摘要:
Disclosed is a photosensitive resin composition for a color filter that includes (A) an acrylic-based copolymer including a structural unit represented by the following Chemical Formula 1, wherein R1, R2, Q, and n are the same as defined in the specification; (B) an acrylic-based photopolymerizable monomer; (C) a photopolymerization initiator; (D) a colorant; and (E) a solvent.
摘要:
The present invention relates to a photosensitive resin composition for a color filter, which has an excellent stripper-resistance and is developed by an alkali aqueous solution, and a color filter formed of the photosensitive resin composition. The photosensitive resin composition includes: (A) a carboxyl-containing acryl-based binder resin; (B) a double bond-containing acryl carboxylate resin represented by the following Formula 1; (C) an acryl-based photopolymerization monomer; (D) a photopolymerization initiator; (E) a pigment; and (F) a solvent. The photosensitive resin composition has excellent stripper resistance, and thus can be used when a color filter is fabricated on a TFT array substrate in order to ensure a high aperture ratio. In the above formula, R1 is hydrogen or methyl, R2 is hydrogen, hydroxyl, C1 to C10 alkyl, or —CO—R5—COOH wherein R5 is a moiety derived from an acid anhydride, R3 is R6COO— wherein R6 is aryl, R4 is R7COO— wherein R7 is alkyl, 5≦m≦50, 1≦n≦20, and 10≦o≦100.
摘要:
Disclosed is a photosensitive resin composition for a color filter that includes (A) an acrylic-based copolymer including a structural unit represented by the following Chemical Formula 1, wherein R1, R2, Q, and n are the same as defined in the specification; (B) an acrylic-based photopolymerizable monomer; (C) a photopolymerization initiator; (D) a colorant; and (E) a solvent.