公开(公告)号：US20150337068A1

公开(公告)日：2015-11-26

申请号：US14377676

申请日：2013-02-11

Applicant: KARL K BERGGREN ,  WILLIAM BROWN FARNHAM ,  THEODORE H FEDYNYSHYN ,  SAMUEL M. NICAISE ,  MICHAEL THOMAS SHEEHAN ,  HOANG VI TRAN

Inventor： KARL K BERGGREN ,  WILLIAM BROWN FARNHAM ,  THEODORE H FEDYNYSHYN ,  SAMUEL M. NICAISE ,  MICHAEL THOMAS SHEEHAN ,  HOANG VI TRAN

IPC: C08F265/04 ,  G03F7/20 ,  G03F7/16

CPC classification number: C08F265/04 ,  B33Y10/00 ,  B33Y70/00 ,  C08F293/005 ,  C08F2438/03 ,  C08L53/00 ,  G03F7/0002 ,  G03F7/16 ,  G03F7/20

Abstract: This invention relates to the preparation and purification of high-X (“chi”) diblock copolymers. Such copolymers contain two segments (“blocks”) of polymers with significantly different interaction parameters and can be used in directed self-assembly applications

Abstract translation: 本发明涉及高-X（“chi”）二嵌段共聚物的制备与纯化。 这种共聚物包含具有显着不同的相互作用参数的聚合物的两个区段（“嵌段”），并且可以用于定向自组装应用中

公开(公告)号：US20090299113A1

公开(公告)日：2009-12-03

申请号：US12128020

申请日：2008-05-28

Applicant: Douglas J. Adelman ,  Hoang Vi Tran

Inventor： Douglas J. Adelman ,  Hoang Vi Tran

IPC: C07C5/02

CPC classification number: C07C7/163 ,  C07C9/00

Abstract: A method for purifying liquid alkanes, especially dicyclic alkanes, for use in immersion lithography is provided. The method produces alkanes having absorbance at 193 nm of ≦0.1/cm, and residue of ≦100 ppm. The liquid alkane compositions are useful as immersion liquids in photomicrolithography employed for production of electronic circuits.

Abstract translation: 提供了用于浸没式光刻中使用的用于净化液态烷烃，特别是二环烷烃的方法。 该方法产生在193nm处具有<= 0.1 / cm的吸光度和<= 100ppm的残留物的烷烃。 液体烷烃组合物可用作用于生产电子电路的微光刻中的浸液。

公开(公告)号：US07507522B2

公开(公告)日：2009-03-24

申请号：US11578278

申请日：2005-05-17

Applicant: Michael Karl Crawford ,  Hoang Vi Tran ,  Frank Leonard Schadt, III ,  Fredrick Claus Zumsteg, Jr. ,  Andrew Edward Feiring ,  Michael Fryd

Inventor： Michael Karl Crawford ,  Hoang Vi Tran ,  Frank Leonard Schadt, III ,  Fredrick Claus Zumsteg, Jr. ,  Andrew Edward Feiring ,  Michael Fryd

IPC: G03F7/004

CPC classification number: C08F214/18 ,  C07C33/44 ,  C07C43/1781 ,  C07C43/196 ,  C07C2602/42 ,  C07C2603/62 ,  C07C2603/86 ,  C08F214/26 ,  C08F220/18 ,  C08F220/26 ,  C08F232/08 ,  G03F7/0046 ,  G03F7/0395 ,  Y10S430/106 ,  Y10S430/108

Abstract: The present invention relates to novel unsaturated polycyclic compounds containing two fluoroalcohol substitutents. This invention also relates to homopolymers and copolymers derived from such unsaturated polycyclic compounds. The copolymers are useful for photoimaging compositions and, in particular, photoresist compositions (positive-working and/or negative-working) for imaging in the production of semiconductor devices. The polymers are especially useful in photoresist compositions having high UV transparency (particularly at short wavelengths, e.g., 157 nm) which are useful as base resins in resists and potentially in many other applications.

Abstract translation: 本发明涉及含有两个氟代醇取代基的新型不饱和多环化合物。 本发明还涉及衍生自这种不饱和多环化合物的均聚物和共聚物。 共聚物可用于光成像组合物，特别是用于制造半导体器件的成像的光致抗蚀剂组合物（正性和/或负性）。 聚合物特别适用于具有高UV透明度（特别是短波长，例如157nm）的光致抗蚀剂组合物，其可用作抗蚀剂中的基础树脂并且潜在地在许多其它应用中。