公开(公告)号:US20060239869A1
公开(公告)日:2006-10-26
申请号:US11473072
申请日:2006-06-23
申请人: Kazuyoshi Irie , Toshihiro Mori , Hisao Yokoyama , Takayuki Tomiyama , Toshihide Takano , Shin Tamata , Shuichi Kanno
发明人: Kazuyoshi Irie , Toshihiro Mori , Hisao Yokoyama , Takayuki Tomiyama , Toshihide Takano , Shin Tamata , Shuichi Kanno
CPC分类号: B01J4/002 , B01D53/8659 , B01D53/8662 , B01J8/0221 , B01J8/025 , B01J8/0278 , B01J8/0285 , B01J19/26 , B01J2208/00061 , B01J2208/00203 , B01J2208/00362 , B01J2208/00407 , B01J2208/00415 , B01J2208/00495 , B01J2208/0053 , B01J2208/00814 , B01J2208/0084 , B01J2208/00884 , B01J2219/00006 , Y02C20/30
摘要: An exhaust gas containing a perfluoride component (PFC) and SiIF4 is conducted into a silicon remover and brought into contact with water. A reaction water supplied from a water supplying piping and air supplied from an air supplying piping are mixed with the exhaust gas exhausted from the silicon remover. The exhaust gas containing water, air, and CF4 is heated at 700° C. by a heater. The exhaust gas containing PFC is conducted to a catalyst layer filled with an alumina group catalyst. The PFC is decomposed to HF and CO2 at a high temperature exhausted from the catalyst layer is cooled in a cooling apparatus. Subsequently, the exhaust gas is conducted to an acidic gas removing apparatus to remove HF. In this way, the silicon component is removed from the exhaust gas before introducing the exhaust gas into the catalyst layer. Therefore, the surface of the catalyst can be utilized effectively, and the decomposition reaction of the perfluoride compound can be improved.
摘要翻译: 将含有全氟化物成分(PFC)和SiIF 4 N的废气导入硅去除剂中并与水接触。 从供水管道供应的反应水和从供气管道供应的空气与从硅去除器排出的废气混合。 含有水,空气和CF 4 N的废气通过加热器在700℃下加热。 含有PFC的废气被传导到填充有氧化铝基催化剂的催化剂层。 在从催化剂层排出的高温下,将PFC分解成HF,在冷却装置中冷却CO 2。 随后,将废气导入酸性气体去除装置中去除HF。 以这种方式,在将废气引入催化剂层之前,从排气中除去硅组分。 因此,可有效利用催化剂的表面,可以提高全氟化合物的分解反应。
-
公开(公告)号:US07641867B2
公开(公告)日:2010-01-05
申请号:US11473072
申请日:2006-06-23
申请人: Kazuyoshi Irie , Toshihiro Mori , Hisao Yokoyama , Takayuki Tomiyama , Toshihide Takano , Shin Tamata , Shuichi Kanno
发明人: Kazuyoshi Irie , Toshihiro Mori , Hisao Yokoyama , Takayuki Tomiyama , Toshihide Takano , Shin Tamata , Shuichi Kanno
CPC分类号: B01J4/002 , B01D53/8659 , B01D53/8662 , B01J8/0221 , B01J8/025 , B01J8/0278 , B01J8/0285 , B01J19/26 , B01J2208/00061 , B01J2208/00203 , B01J2208/00362 , B01J2208/00407 , B01J2208/00415 , B01J2208/00495 , B01J2208/0053 , B01J2208/00814 , B01J2208/0084 , B01J2208/00884 , B01J2219/00006 , Y02C20/30
摘要: An exhaust gas containing a perfluoride component (PFC) and SiIF4 is conducted into a silicon remover and brought into contact with water. A reaction water supplied from a water supplying piping and air supplied from an air supplying piping are mixed with the exhaust gas exhausted from the silicon remover. The exhaust gas containing water, air, and CF4 is heated at 700° C. by a heater. The exhaust gas containing PFC is conducted to a catalyst layer filled with an alumina group catalyst. The PFC is decomposed to HF and CO2 at a high temperature exhausted from the catalyst layer is cooled in a cooling apparatus. Subsequently, the exhaust gas is conducted to an acidic gas removing apparatus to remove HF. In this way, the silicon component is removed from the exhaust gas before introducing the exhaust gas into the catalyst layer. Therefore, the surface of the catalyst can be utilized effectively, and the decomposition reaction of the perfluoride compound can be improved.
摘要翻译: 将含有全氟化物成分(PFC)和SiIF 4的废气导入硅去除剂中并与水接触。 从供水管道供应的反应水和从供气管道供应的空气与从硅去除器排出的废气混合。 含有水,空气和CF4的废气通过加热器在700℃加热。 含有PFC的废气被传导到填充有氧化铝基催化剂的催化剂层。 将PFC分解成HF,并在从催化剂层排出的高温下将CO 2在冷却装置中冷却。 随后,将废气导入酸性气体去除装置中去除HF。 以这种方式,在将废气引入催化剂层之前,从排气中除去硅组分。 因此,可有效利用催化剂的表面,可以提高全氟化合物的分解反应。
-
公开(公告)号:US06652817B1
公开(公告)日:2003-11-25
申请号:US09182047
申请日:1998-10-29
申请人: Shin Tamata , Satoru Ohashi , Toshihide Takano , Hisao Yokoyama , Toshihiro Mori
发明人: Shin Tamata , Satoru Ohashi , Toshihide Takano , Hisao Yokoyama , Toshihiro Mori
IPC分类号: B01J800
CPC分类号: B01D53/8662
摘要: An apparatus for processing an organohalogen compounds includes a catalyst container containing a catalyst layer, a supplying path for supplying a carrier gas containing organohalogen compounds and steam through the catalyst container, a cooling chamber arranged at a lower portion of the catalyst container, a spraying apparatus mounted in the cooling chamber for spraying a cooling liquid to cool exhaust gas containing a decomposed gas of the organohalogen compounds exhausted from the catalyst layer and a baffle member forming a bent path which introduces the exhaust gas containing the decomposed gas into the cooling chamber from the catalyst layer and mounted in the cooling chamber for preventing mists generated by spraying cooling liquid from the spraying apparatus from back flowing into the catalyst container.
摘要翻译: 一种处理有机卤素化合物的装置包括含有催化剂层的催化剂容器,用于供给含有机卤素化合物的载气和通过催化剂容器的蒸汽的供给路径,布置在催化剂容器下部的冷却室, 安装在冷却室中,用于喷射冷却液以冷却从催化剂层排出的有机卤素化合物的分解气体的废气,以及形成弯曲路径的挡板部件,该弯曲路径将含有分解气体的废气从 催化剂层,并且安装在冷却室中,用于防止通过喷射来自喷涂装置的冷却液喷射而产生的雾反向流入催化剂容器。
-
-
-
-
-